{"id":"https://openalex.org/W2025985686","doi":"https://doi.org/10.1116/1.579676","title":"X-ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al2O3 interfacial chemical compatibility","display_name":"X-ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al2O3 interfacial chemical compatibility","publication_year":1995,"publication_date":"1995-07-01","ids":{"openalex":"https://openalex.org/W2025985686","doi":"https://doi.org/10.1116/1.579676","mag":"2025985686"},"language":"en","primary_location":{"id":"doi:10.1116/1.579676","doi":"https://doi.org/10.1116/1.579676","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.579676","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5048389611","display_name":"Jean\u2010Fran\u00e7ois Silvain","orcid":"https://orcid.org/0000-0002-5881-6833","observed_orcids":["https://orcid.org/0000-0002-5881-6833"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. F. Silvain","raw_affiliation_strings":["Laboratoire de Chimie du Solide, Centre National de la Recherche Scientifique, F-33405 Talence, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Chimie du Solide, Centre National de la Recherche Scientifique, F-33405 Talence, France","institution_ids":["https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078261798","display_name":"J.C. Bihr","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. C. Bihr","raw_affiliation_strings":["Laboratoire de Chimie du Solide, Centre National de la Recherche Scientifique, F-33405 Talence, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Chimie du Solide, Centre National de la Recherche Scientifique, F-33405 Talence, France","institution_ids":["https://openalex.org/I1294671590"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015560232","display_name":"Marc Alnot","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4405264217","display_name":"Universit\u00e9 Henri Poincar\u00e9","ror":"https://ror.org/019wrwh65","country_code":"FR","type":"education","lineage":["https://openalex.org/I4405264217","https://openalex.org/I90183372"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Alnot","raw_affiliation_strings":["Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I4405264217"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110138402","display_name":"Jacques Lambert","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4405264217","display_name":"Universit\u00e9 Henri Poincar\u00e9","ror":"https://ror.org/019wrwh65","country_code":"FR","type":"education","lineage":["https://openalex.org/I4405264217","https://openalex.org/I90183372"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Lambert","raw_affiliation_strings":["Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I4405264217"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110743650","display_name":"Jean Jacques Ehrhardt","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4405264217","display_name":"Universit\u00e9 Henri Poincar\u00e9","ror":"https://ror.org/019wrwh65","country_code":"FR","type":"education","lineage":["https://openalex.org/I4405264217","https://openalex.org/I90183372"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. J. Ehrhardt","raw_affiliation_strings":["Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Chimie Physique pour l\u2019Environnement, Unit\u00e9 Mixte de Recherche (UMR), Centre National de la Recherche Scientifique Universit\u00e9 Henri Poincar\u00e9 Nancy I, F-54600 Villers-l\u00e8s-Nancy, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I4405264217"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.9254,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":{"value":0.66979729,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"13","issue":"4","first_page":"1893","last_page":"1900"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.43140000104904175,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.43140000104904175,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.3361999988555908,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11100","display_name":"Intermetallics and Advanced Alloy Properties","score":0.10209999978542328,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/intermetallic-compounds","display_name":"intermetallic compounds","score":0.6079999804496765},{"id":"https://openalex.org/keywords/surface-oxidation","display_name":"surface oxidation","score":0.6340000033378601},{"id":"https://openalex.org/keywords/al2o3-protective-layer","display_name":"Al2O3 protective layer","score":0.8500000238418579},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.7540000081062317},{"id":"https://openalex.org/keywords/sapphire-substrate","display_name":"sapphire substrate","score":0.6790000200271606},{"id":"https://openalex.org/keywords/xps-depth-profiles","display_name":"XPS depth profiles","score":0.6380000114440918},{"id":"https://openalex.org/keywords/interface-sharpness","display_name":"interface sharpness","score":0.5249999761581421}],"concepts":[{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.9267966747283936},{"id":"https://openalex.org/C2780289051","wikidata":"https://www.wikidata.org/wiki/Q7023815","display_name":"Nial","level":4,"score":0.8509401679039001},{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.7941395044326782},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.6708100438117981},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6631695628166199},{"id":"https://openalex.org/C27501479","wikidata":"https://www.wikidata.org/wiki/Q428069","display_name":"Intermetallic","level":3,"score":0.543094277381897},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5175556540489197},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5018668174743652},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.4658760726451874},{"id":"https://openalex.org/C2780064504","wikidata":"https://www.wikidata.org/wiki/Q127583","display_name":"Sapphire","level":3,"score":0.4615042805671692},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.45570242404937744},{"id":"https://openalex.org/C33893257","wikidata":"https://www.wikidata.org/wiki/Q905243","display_name":"Electron spectroscopy","level":3,"score":0.4220725893974304},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.34381362795829773},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.27411752939224243},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2071385681629181},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17239555716514587},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.14159256219863892},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.08113592863082886},{"id":"https://openalex.org/C2780026712","wikidata":"https://www.wikidata.org/wiki/Q37756","display_name":"Alloy","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.579676","doi":"https://doi.org/10.1116/1.579676","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.579676","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2050248532","https://openalex.org/W2035137700","https://openalex.org/W2039084019","https://openalex.org/W1965333823","https://openalex.org/W2120651044","https://openalex.org/W2070768487","https://openalex.org/W2130385068","https://openalex.org/W2006786575","https://openalex.org/W2995546528","https://openalex.org/W2056800746"],"abstract_inverted_index":{"\u03b2-NiAl":[0],"thin":[1,12],"films":[2,15,43],"were":[3,26,44],"prepared":[4],"by":[5,28,78,104],"physical":[6],"vapor":[7],"deposition":[8,47],"(PVD)":[9],"either":[10],"on":[11,16,20],"PVD":[13],"Al2O3":[14,130],"Si":[17],"substrates":[18],"or":[19],"sapphire":[21],"single":[22,100],"crystals.":[23],"These":[24],"samples":[25],"characterized":[27,103],"x-ray":[29,38],"diffraction":[30],"and":[31,37,54,69,95],"electron":[32,35,56],"spectroscopies":[33],"[Auger":[34],"spectroscopy":[36,40],"photoelectron":[39],"(XPS)].":[41],"Crystalline":[42],"obtained":[45],"after":[46],"at":[48,118],"room":[49],"temperature.":[50],"XPS":[51],"depth":[52],"profiles":[53],"transmission":[55],"microscopy":[57],"cross":[58],"sections":[59],"show":[60],"that":[61,70],"the":[62,79,84,92,126],"NiAl\u2013Al2O3":[63],"interface":[64],"is":[65,89],"sharp":[66],"(1":[67],"nm)":[68],"NiAl":[71],"oxidation":[72,123],"occurs.":[73],"Ni":[74,96],"remains":[75],"chemically":[76],"unaffected":[77],"presence":[80],"of":[81,86,110,115,128],"oxygen":[82],"while":[83],"formation":[85,127],"Al3+":[87],"compounds":[88],"discussed.":[90],"Within":[91],"film":[93],"Al":[94],"appear":[97],"in":[98],"a":[99],"chemical":[101],"environment":[102],"binding":[105],"energies":[106],"close":[107],"to":[108],"those":[109],"pure":[111],"intermetallic":[112],"compounds.":[113],"Annealing":[114],"these":[116],"wafers":[117],"600":[119],"\u00b0C":[120],"induces":[121],"surface":[122],"and,":[124],"particularly,":[125],"an":[129],"protective":[131],"layer.":[132]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":3},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}