{"id":"https://openalex.org/W2019534303","doi":"https://doi.org/10.4313/jkem.2010.23.6.497","title":"Energy Materials : Growth of Nano Structure Bi2Te3 Films using Modified MOCVD Technique","display_name":"Energy Materials : Growth of Nano Structure Bi2Te3 Films using Modified MOCVD Technique","publication_year":2010,"publication_date":"2010-06-01","ids":{"openalex":"https://openalex.org/W2019534303","doi":"https://doi.org/10.4313/jkem.2010.23.6.497","mag":"2019534303"},"language":"en","primary_location":{"id":"doi:10.4313/jkem.2010.23.6.497","doi":"https://doi.org/10.4313/jkem.2010.23.6.497","is_oa":true,"landing_page_url":"https://doi.org/10.4313/jkem.2010.23.6.497","pdf_url":"http://koreascience.or.kr:80/article/JAKO201020254045687.pdf","source":{"id":"https://openalex.org/S2764904510","display_name":"Journal of the Korean Institute of Electrical and Electronic Material Engineers","issn_l":"1226-7945","issn":["1226-7945","2288-3258"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["kci-registered"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Korean Institute of Electrical and Electronic Materials Engineers","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"http://koreascience.or.kr:80/article/JAKO201020254045687.pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101209328","display_name":"Hyun-Woo You","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]},{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyun Woo You","raw_affiliation_strings":["Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea","School of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]},{"raw_affiliation_string":"Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea","institution_ids":["https://openalex.org/I139264467"]},{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113970147","display_name":"Kyoo-Ho Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyoo Ho Jung","raw_affiliation_strings":["Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]},{"raw_affiliation_string":"Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea","institution_ids":["https://openalex.org/I139264467"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091351026","display_name":"Ju-Hyuk Yim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ju Hyuk Yim","raw_affiliation_strings":["Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020653904","display_name":"Kwang\u2010Chon Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kwang Chon Kim","raw_affiliation_strings":["Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","School of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]},{"raw_affiliation_string":"School of Electrical and Electronic Engineering, Yonsei University, Seoul 120-749, Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100413454","display_name":"Chan Park","orcid":"https://orcid.org/0000-0002-5104-3612","observed_orcids":["https://orcid.org/0000-0002-5104-3612"]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chan Park","raw_affiliation_strings":["Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea","Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, Korea","institution_ids":["https://openalex.org/I139264467"]},{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"last","author":{"id":null,"display_name":"Jin Sang Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jin Sang Kim","raw_affiliation_strings":["Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Center Materials Research Center, Korea Institute of Science and Technology(KIST), Seoul 136-791, Korea","institution_ids":["https://openalex.org/I58716616"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"23","issue":"6","first_page":"497","last_page":"501"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.0007999999797903001,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bismuth-telluride","display_name":"Bi2Te3","score":0.9210000038146973},{"id":"https://openalex.org/keywords/nanostructured-thin-films","display_name":"nanostructured thin films","score":0.8040000200271606},{"id":"https://openalex.org/keywords/gaas-substrate","display_name":"GaAs substrate","score":0.7910000085830688},{"id":"https://openalex.org/keywords/grain-size-control","display_name":"grain size control","score":0.7649999856948853},{"id":"https://openalex.org/keywords/reactor-pressure","display_name":"reactor pressure","score":0.902999997138977},{"id":"https://openalex.org/keywords/thermoelectric-materials","display_name":"thermoelectric materials","score":0.8330000042915344},{"id":"https://openalex.org/keywords/figure-of-merit","display_name":"figure of merit","score":0.7720000147819519}],"concepts":[{"id":"https://openalex.org/C175665537","wikidata":"https://www.wikidata.org/wiki/Q1924991","display_name":"Metalorganic vapour phase epitaxy","level":4,"score":0.8174700736999512},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7697086930274963},{"id":"https://openalex.org/C2780357685","wikidata":"https://www.wikidata.org/wiki/Q154357","display_name":"Nano-","level":2,"score":0.7527163624763489},{"id":"https://openalex.org/C192191005","wikidata":"https://www.wikidata.org/wiki/Q466491","display_name":"Grain