{"id":"https://openalex.org/W2019720116","doi":"https://doi.org/10.1117/12.392101","title":"Gate CD control for full chip using total-process-proximity-based correction method","display_name":"Gate CD control for full chip using total-process-proximity-based correction method","publication_year":2000,"publication_date":"2000-07-19","ids":{"openalex":"https://openalex.org/W2019720116","doi":"https://doi.org/10.1117/12.392101","mag":"2019720116"},"language":"en","primary_location":{"id":"doi:10.1117/12.392101","doi":"https://doi.org/10.1117/12.392101","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.392101","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5042867486","display_name":"Byung-Ho Nam","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Byung-Ho Nam","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041569089","display_name":"Jong O Park","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jong O Park","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009541249","display_name":"Dai Jong Lee","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Dai Jong Lee","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073730696","display_name":"Jong Ho Cheong","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jong Ho Cheong","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110157819","display_name":"Young J. Hwang","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Young J. Hwang","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110089044","display_name":"Young Jin Song","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Young Jin Song","raw_affiliation_strings":["Hyundai Electronics Industries Co., Ltd. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hyundai Electronics Industries Co., Ltd. (South Korea)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"4066","issue":null,"first_page":"716","last_page":"716"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/attenuated-phase-shifting-mask","display_name":"attenuated phase shift mask","score":0.9660000205039978},{"id":"https://openalex.org/keywords/off-axis-illumination","display_name":"off-axis illumination","score":0.9919999837875366},{"id":"https://openalex.org/keywords/dram-fabrication","display_name":"DRAM fabrication","score":0.7540000081062317}],"concepts":[{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.7853931188583374},{"id":"https://openalex.org/C7366592","wikidata":"https://www.wikidata.org/wiki/Q1255620","display_name":"Dram","level":2,"score":0.7762759923934937},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.735549807548523},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.7147141695022583},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6750024557113647},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.6126213669776917},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5927676558494568},{"id":"https://openalex.org/C103088060","wikidata":"https://www.wikidata.org/wiki/Q1062839","display_name":"Error detection and correction","level":2,"score":0.5900954008102417},{"id":"https://openalex.org/C165005293","wikidata":"https://www.wikidata.org/wiki/Q1074500","display_name":"Chip","level":2,"score":0.5356786847114563},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.5180799961090088},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.45569103956222534},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.45155298709869385},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.44578444957733154},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.4424195885658264},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3978504538536072},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.35638630390167236},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.3166521191596985},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.26572805643081665},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.2457195520401001},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2016478180885315},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1394645869731903},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.10005223751068115},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.392101","doi":"https://doi.org/10.1117/12.392101","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.392101","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2067800175","https://openalex.org/W2036687678","https://openalex.org/W1966512888","https://openalex.org/W2034489479","https://openalex.org/W2107820960","https://openalex.org/W2054467652","https://openalex.org/W1975031781","https://openalex.org/W2014420527","https://openalex.org/W2007646402","https://openalex.org/W1964148583"],"abstract_inverted_index":{"In":[0],"this":[1,78],"study,":[2],"we":[3],"investigated":[4],"mask":[5,13],"errors,":[6],"photo":[7],"errors":[8,19],"with":[9],"attenuated":[10],"phase":[11],"shift":[12],"and":[14,17],"off-axis":[15],"illumination,":[16],"etch":[18,22],"in":[20,41,71],"dry":[21],"condition.":[23],"We":[24],"propose":[25],"that":[26],"total":[27],"process":[28,43],"proximity":[29],"correction":[30,56],"(TPPC),":[31],"a":[32],"concept":[33],"merging":[34],"every":[35],"step":[36],"error":[37],"correction,":[38],"is":[39],"essential":[40],"lithography":[42],"when":[44],"minimum":[45],"critical":[46],"dimension":[47],"(CD)":[48],"smaller":[49],"than":[50],"the":[51],"wavelength":[52],"of":[53,67],"radiation.":[54],"A":[55],"rule":[57],"table":[58],"was":[59],"experimentally":[60],"obtained":[61],"applying":[62],"TPPC":[63],"concept.":[64],"Process":[65],"capability":[66],"controlling":[68],"gate":[69],"CD":[70],"DRAM":[72],"fabrication":[73],"should":[74],"be":[75],"improved":[76],"by":[77],"method.":[79]},"counts_by_year":[],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}