{"id":"https://openalex.org/W2018518372","doi":"https://doi.org/10.1007/s12034-014-0035-0","title":"Influence of annealing temperature on ZnO thin films grown by dual ion beam sputtering","display_name":"Influence of annealing temperature on ZnO thin films grown by dual ion beam sputtering","publication_year":2014,"publication_date":"2014-08-01","ids":{"openalex":"https://openalex.org/W2018518372","doi":"https://doi.org/10.1007/s12034-014-0035-0","mag":"2018518372"},"language":"en","primary_location":{"id":"doi:10.1007/s12034-014-0035-0","doi":"https://doi.org/10.1007/s12034-014-0035-0","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s12034-014-0035-0","pdf_url":null,"source":{"id":"https://openalex.org/S99612230","display_name":"Bulletin of Materials Science","issn_l":"0250-4707","issn":["0250-4707","0973-7669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Bulletin of Materials Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050300712","display_name":"Sushil Kumar Pandey","orcid":"https://orcid.org/0000-0003-1020-5889","observed_orcids":["https://orcid.org/0000-0003-1020-5889","https://orcid.org/0009-0007-1779-9954"]},"institutions":[{"id":"https://openalex.org/I64295750","display_name":"Indian Institute of Technology Indore","ror":"https://ror.org/01hhf7w52","country_code":"IN","type":"education","lineage":["https://openalex.org/I64295750"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Sushil Kumar Pandey","raw_affiliation_strings":["Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","Indian Institute of technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","institution_ids":["https://openalex.org/I64295750"]},{"raw_affiliation_string":"Indian Institute of technology","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035434981","display_name":"Saurabh Kumar Pandey","orcid":"https://orcid.org/0000-0002-5013-6745","observed_orcids":["https://orcid.org/0000-0002-5013-6745","https://orcid.org/0000-0002-5339-095X"]},"institutions":[{"id":"https://openalex.org/I64295750","display_name":"Indian Institute of Technology Indore","ror":"https://ror.org/01hhf7w52","country_code":"IN","type":"education","lineage":["https://openalex.org/I64295750"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Saurabh Kumar Pandey","raw_affiliation_strings":["Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","Indian Institute of technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","institution_ids":["https://openalex.org/I64295750"]},{"raw_affiliation_string":"Indian Institute of technology","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063538403","display_name":"Vishnu Awasthi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I64295750","display_name":"Indian Institute of Technology Indore","ror":"https://ror.org/01hhf7w52","country_code":"IN","type":"education","lineage":["https://openalex.org/I64295750"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Vishnu Awasthi","raw_affiliation_strings":["Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","Indian Institute of technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","institution_ids":["https://openalex.org/I64295750"]},{"raw_affiliation_string":"Indian Institute of technology","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029984472","display_name":"Ashish Kumar","orcid":"https://orcid.org/0000-0003-3535-2463","observed_orcids":["https://orcid.org/0000-0003-3535-2463","https://orcid.org/0009-0001-4652-1413"]},"institutions":[{"id":"https://openalex.org/I64295750","display_name":"Indian Institute of Technology Indore","ror":"https://ror.org/01hhf7w52","country_code":"IN","type":"education","lineage":["https://openalex.org/I64295750"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Ashish Kumar","raw_affiliation_strings":["Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","Indian Institute of technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","institution_ids":["https://openalex.org/I64295750"]},{"raw_affiliation_string":"Indian Institute of technology","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019826426","display_name":"Uday Prabhakarrao Deshpande","orcid":"https://orcid.org/0000-0002-4542-0549","observed_orcids":["https://orcid.org/0000-0002-4542-0549"]},"institutions":[{"id":"https://openalex.org/I21131202","display_name":"University Grants Commission","ror":"https://ror.org/04p800546","country_code":"IN","type":"government","lineage":["https://openalex.org/I21131202"]},{"id":"https://openalex.org/I3149292468","display_name":"Department of Atomic Energy","ror":"https://ror.org/02m388s04","country_code":"IN","type":"government","lineage":["https://openalex.org/I2799351866","https://openalex.org/I3149292468"]},{"id":"https://openalex.org/I4210132317","display_name":"UGC DAE Consortium for Scientific Research","ror":"https://ror.org/047g7f905","country_code":"IN","type":"other","lineage":["https://openalex.org/I4210132317"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Uday P. Deshpande","raw_affiliation_strings":["Department of Atomic Energy (UGC DAE), Consortium for Scientific Research, University Grants Commission, Indore, 452 001, India","University Grants Commission"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Atomic Energy (UGC DAE), Consortium for Scientific Research, University Grants Commission, Indore, 452 001, India","institution_ids":["https://openalex.org/I21131202","https://openalex.org/I3149292468","https://openalex.org/I4210132317"]},{"raw_affiliation_string":"University Grants Commission","institution_ids":["https://openalex.org/I21131202"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024091931","display_name":"Mukul Gupta","orcid":"https://orcid.org/0000-0002-9622-656X","observed_orcids":["https://orcid.org/0000-0002-9622-656X","https://orcid.org/0000-0002-1668-7236"]},"institutions":[{"id":"https://openalex.org/I21131202","display_name":"University Grants Commission","ror":"https://ror.org/04p800546","country_code":"IN","type":"government","lineage":["https://openalex.org/I21131202"]},{"id":"https://openalex.org/I3149292468","display_name":"Department of Atomic Energy","ror":"https://ror.org/02m388s04","country_code":"IN","type":"government","lineage":["https://openalex.org/I2799351866","https://openalex.org/I3149292468"]},{"id":"https://openalex.org/I4210132317","display_name":"UGC