{"id":"https://openalex.org/W2018996752","doi":"https://doi.org/10.1016/s0040-6090(99)00166-2","title":"Fabrication and characterisation of thin low-temperature MBE-compatible silicon oxides of different stoichiometry","display_name":"Fabrication and characterisation of thin low-temperature MBE-compatible silicon oxides of different stoichiometry","publication_year":1999,"publication_date":"1999-07-01","ids":{"openalex":"https://openalex.org/W2018996752","doi":"https://doi.org/10.1016/s0040-6090(99)00166-2","mag":"2018996752"},"language":"en","primary_location":{"id":"doi:10.1016/s0040-6090(99)00166-2","doi":"https://doi.org/10.1016/s0040-6090(99)00166-2","is_oa":true,"landing_page_url":"https://doi.org/10.1016/s0040-6090(99)00166-2","pdf_url":"https://www.sciencedirect.com/science/article/pii/S0040609099001662","source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.sciencedirect.com/science/article/pii/S0040609099001662","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5076293876","display_name":"A Strass","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I40527276","display_name":"Universit\u00e4t der Bundeswehr M\u00fcnchen","ror":"https://ror.org/05kkv3f82","country_code":"DE","type":"education","lineage":["https://openalex.org/I1315109972","https://openalex.org/I40527276","https://openalex.org/I4387152969"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"A. Strass","raw_affiliation_strings":["Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany","institution_ids":["https://openalex.org/I40527276"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022861545","display_name":"Peter Bieringer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I40527276","display_name":"Universit\u00e4t der Bundeswehr M\u00fcnchen","ror":"https://ror.org/05kkv3f82","country_code":"DE","type":"education","lineage":["https://openalex.org/I1315109972","https://openalex.org/I40527276","https://openalex.org/I4387152969"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"P. Bieringer","raw_affiliation_strings":["Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany","institution_ids":["https://openalex.org/I40527276"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007167894","display_name":"W. H\u00e4nsch","orcid":"https://orcid.org/0000-0001-6948-5833","observed_orcids":["https://orcid.org/0000-0001-6948-5833"]},"institutions":[{"id":"https://openalex.org/I113306721","display_name":"Hiroshima University","ror":"https://ror.org/03t78wx29","country_code":"JP","type":"education","lineage":["https://openalex.org/I113306721"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"W. Hansch","raw_affiliation_strings":["Hiroshima University, Research Center for Nanodevices and Systems, 1-4-2 Kagamiyama, Higashi-Hiroshima 739, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hiroshima University, Research Center for Nanodevices and Systems, 1-4-2 Kagamiyama, Higashi-Hiroshima 739, Japan","institution_ids":["https://openalex.org/I113306721"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032064281","display_name":"Victor M. Fuenzalida","orcid":"https://orcid.org/0000-0002-5481-4646","observed_orcids":["https://orcid.org/0000-0002-5481-4646"]},"institutions":[{"id":"https://openalex.org/I69737025","display_name":"University of Chile","ror":"https://ror.org/047gc3g35","country_code":"CL","type":"education","lineage":["https://openalex.org/I69737025"]}],"countries":["CL"],"is_corresponding":false,"raw_author_name":"V. Fuenzalida","raw_affiliation_strings":["Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile","institution_ids":["https://openalex.org/I69737025"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024590349","display_name":"A.L. \u00c1lvarez","orcid":"https://orcid.org/0000-0002-5355-0300","observed_orcids":["https://orcid.org/0000-0002-5355-0300"]},"institutions":[{"id":"https://openalex.org/I69737025","display_name":"University of Chile","ror":"https://ror.org/047gc3g35","country_code":"CL","type":"education","lineage":["https://openalex.org/I69737025"]}],"countries":["CL"],"is_corresponding":false,"raw_author_name":"A. Alvarez","raw_affiliation_strings":["Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile","institution_ids":["https://openalex.org/I69737025"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109130503","display_name":"Jos\u00e9 Alberto Luna","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I69737025","display_name":"University of Chile","ror":"https://ror.org/047gc3g35","country_code":"CL","type":"education","lineage":["https://openalex.org/I69737025"]}],"countries":["CL"],"is_corresponding":false,"raw_author_name":"J. Luna","raw_affiliation_strings":["Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universidad de