{"id":"https://openalex.org/W2026745286","doi":"https://doi.org/10.1002/sca.20175","title":"Self\u2010leveling two\u2010dimensional probe arrays for Dip Pen Nanolithography\u00ae","display_name":"Self\u2010leveling two\u2010dimensional probe arrays for Dip Pen Nanolithography\u00ae","publication_year":2010,"publication_date":"2010-01-01","ids":{"openalex":"https://openalex.org/W2026745286","doi":"https://doi.org/10.1002/sca.20175","mag":"2026745286","pmid":"https://pubmed.ncbi.nlm.nih.gov/20496441"},"language":"en","primary_location":{"id":"doi:10.1002/sca.20175","doi":"https://doi.org/10.1002/sca.20175","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sca.20175","pdf_url":null,"source":{"id":"https://openalex.org/S51527640","display_name":"Scanning","issn_l":"0161-0457","issn":["0161-0457","1932-8745"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-20","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scanning","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5008077391","display_name":"Jason R. Haaheim","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Jason Haaheim","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois, USA. jhaaheim@nanoink.net","NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois, USA. jhaaheim@nanoink.net","institution_ids":[]},{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059684421","display_name":"Vadim Val","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Vadim Val","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004711386","display_name":"John Bussan","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"John Bussan","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026202729","display_name":"Sergey Rozhok","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Sergey Rozhok","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5006925241","display_name":"Jae Won Jang","orcid":"https://orcid.org/0000-0002-2162-4520","observed_orcids":["https://orcid.org/0000-0002-2162-4520"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jae\u2010Won Jang","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007643821","display_name":"Joe Fragala","orcid":"https://orcid.org/0000-0002-8802-6672","observed_orcids":["https://orcid.org/0000-0002-8802-6672"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Joe Fragala","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5004106297","display_name":"Mike Nelson","orcid":"https://orcid.org/0000-0003-0029-3678","observed_orcids":["https://orcid.org/0000-0003-0029-3678"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mike Nelson","raw_affiliation_strings":["NanoInk, Inc., Skokie, Illinois"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NanoInk, Inc., Skokie, Illinois","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5008077391"],"corresponding_institution_ids":[],"apc_list":{"value":1500,"currency":"USD","value_usd":1500},"apc_paid":null,"fwci":2.1138,"has_fulltext":false,"cited_by_count":21,"citation_normalized_percentile":{"value":0.85363551,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"32","issue":"1","first_page":"49","last_page":"59"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.0015999999595806003,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dip-pen-nanolithography","display_name":"dip-pen nanolithography","score":0.9580000042915344},{"id":"https://openalex.org/keywords/scanning-probe-lithography","display_name":"scanning probe lithography","score":0.753000020980835},{"id":"https://openalex.org/keywords/planarity","display_name":"planarity","score":0.4320000112056732},{"id":"https://openalex.org/keywords/nanomanufacturing","display_name":"nanomanufacturing","score":0.7799999713897705}],"concepts":[{"id":"https://openalex.org/C46312889","wikidata":"https://www.wikidata.org/wiki/Q950502","display_name":"Nanomanufacturing","level":2,"score":0.8118236660957336},{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.781190037727356},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6870871186256409},{"id":"https://openalex.org/C179203168","wikidata":"https://www.wikidata.org/wiki/Q5279666","display_name":"Dip-pen nanolithography","level":5,"score":0.6548537611961365},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5699384212493896},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5517435669898987},{"id":"https://openalex.org/C2781122048","wikidata":"https://www.wikidata.org/wiki/Q15983064","display_name":"Fixture","level":2,"score":0.5130864381790161},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.492950439453125},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4792925715446472},{"id":"https://openalex.org/C2859760","wikidata":"https://www.wikidata.org/wiki/Q6839807","display_name":"Micropatterning","level":2,"score":0.4703022837638855},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.458334743976593},{"id":"https://openalex.org/C2779343474","wikidata":"https://www.wikidata.org/wiki/Q3109175","display_name":"Context (archaeology)","level":2,"score":0.444709837436676},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4383845925331116},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4284549951553345},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.36636611819267273},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.24944135546684265},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.20569807291030884},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.07800978422164917},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1002/sca.20175","doi":"https://doi.org/10.1002/sca.20175","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sca.20175","pdf_url":null,"source":{"id":"https://openalex.org/S51527640","display_name":"Scanning","issn_l":"0161-0457","issn":["0161-0457","1932-8745"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-20","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scanning","raw_type":"journal-article"},{"id":"pmid:20496441","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/20496441","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scanning","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":26,"referenced_works":["https://openalex.org/W1971644457","https://openalex.org/W1976806346","https://openalex.org/W1979069790","https://openalex.org/W1984377271","https://openalex.org/W1986501756","https://openalex.org/W1986838720","https://openalex.org/W1988821091","https://openalex.org/W1991304540","https://openalex.org/W1992679299","https://openalex.org/W2000334486","https://openalex.org/W2002029096","https://openalex.org/W2014859011","https://openalex.org/W2015498249","https://openalex.org/W2019657560","https://openalex.org/W2021826257","https://openalex.org/W2022944483","https://openalex.org/W2049129795","https://openalex.org/W2069601286","https://openalex.org/W2072428925","https://openalex.org/W2084505875","https://openalex.org/W2084803145","https://openalex.org/W2104429343","https://openalex.org/W2126853555","https://openalex.org/W2138201532","https://openalex.org/W2152966127","https://openalex.org/W2172151753"],"related_works":["https://openalex.org/W2036696467","https://openalex.org/W2087278857","https://openalex.org/W1965872039","https://openalex.org/W2118284767","https://openalex.org/W2159844532","https://openalex.org/W2079705643","https://openalex.org/W2137664653","https://openalex.org/W2024700173","https://openalex.org/W2580806313","https://openalex.org/W269855948"],"abstract_inverted_index":{"Scanning":[0],"probe":[1,15],"lithography":[2],"(SPL)":[3],"has":[4,65,88],"witnessed":[5],"a":[6,34,71,74,119,139,150,201,215,260,275],"dramatic":[7],"transformation":[8],"with":[9,20,96,144,154,174,207,279],"the":[10,109,114,133,147,177,221,226,231,244,251,265,268],"advent":[11],"of":[12,54,141,152,164,180,188,204,212,225,246,262,267],"two-dimensional":[13],"(2D)":[14],"arrays.":[16],"Although":[17,100],"early":[18],"work":[19],"single":[21],"probes":[22],"was":[23],"justifiably":[24],"assessed":[25],"as":[26],"being":[27],"too":[28],"slow":[29],"to":[30,43,93,107,113,146,171,176,243],"practically":[31],"apply":[32],"in":[33,149],"nanomanufacturing":[35,248],"context,":[36],"we":[37,116,235],"have":[38],"recently":[39],"demonstrated":[40],"throughputs":[41],"up":[42],"3x10(7)":[44],"microm(2)/h--in":[45],"some":[46],"cases":[47],"exceeding":[48],"e-beam":[49],"lithography--using":[50],"centimeter":[51,216],"square":[52,217],"arrays":[53],"55,000":[55,134],"tips":[56],"tailored":[57],"for":[58,73,122],"Dip":[59],"Pen":[60],"Nanolithography":[61],"(DPN).":[62],"Parallelizing":[63],"DPN":[64,205],"been":[66],"critical":[67],"because":[68],"there":[69],"exists":[70],"need":[72],"lithographic":[75],"process":[76],"that":[77,237],"is":[78],"not":[79],"only":[80],"high":[81,85],"throughput,":[82],"but":[83],"also":[84],"resolution":[86],"(DPN":[87],"shown":[89],"line":[90],"widths":[91],"down":[92],"14":[94],"nm)":[95],"massive":[97],"multiplexing":[98],"capabilities.":[99],"previous":[101],"methods":[102,224],"required":[103],"non-trivial":[104],"user":[105,156,165],"manipulation":[106,157],"bring":[108],"2D":[110,124],"array":[111,136,203],"level":[112,277],"substrate,":[115],"now":[117],"demonstrate":[118],"self-leveling":[120,227],"fixture":[121],"NanoInk's":[123,130],"nano":[125],"PrintArray.":[126],"When":[127],"mounted":[128],"on":[129],"NLP":[131],"2000,":[132],"tip":[135],"can":[137,167],"achieve":[138],"planarity":[140,170],"<0.1":[142],"degrees":[143,173],"respect":[145,175],"substrate":[148],"matter":[151],"seconds,":[153],"no":[155],"required.":[158],"Additional":[159],"fine-leveling":[160],"routines":[161],"(<2":[162],"min":[163],"interaction)":[166],"improve":[168],"this":[169,238],"<0.002":[172],"substrate-a":[178],"Z-difference":[179],"less":[181],"than":[182],"600":[183],"nm":[184],"across":[185,214],"1":[186],"cm(2)":[187],"surface":[189],"area.":[190],"We":[191,219],"herein":[192],"show":[193],"highly":[194],"homogeneous":[195,281],"etch-resist":[196],"nanostructure":[197],"results":[198],"patterned":[199],"from":[200],"self-leveled":[202],"pens,":[206],"feature":[208],"size":[209],"standard":[210],"deviation":[211],"<6%":[213],"sample.":[218],"illustrate":[220],"mechanisms":[222],"and":[223,229,272],"fixture,":[228],"detail":[230],"advantages":[232],"thereof.":[233],"Finally,":[234],"emphasize":[236],"methodology":[239],"brings":[240],"us":[241],"closer":[242],"goal":[245],"true":[247],"by":[249,257],"automating":[250],"leveling":[252],"process,":[253,271],"reducing":[254],"setup":[255],"time":[256],"at":[258],"least":[259],"factor":[261],"10,":[263],"enhancing":[264],"ease":[266],"overall":[269],"printing":[270],"ultimately":[273],"ensuring":[274],"more":[276],"device":[278],"subsequently":[280],"nanostructures.":[282]},"counts_by_year":[{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":4},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":5},{"year":2012,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}