{"id":"https://openalex.org/W2018590830","doi":"https://doi.org/10.1063/1.351915","title":"Growth of epitaxial TiN films on MgO(100) by high current discharge plasma","display_name":"Growth of epitaxial TiN films on MgO(100) by high current discharge plasma","publication_year":1992,"publication_date":"1992-12-15","ids":{"openalex":"https://openalex.org/W2018590830","doi":"https://doi.org/10.1063/1.351915","mag":"2018590830"},"language":"en","primary_location":{"id":"doi:10.1063/1.351915","doi":"https://doi.org/10.1063/1.351915","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.351915","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109136465","display_name":"S. Miyagawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Miyagawa","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017461329","display_name":"Kazuya Saitoh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Saitoh","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110031050","display_name":"Hiroaki Niwa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Niwa","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008954760","display_name":"MASAMI IKEYAMA","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Ikeyama","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051731142","display_name":"Georges Massouras","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"G. Massouras","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112793110","display_name":"Y. Miyagawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131458","display_name":"Nagoya Industrial Science Research Institute","ror":"https://ror.org/02xkqh785","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210131458"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Miyagawa","raw_affiliation_strings":["Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Government Industrial Research Institute, Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan","institution_ids":["https://openalex.org/I4210131458"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210131458"],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":null,"fwci":1.3274,"has_fulltext":false,"cited_by_count":11,"citation_normalized_percentile":{"value":0.7483345,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"72","issue":"12","first_page":"5663","last_page":"5667"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.5692999958992004,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.5692999958992004,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.09359999746084213,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.09279999881982803,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/mgo-100-substrate","display_name":"MgO(001) substrate","score":0.9010000228881836},{"id":"https://openalex.org/keywords/ion-plating","display_name":"ion plating","score":0.9729999899864197},{"id":"https://openalex.org/keywords/deposition-rate","display_name":"deposition rate","score":0.7210000157356262},{"id":"https://openalex.org/keywords/substrate-bias-voltage","display_name":"substrate bias voltage","score":0.6840000152587891},{"id":"https://openalex.org/keywords/ionization-efficiency","display_name":"ionization efficiency","score":0.8679999709129333},{"id":"https://openalex.org/keywords/ion-channeling","display_name":"ion channeling","score":0.6729999780654907},{"id":"https://openalex.org/keywords/channeling-yield","display_name":"channeling yield","score":0.7760000228881836},{"id":"https://openalex.org/keywords/film-structure","display_name":"film structure","score":0.4650000035762787},{"id":"https://openalex.org/keywords/thin-film-growth","display_name":"thin film growth","score":0.6299999952316284}],"concepts":[{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.8011680841445923},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.7671022415161133},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.7003831267356873},{"id":"https://openalex.org/C2780547777","wikidata":"https://www.wikidata.org/wiki/Q368967","display_name":"Rutherford backscattering spectrometry","level":3,"score":0.6991444826126099},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.657882571220398},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6151650547981262},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.45950716733932495},{"id":"https://openalex.org/C118442862","wikidata":"https://www.wikidata.org/wiki/Q899143","display_name":"Ion plating","level":3,"score":0.4563705027103424},{"id":"https://openalex.org/C49110097","wikidata":"https://www.wikidata.org/wiki/Q175233","display_name":"Cathode","level":2,"score":0.4537641108036041},{"id":"https://openalex.org/C6518042","wikidata":"https://www.wikidata.org/wiki/Q175646","display_name":"Scanning tunneling microscope","level":2,"score":0.4402678608894348},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.4354466497898102},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.41811954975128174},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2631290853023529},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.15681150555610657},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.14803650975227356},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.06309232115745544},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.351915","doi":"https://doi.org/10.1063/1.351915","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.351915","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":14,"referenced_works":["https://openalex.org/W1974185626","https://openalex.org/W1998000003","https://openalex.org/W2007805072","https://openalex.org/W2008651523","https://openalex.org/W2017138464","https://openalex.org/W2038442371","https://openalex.org/W2040037850","https://openalex.org/W2042326285","https://openalex.org/W2050468714","https://openalex.org/W2077012937","https://openalex.org/W2083113764","https://openalex.org/W2088642009","https://openalex.org/W2313482972","https://openalex.org/W2313512497"],"related_works":["https://openalex.org/W2023889998","https://openalex.org/W2141318680","https://openalex.org/W1969161443","https://openalex.org/W1974711014","https://openalex.org/W617638682","https://openalex.org/W2042326285","https://openalex.org/W1974185626","https://openalex.org/W2531031522","https://openalex.org/W2037401263","https://openalex.org/W2025009405"],"abstract_inverted_index":{"High":[0],"current":[1],"discharge":[2],"plasma":[3],"produced":[4],"by":[5,96,163],"the":[6,20,26,34,44,48,91,124,141,146,157],"Ta-LaB6":[7],"cathode":[8],"was":[9,31],"used":[10],"for":[11,110],"ion":[12,99],"plating":[13],"of":[14,19,23,64,90,120,127,145,153,156],"TiN":[15,24,67,159],"films.":[16],"The":[17,40,106],"dependence":[18],"deposition":[21],"rate":[22,126],"on":[25,47,78],"substrate":[27,81,118],"dc":[28,85],"bias":[29],"potential":[30],"measured":[32],"using":[33],"Rutherford":[35],"backscattering":[36],"spectrometry":[37],"(RBS)":[38],"method.":[39],"results":[41],"indicate":[42],"that":[43,144],"particles":[45,52],"impinging":[46],"substrate,":[49],"i.e.,":[50],"vaporized":[51],"(Ti)":[53],"and":[54,75,98,101,112,135],"reactive":[55],"gases":[56],"(N2),":[57],"could":[58],"be":[59,133],"ionized":[60],"at":[61,71,116],"high":[62],"efficiency":[63],"70%.":[65],"Epitaxial":[66],"films":[68],"were":[69,94,130,139,161],"grown":[70],"temperatures":[72],"between":[73],"400":[74],"700":[76],"\u00b0C":[77,122],"cleaved":[79],"MgO(100)":[80],"supplied":[82],"with":[83,123],"negative":[84],"anf":[86],"rf":[87],"potential.":[88],"Structures":[89],"epitaxial":[92,158],"film":[93,160],"investigated":[95],"RBS":[97],"channeling,":[100],"scanning":[102],"tunneling":[103,151],"microscope":[104],"(STM).":[105],"minimum":[107],"channeling":[108],"yields":[109],"(100)":[111,154],"(110)":[113],"axes":[114],"obtained":[115],"a":[117],"temperature":[119],"550":[121],"growth":[125],"40":[128],"\u00c5/s":[129],"found":[131],"to":[132],"1.4%":[134],"2.0%,":[136],"respectively,":[137],"which":[138],"almost":[140],"same":[142],"as":[143],"MgO":[147],"substrate.":[148],"Atomically":[149],"resolved":[150],"images":[152],"surface":[155],"observed":[162],"STM.":[164]},"counts_by_year":[{"year":2023,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}