{"id":"https://openalex.org/W2023901648","doi":"https://doi.org/10.1116/1.1688365","title":"Power supply with arc handling for high peak power magnetron sputtering","display_name":"Power supply with arc handling for high peak power magnetron sputtering","publication_year":2004,"publication_date":"2004-07-01","ids":{"openalex":"https://openalex.org/W2023901648","doi":"https://doi.org/10.1116/1.1688365","mag":"2023901648"},"language":"en","primary_location":{"id":"doi:10.1116/1.1688365","doi":"https://doi.org/10.1116/1.1688365","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1688365","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5064511087","display_name":"David J. Christie","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095908","display_name":"Advanced Energy (United States)","ror":"https://ror.org/00rs9dy63","country_code":"US","type":"company","lineage":["https://openalex.org/I4210095908"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. J. Christie","raw_affiliation_strings":["Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525","institution_ids":["https://openalex.org/I4210095908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075733965","display_name":"Fernando G. Tomasel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095908","display_name":"Advanced Energy (United States)","ror":"https://ror.org/00rs9dy63","country_code":"US","type":"company","lineage":["https://openalex.org/I4210095908"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"F. Tomasel","raw_affiliation_strings":["Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525","institution_ids":["https://openalex.org/I4210095908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112769365","display_name":"W.D. Sproul","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095908","display_name":"Advanced Energy (United States)","ror":"https://ror.org/00rs9dy63","country_code":"US","type":"company","lineage":["https://openalex.org/I4210095908"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"W. D. Sproul","raw_affiliation_strings":["Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525","institution_ids":["https://openalex.org/I4210095908"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5006350948","display_name":"D. C. Carter","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095908","display_name":"Advanced Energy (United States)","ror":"https://ror.org/00rs9dy63","country_code":"US","type":"company","lineage":["https://openalex.org/I4210095908"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. C. Carter","raw_affiliation_strings":["Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Energy Industries, Inc., 1625 Sharp Point Drive, Fort Collins, Colorado\u200980525","institution_ids":["https://openalex.org/I4210095908"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210095908"],"apc_list":null,"apc_paid":null,"fwci":0.9497,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.76412291,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"22","issue":"4","first_page":"1415","last_page":"1419"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.9096999764442444,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.9096999764442444,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.06859999895095825,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.013299999758601189,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/high-power-impulse-magnetron-sputtering","display_name":"high power impulse magnetron sputtering","score":0.8859999775886536},{"id":"https://openalex.org/keywords/power-supply-design","display_name":"power supply design","score":0.7570000290870667},{"id":"https://openalex.org/keywords/high-peak-power","display_name":"high peak power","score":0.6660000085830688},{"id":"https://openalex.org/keywords/macroparticles","display_name":"macroparticles","score":0.6179999709129333},{"id":"https://openalex.org/keywords/target-damage","display_name":"target damage","score":0.9409999847412109},{"id":"https://openalex.org/keywords/plasma-assisted-ignition","display_name":"plasma ignition","score":0.7139999866485596},{"id":"https://openalex.org/keywords/discharge-characteristics","display_name":"discharge characteristics","score":0.45100000500679016}],"concepts":[{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.8876565098762512},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6763224601745605},{"id":"https://openalex.org/C114375839","wikidata":"https://www.wikidata.org/wiki/Q207456","display_name":"Electric arc","level":3,"score":0.6362378597259521},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.6139876842498779},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5669382214546204},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.5437986850738525},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5317681431770325},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5198488831520081},{"id":"https://openalex.org/C97039730","wikidata":"https://www.wikidata.org/wiki/Q552565","display_name":"Pulsed power","level":3,"score":0.5034276843070984},{"id":"https://openalex.org/C88182573","wikidata":"https://www.wikidata.org/wiki/Q1139740","display_name":"High voltage","level":3,"score":0.5032357573509216},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.47623446583747864},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.46273645758628845},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.4377990961074829},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.3702852129936218},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.16731083393096924},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.13941973447799683},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.10272216796875},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.09768372774124146},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09421059489250183},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.07272541522979736},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.1688365","doi":"https://doi.org/10.1116/1.1688365","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1688365","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":17,"referenced_works":["https://openalex.org/W1963495660","https://openalex.org/W1966636545","https://openalex.org/W1977309841","https://openalex.org/W1979287915","https://openalex.org/W1981966175","https://openalex.org/W1993760163","https://openalex.org/W2004982340","https://openalex.org/W2010378341","https://openalex.org/W2015050250","https://openalex.org/W2017138464","https://openalex.org/W2023755858","https://openalex.org/W2051944828","https://openalex.org/W2053094013","https://openalex.org/W2056197311","https://openalex.org/W2072605827","https://openalex.org/W2086277883","https://openalex.org/W2152898362"],"related_works":["https://openalex.org/W2078109349","https://openalex.org/W2101383941","https://openalex.org/W2368589087","https://openalex.org/W7028894480","https://openalex.org/W2356864420","https://openalex.org/W7214775356","https://openalex.org/W2386708173","https://openalex.org/W2520175878","https://openalex.org/W2073681324","https://openalex.org/W2248243616"],"abstract_inverted_index":{"High":[0],"power":[1,57,95],"pulsed":[2],"magnetron":[3,20],"sputtering":[4,21,107],"(HPPMS)":[5],"can":[6],"generate":[7,27],"a":[8,103],"dense":[9],"plasma":[10,92],"with":[11,137],"high":[12,115],"target":[13,30,44],"material":[14],"ion":[15],"content,":[16],"using":[17],"essentially":[18],"conventional":[19],"equipment.":[22],"However,":[23],"process":[24],"arcs,":[25],"which":[26],"macroparticles":[28],"and":[29,43,81,124,140,149],"damage,":[31],"are":[32],"not":[33],"avoidable":[34],"due":[35],"especially":[36],"to":[37,64,69],"imperfections":[38],"in":[39],"vacuum":[40],"system":[41],"hardware":[42],"materials.":[45],"Arc":[46],"handling":[47,127],"is":[48,135],"required":[49],"for":[50,88,121,125,146,150],"practical":[51,100],"application":[52,101],"of":[53,60,102,106,143],"HPPMS.":[54],"An":[55],"experimental":[56],"supply":[58,96,119],"capable":[59],"peak":[61,67,116,129],"powers":[62],"up":[63],"3":[65],"MW,":[66],"currents":[68,130],"3000":[70],"A,":[71],"at":[72,114,128],"discharge":[73,145],"voltages":[74],"reaching":[75],"2":[76],"kV":[77],"has":[78,84],"been":[79],"designed":[80],"built.":[82],"It":[83],"voltage":[85,141],"ring-up":[86],"capability":[87],"pulse":[89,91],"by":[90],"ignition.":[93],"This":[94],"technology":[97],"enables":[98],"the":[99,132,144],"whole":[104],"range":[105,134],"processes,":[108],"based":[109],"on":[110],"pulsing":[111],"magnetrons":[112],"operating":[113],"powers.":[117],"Power":[118],"performance":[120],"typical":[122,147],"pulses":[123,148],"arc":[126],"into":[131],"kiloamp":[133],"shown":[136],"temporal":[138],"current":[139],"characteristics":[142],"arcing":[151],"operation.":[152]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}