Chile, Facultad de Ciencias Fisicas y Matematicas, Departamento de Fisica, Avenida Blanco Encalada 2008, Casilla 487-3, Santiago, Chile","institution_ids":["https://openalex.org/I69737025"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064875033","display_name":"Ignacio Martil","orcid":"https://orcid.org/0000-0002-4856-4046","observed_orcids":["https://orcid.org/0000-0002-4856-4046","https://orcid.org/0000-0003-3240-3042"]},"institutions":[{"id":"https://openalex.org/I121748325","display_name":"Universidad Complutense de Madrid","ror":"https://ror.org/02p0gd045","country_code":"ES","type":"education","lineage":["https://openalex.org/I121748325"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"I. Martil","raw_affiliation_strings":["Universidad Complutense, Departamento de Fisica Aplicada III, Facultad de Ciencias Fisicas, Madrid 28040, Spain"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universidad Complutense, Departamento de Fisica Aplicada III, Facultad de Ciencias Fisicas, Madrid 28040, Spain","institution_ids":["https://openalex.org/I121748325"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065961252","display_name":"F. L. Mart\u00ednez","orcid":"https://orcid.org/0000-0002-7261-3514","observed_orcids":["https://orcid.org/0000-0002-7261-3514"]},"institutions":[{"id":"https://openalex.org/I121748325","display_name":"Universidad Complutense de Madrid","ror":"https://ror.org/02p0gd045","country_code":"ES","type":"education","lineage":["https://openalex.org/I121748325"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"F.L. Martinez","raw_affiliation_strings":["Universidad Complutense, Departamento de Fisica Aplicada III, Facultad de Ciencias Fisicas, Madrid 28040, Spain"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universidad Complutense, Departamento de Fisica Aplicada III, Facultad de Ciencias Fisicas, Madrid 28040, Spain","institution_ids":["https://openalex.org/I121748325"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5001167141","display_name":"I. Eisele","orcid":"https://orcid.org/0009-0002-9432-6097","observed_orcids":["https://orcid.org/0009-0002-9432-6097"]},"institutions":[{"id":"https://openalex.org/I40527276","display_name":"Universit\u00e4t der Bundeswehr M\u00fcnchen","ror":"https://ror.org/05kkv3f82","country_code":"DE","type":"education","lineage":["https://openalex.org/I1315109972","https://openalex.org/I40527276","https://openalex.org/I4387152969"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"I. Eisele","raw_affiliation_strings":["Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Universit\u00e4t der Bundeswehr M\u00fcnchen, Fakult\u00e4t f\u00fcr Elektrotechnik, Institut f\u00fcr Physik, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germany","institution_ids":["https://openalex.org/I40527276"]}]}],"institutions":[],"countries_distinct_count":4,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5076293876"],"corresponding_institution_ids":["https://openalex.org/I40527276"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":1.283,"has_fulltext":true,"cited_by_count":16,"citation_normalized_percentile":{"value":0.77155434,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"349","issue":"1-2","first_page":"135","last_page":"146"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.0010000000474974513,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-oxynitride","display_name":"silicon oxynitride","score":0.9800000190734863},{"id":"https://openalex.org/keywords/stoichiometry","display_name":"stoichiometry","score":0.7149999737739563},{"id":"https://openalex.org/keywords/electrical-properties","display_name":"electrical properties","score":0.7049999833106995},{"id":"https://openalex.org/keywords/optical-properties","display_name":"optical properties","score":0.9990000128746033},{"id":"https://openalex.org/keywords/mos-structures","display_name":"MOS structures","score":0.800000011920929},{"id":"https://openalex.org/keywords/ultra-high-vacuum-deposition","display_name":"ultrahigh vacuum deposition","score":0.6790000200271606}],"concepts":[{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.861399233341217},{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.7434701919555664},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.6998969912528992},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6987016201019287},{"id":"https://openalex.org/C61441594","wikidata":"https://www.wikidata.org/wiki/Q132814","display_name":"Evaporation","level":2,"score":0.6751641631126404},{"id":"https://openalex.org/C18293161","wikidata":"https://www.wikidata.org/wiki/Q898774","display_name":"Ellipsometry","level":3,"score":0.6457576155662537},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6246855854988098},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5370418429374695},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5343286991119385},{"id":"https://openalex.org/C2780547777","wikidata":"https://www.wikidata.org/wiki/Q368967","display_name":"Rutherford