{"id":"https://openalex.org/W2022959249","doi":"https://doi.org/10.1016/0022-3093(94)90715-3","title":"Thermal oxidation mechanism based on formation and diffusion of volatile SiO molecules","display_name":"Thermal oxidation mechanism based on formation and diffusion of volatile SiO molecules","publication_year":1994,"publication_date":"1994-11-01","ids":{"openalex":"https://openalex.org/W2022959249","doi":"https://doi.org/10.1016/0022-3093(94)90715-3","mag":"2022959249"},"language":"en","primary_location":{"id":"doi:10.1016/0022-3093(94)90715-3","doi":"https://doi.org/10.1016/0022-3093(94)90715-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0022-3093(94)90715-3","pdf_url":null,"source":{"id":"https://openalex.org/S59020844","display_name":"Journal of Non-Crystalline Solids","issn_l":"0022-3093","issn":["0022-3093","1873-4812"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Non-Crystalline Solids","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103812542","display_name":"Yuji Takakuwa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Yuji Takakuwa","raw_affiliation_strings":["Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113602716","display_name":"Mizuhisa Nihei","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mizuhisa Nihei","raw_affiliation_strings":["Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044747751","display_name":"Tetsuhiro Horie","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuhiro Horie","raw_affiliation_strings":["Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111920131","display_name":"Nobuo Miyamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Nobuo Miyamoto","raw_affiliation_strings":["Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"Research Institute of Electrical Communication, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980, Japan#TAB#","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5103812542"],"corresponding_institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"],"apc_list":{"value":3380,"currency":"USD","value_usd":3380},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":35,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"179","issue":null,"first_page":"345","last_page":"353"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9775000214576721,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9775000214576721,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.00839999970048666,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.001500000013038516,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thermal-oxidation-of-silicon","display_name":"thermal oxidation of silicon","score":0.8659999966621399},{"id":"https://openalex.org/keywords/sio-desorption","display_name":"SiO desorption","score":0.9049999713897705},{"id":"https://openalex.org/keywords/si-sio2-interface","display_name":"Si/SiO2 interface","score":0.7979999780654907},{"id":"https://openalex.org/keywords/point-defects","display_name":"point defects","score":0.6159999966621399},{"id":"https://openalex.org/keywords/vacancies","display_name":"vacancies","score":0.578000009059906},{"id":"https://openalex.org/keywords/self-interstitials","display_name":"self-interstitials","score":0.9330000281333923},{"id":"https://openalex.org/keywords/oxide-decomposition","display_name":"oxide decomposition","score":0.492000013589859},{"id":"https://openalex.org/keywords/oxidation-kinetics","display_name":"oxidation kinetics","score":0.5550000071525574},{"id":"https://openalex.org/keywords/18o-isotope-exchange","display_name":"18O isotope exchange","score":0.6759999990463257}],"concepts":[{"id":"https://openalex.org/C2779281663","wikidata":"https://www.wikidata.org/wiki/Q1549368","display_name":"Thermal oxidation","level":3,"score":0.7078024744987488},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.6907376050949097},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.6234489679336548},{"id":"https://openalex.org/C162711632","wikidata":"https://www.wikidata.org/wiki/Q905514","display_name":"Desorption","level":3,"score":0.5720869302749634},{"id":"https://openalex.org/C148898269","wikidata":"https://www.wikidata.org/wiki/Q1108792","display_name":"Kinetics","level":2,"score":0.5682772994041443},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.5392348766326904},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.5136637091636658},{"id":"https://openalex.org/C49133459","wikidata":"https://www.wikidata.org/wiki/Q602144","display_name":"Ultraviolet photoelectron spectroscopy","level":3,"score":0.49578842520713806},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.4895389974117279},{"id":"https://openalex.org/C124681953","wikidata":"https://www.wikidata.org/wiki/Q339062","display_name":"Decomposition","level":2,"score":0.4638972282409668},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.44124549627304077},{"id":"https://openalex.org/C32909587","wikidata":"https://www.wikidata.org/wiki/Q11369","display_name":"Molecule","level":2,"score":0.4268217384815216},{"id":"https://openalex.org/C2778836790","wikidata":"https://www.wikidata.org/wiki/Q5275435","display_name":"Diffusion barrier","level":3,"score":0.41723090410232544},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3793667256832123},{"id":"https://openalex.org/C159467904","wikidata":"https://www.wikidata.org/wiki/Q2001702","display_name":"Chemical physics","level":1,"score":0.3562449812889099},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.35513731837272644},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.2820069193840027},{"id":"https://openalex.org/C150394285","wikidata":"https://www.wikidata.org/wiki/Q180254","display_name":"Adsorption","level":2,"score":0.11973512172698975},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.11251553893089294},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.07565757632255554},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0022-3093(94)90715-3","doi":"https://doi.org/10.1016/0022-3093(94)90715-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0022-3093(94)90715-3","pdf_url":null,"source":{"id":"https://openalex.org/S59020844","display_name":"Journal of Non-Crystalline Solids","issn_l":"0022-3093","issn":["0022-3093","1873-4812"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Non-Crystalline Solids","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1610280891","https://openalex.org/W1965748144","https://openalex.org/W1980807023","https://openalex.org/W1986911324","https://openalex.org/W1999722931","https://openalex.org/W2010283703","https://openalex.org/W2014201750","https://openalex.org/W2020802000","https://openalex.org/W2020852718","https://openalex.org/W2024165975","https://openalex.org/W2026257039","https://openalex.org/W2033737066","https://openalex.org/W2036163287","https://openalex.org/W2039990201","https://openalex.org/W2040078151","https://openalex.org/W2044285232","https://openalex.org/W2053393978","https://openalex.org/W2064748496","https://openalex.org/W2070955757","https://openalex.org/W2075627238","https://openalex.org/W2081149800","https://openalex.org/W2082831033","https://openalex.org/W2086155010","https://openalex.org/W2093914900","https://openalex.org/W2165387140"],"related_works":["https://openalex.org/W2078353355","https://openalex.org/W4296156836","https://openalex.org/W2092873947","https://openalex.org/W2055015274","https://openalex.org/W4416182094","https://openalex.org/W2070482067","https://openalex.org/W1966299319","https://openalex.org/W62486330","https://openalex.org/W2145809964","https://openalex.org/W2129066149"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":2},{"year":2018,"cited_by_count":2},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":3},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-24T09:50:30.924529","created_date":"2016-06-24T00:00:00"}