{"id":"https://openalex.org/W2027437342","doi":"https://doi.org/10.1116/1.573941","title":"Summary Abstract: Collisional energy transfer in noble gas/hydrogen plasmas","display_name":"Summary Abstract: Collisional energy transfer in noble gas/hydrogen plasmas","publication_year":1986,"publication_date":"1986-05-01","ids":{"openalex":"https://openalex.org/W2027437342","doi":"https://doi.org/10.1116/1.573941","mag":"2027437342"},"language":"en","primary_location":{"id":"doi:10.1116/1.573941","doi":"https://doi.org/10.1116/1.573941","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.573941","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5026464137","display_name":"Ole D. Krogh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210119777","display_name":"Shinko Electric Industries (Japan)","ror":"https://ror.org/02pz14q94","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210119777"]},{"id":"https://openalex.org/I4210135329","display_name":"NovAtel (Canada)","ror":"https://ror.org/03pge2g16","country_code":"CA","type":"company","lineage":["https://openalex.org/I4210135329"]},{"id":"https://openalex.org/I4405274880","display_name":"Teral Inc. (Japan)","ror":"https://ror.org/02j6x2g22","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405274880"]}],"countries":["CA","JP"],"is_corresponding":false,"raw_author_name":"Ole Krogh","raw_affiliation_strings":["Tegal Corporation, Novato, California 94947"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tegal Corporation, Novato, California 94947","institution_ids":["https://openalex.org/I4210119777","https://openalex.org/I4210135329","https://openalex.org/I4405274880"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015317373","display_name":"T. E. Wicker","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210119777","display_name":"Shinko Electric Industries (Japan)","ror":"https://ror.org/02pz14q94","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210119777"]},{"id":"https://openalex.org/I4210135329","display_name":"NovAtel (Canada)","ror":"https://ror.org/03pge2g16","country_code":"CA","type":"company","lineage":["https://openalex.org/I4210135329"]},{"id":"https://openalex.org/I4405274880","display_name":"Teral Inc. (Japan)","ror":"https://ror.org/02j6x2g22","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405274880"]}],"countries":["CA","JP"],"is_corresponding":false,"raw_author_name":"Tom Wicker","raw_affiliation_strings":["Tegal Corporation, Novato, California 94947"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tegal Corporation, Novato, California 94947","institution_ids":["https://openalex.org/I4210119777","https://openalex.org/I4210135329","https://openalex.org/I4405274880"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5074901236","display_name":"Brian N. Chapman","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210119777","display_name":"Shinko Electric Industries (Japan)","ror":"https://ror.org/02pz14q94","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210119777"]},{"id":"https://openalex.org/I4210135329","display_name":"NovAtel (Canada)","ror":"https://ror.org/03pge2g16","country_code":"CA","type":"company","lineage":["https://openalex.org/I4210135329"]},{"id":"https://openalex.org/I4405274880","display_name":"Teral Inc. (Japan)","ror":"https://ror.org/02j6x2g22","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405274880"]}],"countries":["CA","JP"],"is_corresponding":false,"raw_author_name":"Brian Chapman","raw_affiliation_strings":["Tegal Corporation, Novato, California 94947"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tegal Corporation, Novato, California 94947","institution_ids":["https://openalex.org/I4210119777","https://openalex.org/I4210135329","https://openalex.org/I4405274880"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":9,"citation_normalized_percentile":{"value":0.21007561,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":94},"biblio":{"volume":"4","issue":"3","first_page":"1796","last_page":"1797"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9154999852180481,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9154999852180481,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10523","display_name":"Atomic and Molecular Physics","score":0.042899999767541885,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.024000000208616257,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/collisional-energy-transfer","display_name":"collisional energy transfer","score":1.0},{"id":"https://openalex.org/keywords/noble-gas-plasma","display_name":"noble gas plasma","score":0.9070000052452087},{"id":"https://openalex.org/keywords/hydrogen-plasma","display_name":"hydrogen plasma","score":0.9300000071525574},{"id":"https://openalex.org/keywords/gas-mixtures","display_name":"gas mixtures","score":0.5090000033378601},{"id":"https://openalex.org/keywords/plasma-wall-interaction","display_name":"plasma-wall interaction","score":0.3070000112056732}],"concepts":[{"id":"https://openalex.org/C121530826","wikidata":"https://www.wikidata.org/wiki/Q19609","display_name":"Noble gas","level":2,"score":0.7759703993797302},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.6042757630348206},{"id":"https://openalex.org/C106447425","wikidata":"https://www.wikidata.org/wiki/Q11379","display_name":"Energy transfer","level":2,"score":0.5503789186477661},{"id":"https://openalex.org/C512968161","wikidata":"https://www.wikidata.org/wiki/Q556","display_name":"Hydrogen","level":2,"score":0.5376113653182983},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.4924336373806},{"id":"https://openalex.org/C186370098","wikidata":"https://www.wikidata.org/wiki/Q442787","display_name":"Energy (signal processing)","level":2,"score":0.47454842925071716},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3283575773239136},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.32509690523147583},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.1743730902671814},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.05912861227989197}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.573941","doi":"https://doi.org/10.1116/1.573941","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.573941","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4232180787","https://openalex.org/W160466137","https://openalex.org/W2138394435","https://openalex.org/W2623687101","https://openalex.org/W2995887600","https://openalex.org/W4243225311","https://openalex.org/W4206312350","https://openalex.org/W2058995968","https://openalex.org/W2248900747","https://openalex.org/W797270981"],"abstract_inverted_index":null,"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2026-10-27T15:51:10.671819","created_date":"2016-06-24T00:00:00"}