{"id":"https://openalex.org/W2019401607","doi":"https://doi.org/10.1117/12.2086039","title":"Base developable negative tone molecular resist based on epoxide cross-linking","display_name":"Base developable negative tone molecular resist based on epoxide cross-linking","publication_year":2015,"publication_date":"2015-03-23","ids":{"openalex":"https://openalex.org/W2019401607","doi":"https://doi.org/10.1117/12.2086039","mag":"2019401607"},"language":"en","primary_location":{"id":"doi:10.1117/12.2086039","doi":"https://doi.org/10.1117/12.2086039","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2086039","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5043469978","display_name":"Brandon L. Sharp","orcid":"https://orcid.org/0000-0002-3079-9074","observed_orcids":["https://orcid.org/0000-0002-3079-9074"]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Brandon Sharp","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059167082","display_name":"Richard A. Lawson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Richard A. Lawson","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042941702","display_name":"Ashten Fralick","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ashten Fralick","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034813557","display_name":"Hannah L. Narcross","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hannah Narcross","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059379711","display_name":"Jun Sung Chun","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I90965887","display_name":"SUNY Polytechnic Institute","ror":"https://ror.org/000fxgx19","country_code":"US","type":"education","lineage":["https://openalex.org/I90965887"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jun Sung Chun","raw_affiliation_strings":["SEMATECH Inc. (United States)","SUNY Polytechnic Institute (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SEMATECH Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"SUNY Polytechnic Institute (United States)","institution_ids":["https://openalex.org/I90965887"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079783999","display_name":"Mark O. Neisser","orcid":"https://orcid.org/0000-0002-3758-0534","observed_orcids":["https://orcid.org/0000-0002-3758-0534"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mark Neisser","raw_affiliation_strings":["Sematech, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sematech, Inc. (United States)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027096922","display_name":"Laren M. Tolbert","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Laren M. Tolbert","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113808570","display_name":"Clifford L. Henderson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130701444","display_name":"Georgia Institute of Technology","ror":"https://ror.org/01zkghx44","country_code":"US","type":"education","lineage":["https://openalex.org/I130701444"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Clifford L. Henderson","raw_affiliation_strings":["Georgia Institute of Technology (United States)","Georgia Institute of Technology, United States#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Georgia Institute of Technology (United States)","institution_ids":["https://openalex.org/I130701444"]},{"raw_affiliation_string":"Georgia Institute of Technology, United States#TAB#","institution_ids":["https://openalex.org/I130701444"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8326,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.66110044,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"9425","issue":null,"first_page":"94251S","last_page":"94251S"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/negative-tone-resist","display_name":"negative resist","score":0.8759999871253967},{"id":"https://openalex.org/keywords/polymerization-rate-control","display_name":"polymerization rate control","score":0.7329999804496765},{"id":"https://openalex.org/keywords/underlayer","display_name":"underlayer","score":0.4779999852180481},{"id":"https://openalex.org/keywords/dewetting","display_name":"dewetting","score":0.781000018119812},{"id":"https://openalex.org/keywords/imaging-performance","display_name":"imaging performance","score":0.5270000100135803}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8676199316978455},{"id":"https://openalex.org/C184651966","wikidata":"https://www.wikidata.org/wiki/Q906356","display_name":"Aqueous solution","level":2,"score":0.7373772859573364},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7307034730911255},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.702211856842041},{"id":"https://openalex.org/C42058472","wikidata":"https://www.wikidata.org/wiki/Q810214","display_name":"Base (topology)","level":2,"score":0.5797791481018066},{"id":"https://openalex.org/C134514944","wikidata":"https://www.wikidata.org/wiki/Q817136","display_name":"Wetting","level":2,"score":0.5742385387420654},{"id":"https://openalex.org/C44228677","wikidata":"https://www.wikidata.org/wiki/Q181898","display_name":"Polymerization","level":3,"score":0.5540223121643066},{"id":"https://openalex.org/C2780471494","wikidata":"https://www.wikidata.org/wiki/Q146505","display_name":"Solvent","level":2,"score":0.49999570846557617},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.33972451090812683},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3352760374546051},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3239210247993469},{"id":"https://openalex.org/C521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","level":2,"score":0.29251182079315186},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.17052647471427917},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1592702865600586},{"id":"https://openalex.org/C134306372","wikidata":"https://www.wikidata.org/wiki/Q7754","display_name":"Mathematical analysis","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2086039","doi":"https://doi.org/10.1117/12.2086039","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2086039","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1971944808","https://openalex.org/W2004722766","https://openalex.org/W2007916517","https://openalex.org/W2013247052","https://openalex.org/W2026311448","https://openalex.org/W2031264071","https://openalex.org/W2040829271","https://openalex.org/W2054989654","https://openalex.org/W2056788349","https://openalex.org/W2066368851","https://openalex.org/W2073607522","https://openalex.org/W2080416894","https://openalex.org/W6981496599"],"related_works":["https://openalex.org/W2056788349","https://openalex.org/W1970487387","https://openalex.org/W1982343946","https://openalex.org/W1984024390","https://openalex.org/W1981675742","https://openalex.org/W2123895137","https://openalex.org/W2069678656","https://openalex.org/W2031264071","https://openalex.org/W2908873626","https://openalex.org/W2013247052"],"abstract_inverted_index":{"A":[0],"negative":[1],"tone,":[2],"aqueous":[3,21,35,83],"base":[4,22,36,84],"developable":[5,14],"molecular":[6],"glass":[7],"resist,":[8,53],"3Ep,":[9],"is":[10,13],"presented":[11],"that":[12],"in":[15,31,68],"both":[16],"standard":[17],"organic":[18,32],"solvents":[19],"and":[20,37],"developers.":[23],"The":[24],"resist":[25],"shows":[26,38],"slightly":[27],"better":[28],"imaging":[29],"performance":[30],"solvent":[33],"versus":[34],"a":[39,49,58],"shift":[40],"of":[41,76],"E0":[42],"away":[43],"from":[44],"zero":[45],"dose.":[46],"Compared":[47],"to":[48,56,79],"previously":[50],"reported":[51],"4Ep":[52],"3Ep":[54,72],"appears":[55],"have":[57],"more":[59],"controlled":[60],"polymerization":[61],"rate":[62],"at":[63],"equivalent":[64],"conditions,":[65],"which":[66],"results":[67],"higher-quality":[69],"patterned":[70],"features.":[71],"also":[73],"requires":[74],"use":[75],"an":[77],"underlayer":[78],"avoid":[80],"de-wetting":[81],"during":[82],"development.":[85]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}