backscattering spectrometry","level":3,"score":0.5218914151191711},{"id":"https://openalex.org/C144082473","wikidata":"https://www.wikidata.org/wiki/Q213185","display_name":"Stoichiometry","level":2,"score":0.5079486966133118},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4784562587738037},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.46552130579948425},{"id":"https://openalex.org/C32891209","wikidata":"https://www.wikidata.org/wiki/Q483666","display_name":"Spectroscopy","level":2,"score":0.4474494457244873},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.42913568019866943},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.14489367604255676},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.13923537731170654},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.12496951222419739},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.1084173321723938},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.08756938576698303},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/s0040-6090(99)00166-2","doi":"https://doi.org/10.1016/s0040-6090(99)00166-2","is_oa":true,"landing_page_url":"https://doi.org/10.1016/s0040-6090(99)00166-2","pdf_url":"https://www.sciencedirect.com/science/article/pii/S0040609099001662","source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},{"id":"pmh:oai:www.ucm.es:26886","doi":null,"is_oa":true,"landing_page_url":"https://eprints.ucm.es/id/eprint/26886/1/Martil%2C83.pdf","pdf_url":"https://eprints.ucm.es/id/eprint/26886/1/Martil%2C83.pdf","source":{"id":"https://openalex.org/S4377196321","display_name":"Docta Complutense (Universidad Complutense de Madrid)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I121748325","host_organization_name":"Universidad Complutense de Madrid","host_organization_lineage":["https://openalex.org/I121748325"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.463.3124","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.463.3124","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://www.unibw.de/physik/forschung/publikationen/tsf349-1999-135.pdf","raw_type":"text"}],"best_oa_location":{"id":"doi:10.1016/s0040-6090(99)00166-2","doi":"https://doi.org/10.1016/s0040-6090(99)00166-2","is_oa":true,"landing_page_url":"https://doi.org/10.1016/s0040-6090(99)00166-2","pdf_url":"https://www.sciencedirect.com/science/article/pii/S0040609099001662","source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320875","display_name":"Deutscher Akademischer Austauschdienst","ror":"https://ror.org/039djdh30"},{"id":"https://openalex.org/F4320321114","display_name":"Bundesministerium f\u00fcr Bildung und Forschung","ror":"https://ror.org/04pz7b180"},{"id":"https://openalex.org/F4320323458","display_name":"Universidad de Chile","ror":"https://ror.org/047gc3g35"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2018996752.pdf","grobid_xml":"https://content.openalex.org/works/W2018996752.grobid-xml"},"referenced_works_count":32,"referenced_works":["https://openalex.org/W583841011","https://openalex.org/W1488501388","https://openalex.org/W1532993301","https://openalex.org/W1965366802","https://openalex.org/W1966251593","https://openalex.org/W1968946015","https://openalex.org/W1972236914","https://openalex.org/W1973894142","https://openalex.org/W1976968025","https://openalex.org/W1979363789","https://openalex.org/W1986966687","https://openalex.org/W1992040385","https://openalex.org/W1995693881","https://openalex.org/W1998717539","https://openalex.org/W2000044400","https://openalex.org/W2001444692","https://openalex.org/W2025182564","https://openalex.org/W2029462908","https://openalex.org/W2033185055","https://openalex.org/W2033436022","https://openalex.org/W2033800510","https://openalex.org/W2048117904","https://openalex.org/W2049405627","https://openalex.org/W2068542027","https://openalex.org/W2072215662","https://openalex.org/W2075074101","https://openalex.org/W2086412810","https://openalex.org/W2093914900","https://openalex.org/W2094624421","https://openalex.org/W2145912347","https://openalex.org/W2478144683","https://openalex.org/W3000032219"],"related_works":["https://openalex.org/W4289521295","https://openalex.org/W2008024441","https://openalex.org/W2019534344","https://openalex.org/W2049390418","https://openalex.org/W2170039155","https://openalex.org/W3094111469","https://openalex.org/W7034430479","https://openalex.org/W2329763211","https://openalex.org/W2021769990","https://openalex.org/W2019212189"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}