{"id":"https://openalex.org/W2024344441","doi":"https://doi.org/10.1116/1.1584037","title":"Fabrication of microstructured copper on an indium\u2013tin\u2013oxide surface using a micropatterned self-assembled monolayer as a template","display_name":"Fabrication of microstructured copper on an indium\u2013tin\u2013oxide surface using a micropatterned self-assembled monolayer as a template","publication_year":2003,"publication_date":"2003-06-30","ids":{"openalex":"https://openalex.org/W2024344441","doi":"https://doi.org/10.1116/1.1584037","mag":"2024344441"},"language":"en","primary_location":{"id":"doi:10.1116/1.1584037","doi":"https://doi.org/10.1116/1.1584037","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1584037","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Shuuichi Asakura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shuuichi Asakura","raw_affiliation_strings":["Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082390180","display_name":"Mitsuhito Hirota","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mitsuhito Hirota","raw_affiliation_strings":["Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5033412628","display_name":"Akio Fuwa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akio Fuwa","raw_affiliation_strings":["Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Graduate School of Science and Engineering, Waseda University, Okubo, Shinjuku-ku, Tokyo 169-8555, Japan","institution_ids":["https://openalex.org/I150744194"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I150744194"],"apc_list":null,"apc_paid":null,"fwci":1.2547,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.74539683,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"21","issue":"4","first_page":"1152","last_page":"1156"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.5386000275611877,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.5386000275611877,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.36160001158714294,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.056699998676776886,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/copper-microstructure","display_name":"copper microstructure","score":0.9610000252723694},{"id":"https://openalex.org/keywords/indium-tin-oxide","display_name":"indium tin oxide","score":0.7990000247955322},{"id":"https://openalex.org/keywords/self-assembled-monolayers","display_name":"self-assembled monolayers","score":0.8130000233650208},{"id":"https://openalex.org/keywords/octadecyltrimethoxysilane","display_name":"octadecyltrimethoxysilane","score":0.9959999918937683},{"id":"https://openalex.org/keywords/micropatterning","display_name":"micropatterning","score":0.753000020980835},{"id":"https://openalex.org/keywords/selective-electrodeposition","display_name":"selective electrodeposition","score":0.847000002861023},{"id":"https://openalex.org/keywords/template-fabrication","display_name":"template fabrication","score":0.4569999873638153},{"id":"https://openalex.org/keywords/surface-chemical-reactivity","display_name":"surface chemical reactivity","score":0.6449999809265137}],"concepts":[{"id":"https://openalex.org/C32737372","wikidata":"https://www.wikidata.org/wiki/Q417718","display_name":"Indium tin oxide","level":3,"score":0.8335483074188232},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7725372314453125},{"id":"https://openalex.org/C7070889","wikidata":"https://www.wikidata.org/wiki/Q902488","display_name":"Monolayer","level":2,"score":0.7642009258270264},{"id":"https://openalex.org/C131649739","wikidata":"https://www.wikidata.org/wiki/Q1121115","display_name":"Self-assembled monolayer","level":3,"score":0.7196322679519653},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.6001538038253784},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.5791786909103394},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.5442606806755066},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.49662691354751587},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4647979140281677},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.45212650299072266},{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.43268856406211853},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.32382702827453613},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.21821773052215576},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.21015682816505432},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.17137083411216736},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.1584037","doi":"https://doi.org/10.1116/1.1584037","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1584037","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320311508","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":29,"referenced_works":["https://openalex.org/W1958106671","https://openalex.org/W1963612962","https://openalex.org/W1971056748","https://openalex.org/W1978703207","https://openalex.org/W1981237622","https://openalex.org/W1998355093","https://openalex.org/W1998658858","https://openalex.org/W1999945429","https://openalex.org/W2012605576","https://openalex.org/W2022735031","https://openalex.org/W2023059568","https://openalex.org/W2024202915","https://openalex.org/W2025489687","https://openalex.org/W2026599441","https://openalex.org/W2030027825","https://openalex.org/W2043349141","https://openalex.org/W2043540384","https://openalex.org/W2048691985","https://openalex.org/W2050351206","https://openalex.org/W2054836251","https://openalex.org/W2063580300","https://openalex.org/W2065189423","https://openalex.org/W2067802319","https://openalex.org/W2084897065","https://openalex.org/W2085012111","https://openalex.org/W2088397228","https://openalex.org/W2134221635","https://openalex.org/W2136056392","https://openalex.org/W4238361716"],"related_works":["https://openalex.org/W2014018690","https://openalex.org/W2049365502","https://openalex.org/W940513942","https://openalex.org/W2074526561","https://openalex.org/W2024029088","https://openalex.org/W1972460659","https://openalex.org/W2011922390","https://openalex.org/W2053302455","https://openalex.org/W2026845003","https://openalex.org/W2026721828"],"abstract_inverted_index":{"The":[0],"difference":[1],"in":[2,42,46],"chemical":[3],"reactivity":[4],"between":[5],"indium\u2013tin\u2013oxide":[6],"(ITO)":[7],"and":[8],"self-assembled":[9],"monolayer":[10],"(SAM)":[11],"surfaces":[12],"was":[13,39],"used":[14],"to":[15,48,81],"fabricate":[16],"copper":[17],"(Cu)":[18],"microstructures.":[19],"ITO":[20,70,98],"substrates":[21],"coated":[22],"with":[23,87],"octadecyltrimethoxysilane":[24],"(ODS)\u2013SAM":[25],"were":[26,93],"photolithographically":[27],"micropatterned":[28,37],"using":[29],"vacuum":[30],"ultraviolet":[31],"(VUV)":[32],"light.":[33],"Each":[34],"of":[35,68],"the":[36,65,69,73,97],"samples":[38],"subsequently":[40],"immersed":[41],"an":[43],"electrodeposition":[44,61],"bath":[45],"order":[47],"deposit":[49],"Cu":[50,60,83,85],"on":[51,64,96],"its":[52],"surface.":[53,99],"As":[54],"confirmed":[55],"by":[56],"atomic":[57],"force":[58],"microscopy,":[59],"proceeded":[62],"selectively":[63],"VUV-irradiated":[66],"areas":[67],"surface":[71,75],"while":[72],"ODS\u2013SAM":[74],"served":[76],"effectively":[77],"as":[78],"a":[79],"mask":[80],"block":[82],"deposition.":[84],"microstructures":[86],"7.5":[88,90],"\u00d7":[89],"\u03bcm2":[91],"features":[92],"successfully":[94],"fabricated":[95]},"counts_by_year":[{"year":2023,"cited_by_count":1}],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}