size","level":2,"score":0.6495790481567383},{"id":"https://openalex.org/C98390173","wikidata":"https://www.wikidata.org/wiki/Q1492573","display_name":"Grain growth","level":3,"score":0.4699153006076813},{"id":"https://openalex.org/C2776578615","wikidata":"https://www.wikidata.org/wiki/Q5910801","display_name":"Hot pressing","level":2,"score":0.4195023477077484},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3935199975967407},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3613557517528534},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.35555940866470337},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.35202860832214355},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3463778495788574},{"id":"https://openalex.org/C199289684","wikidata":"https://www.wikidata.org/wiki/Q83353","display_name":"Mineralogy","level":1,"score":0.3320622444152832},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.12986400723457336},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.09777039289474487},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.05202522873878479},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.4313/jkem.2010.23.6.497","doi":"https://doi.org/10.4313/jkem.2010.23.6.497","is_oa":true,"landing_page_url":"https://doi.org/10.4313/jkem.2010.23.6.497","pdf_url":"http://koreascience.or.kr:80/article/JAKO201020254045687.pdf","source":{"id":"https://openalex.org/S2764904510","display_name":"Journal of the Korean Institute of Electrical and Electronic Material Engineers","issn_l":"1226-7945","issn":["1226-7945","2288-3258"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["kci-registered"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Korean Institute of Electrical and Electronic Materials Engineers","raw_type":"journal-article"},{"id":"mag:3192824783","doi":null,"is_oa":false,"landing_page_url":"http://dspace.kci.go.kr/handle/kci/17000","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":{"id":"doi:10.4313/jkem.2010.23.6.497","doi":"https://doi.org/10.4313/jkem.2010.23.6.497","is_oa":true,"landing_page_url":"https://doi.org/10.4313/jkem.2010.23.6.497","pdf_url":"http://koreascience.or.kr:80/article/JAKO201020254045687.pdf","source":{"id":"https://openalex.org/S2764904510","display_name":"Journal of the Korean Institute of Electrical and Electronic Material Engineers","issn_l":"1226-7945","issn":["1226-7945","2288-3258"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["kci-registered"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Korean Institute of Electrical and Electronic Materials Engineers","raw_type":"journal-article"},"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.75,"display_name":"Affordable and clean energy"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2019534303.pdf","grobid_xml":"https://content.openalex.org/works/W2019534303.grobid-xml"},"referenced_works_count":8,"referenced_works":["https://openalex.org/W1966119567","https://openalex.org/W1981167895","https://openalex.org/W1999324759","https://openalex.org/W2018858346","https://openalex.org/W2022218319","https://openalex.org/W2025853285","https://openalex.org/W2040054771","https://openalex.org/W2045540556"],"related_works":["https://openalex.org/W1993409931","https://openalex.org/W2090914313","https://openalex.org/W2053901357","https://openalex.org/W2051165759","https://openalex.org/W2603645625","https://openalex.org/W4281255871","https://openalex.org/W3192824783","https://openalex.org/W2163937945","https://openalex.org/W2043220192","https://openalex.org/W1538536789"],"abstract_inverted_index":{"Nano":[0],"structure":[1],"$Bi_2Te_3$":[2,68,108],"films":[3,69,109],"were":[4,25],"deposited":[5],"on":[6,21,59],"(100)":[7],"GaAs":[8],"substrates":[9],"using":[10,62],"a":[11,92],"modified":[12],"MOCVD":[13,30],"system":[14],"and":[15,39,50],"the":[16,22,51,54,85,87,97],"effect":[17],"of":[18,35,47,56,96,105,114],"growth":[19,55,103],"parameters":[20],"structural":[23],"properties":[24],"investigated.":[26],"Different":[27],"from":[28],"conventional":[29],"systems,":[31],"our":[32],"reactor":[33,78],"consist":[34],"pressure":[36,79,95],"control":[37],"unit":[38],"two":[40],"heating":[41],"zones":[42],";":[43],"one":[44],"for":[45,53,110],"formation":[46],"nano-sized":[48],"particles":[49,58],"other":[52],"nano":[57],"substrates.":[60],"By":[61],"this":[63],"instrument":[64],"we":[65,100],"successfully":[66],"grow":[67],"with":[70,91],"nano-grain":[71,106],"size.":[72,83],"The":[73],"film":[74],"grown":[75],"at":[76],"high":[77,111],"has":[80],"large":[81],"grain":[82,88],"On":[84],"contrast,":[86],"size":[89],"decreases":[90],"decrease":[93],"in":[94],"reactor.":[98],"Here,":[99],"introduce":[101],"new":[102],"methods":[104],"structured":[107],"thermoelectric":[112],"figure":[113],"merit.":[115]},"counts_by_year":[],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}