DAE Consortium for Scientific Research","ror":"https://ror.org/047g7f905","country_code":"IN","type":"other","lineage":["https://openalex.org/I4210132317"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Mukul Gupta","raw_affiliation_strings":["Department of Atomic Energy (UGC DAE), Consortium for Scientific Research, University Grants Commission, Indore, 452 001, India","University Grants Commission"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Atomic Energy (UGC DAE), Consortium for Scientific Research, University Grants Commission, Indore, 452 001, India","institution_ids":["https://openalex.org/I21131202","https://openalex.org/I3149292468","https://openalex.org/I4210132317"]},{"raw_affiliation_string":"University Grants Commission","institution_ids":["https://openalex.org/I21131202"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5012314390","display_name":"Shaibal Mukherjee","orcid":"https://orcid.org/0000-0002-9879-7278","observed_orcids":["https://orcid.org/0000-0002-9879-7278"]},"institutions":[{"id":"https://openalex.org/I64295750","display_name":"Indian Institute of Technology Indore","ror":"https://ror.org/01hhf7w52","country_code":"IN","type":"education","lineage":["https://openalex.org/I64295750"]}],"countries":["IN"],"is_corresponding":true,"raw_author_name":"Shaibal Mukherjee","raw_affiliation_strings":["Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","Indian Institute of technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Discipline of Electrical Engineering, Hybrid Nanodevice Research Group, Indian Institute of Technology, Indore, 453 441, India","institution_ids":["https://openalex.org/I64295750"]},{"raw_affiliation_string":"Indian Institute of technology","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5012314390"],"corresponding_institution_ids":["https://openalex.org/I64295750"],"apc_list":null,"apc_paid":null,"fwci":0.4039,"has_fulltext":false,"cited_by_count":27,"citation_normalized_percentile":{"value":0.54875864,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":99},"biblio":{"volume":"37","issue":"5","first_page":"983","last_page":"989"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/zno-thin-films","display_name":"ZnO thin films","score":0.9980000257492065},{"id":"https://openalex.org/keywords/in-situ-annealing","display_name":"in situ annealing","score":0.8259999752044678},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.9860000014305115},{"id":"https://openalex.org/keywords/dual-ion-beam-sputtering","display_name":"dual ion beam sputtering","score":0.9369999766349792},{"id":"https://openalex.org/keywords/p-type-si-100-substrate","display_name":"p-type Si(100) substrate","score":0.8669999837875366},{"id":"https://openalex.org/keywords/002-preferred-orientation","display_name":"(002) preferred orientation","score":0.9279999732971191},{"id":"https://openalex.org/keywords/near-band-edge-emission","display_name":"near-band-edge emission","score":0.8659999966621399},{"id":"https://openalex.org/keywords/deep-level-emission","display_name":"deep-level emission","score":0.9700000286102295},{"id":"https://openalex.org/keywords/electron-mobility","display_name":"electron mobility","score":0.9200000166893005},{"id":"https://openalex.org/keywords/interstitial-oxygen","display_name":"interstitial oxygen","score":0.7639999985694885},{"id":"https://openalex.org/keywords/oxygen-vacancies","display_name":"oxygen vacancies","score":0.8399999737739563},{"id":"https://openalex.org/keywords/point-defects","display_name":"point defects","score":0.8629999756813049},{"id":"https://openalex.org/keywords/optoelectronic-devices","display_name":"optoelectronic devices","score":0.8550000190734863}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8936901092529297},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7675352096557617},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.7339569926261902},{"id":"https://openalex.org/C108649604","wikidata":"https://www.wikidata.org/wiki/Q1065170","display_name":"Full width at half maximum","level":2,"score":0.7263137102127075},{"id":"https://openalex.org/C85080765","wikidata":"https://www.wikidata.org/wiki/Q614893","display_name":"Photoluminescence","level":2,"score":0.6460627317428589},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.621853768825531},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6140694618225098},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5821895003318787},{"id":"https://openalex.org/C50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","level":3,"score":0.42363592982292175},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.40143823623657227},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2263050377368927},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.15833759307861328},{"id":"https://openalex.org/C46141821","wikidata":"https://www.wikidata.org/wiki/Q209402","display_name":"Nuclear magnetic resonance","level":1,"score":0.14631891250610352},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.12533357739448547},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.07419806718826294},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s12034-014-0035-0","doi":"https://doi.org/10.1007/s12034-014-0035-0","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s12034-014-0035-0","pdf_url":null,"source":{"id":"https://openalex.org/S99612230","display_name":"Bulletin of Materials Science","issn_l":"0250-4707","issn":["0250-4707","0973-7669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Bulletin of Materials Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320719","display_name":"Department of Science and Technology, Ministry of Science and Technology, India","ror":"https://ror.org/0101xrq71"},{"id":"https://openalex.org/F4320320721","display_name":"Council of Scientific and Industrial Research, India","ror":"https://ror.org/021wm7p51"},{"id":"https://openalex.org/F4320334771","display_name":"Science and Engineering Research Board","ror":"https://ror.org/03ffdsr55"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1679557815","https://openalex.org/W1969619515","https://openalex.org/W1974085346","https://openalex.org/W1978554010","https://openalex.org/W1982432114","https://openalex.org/W1991503516","https://openalex.org/W2002093212","https://openalex.org/W2003225099","https://openalex.org/W2004615175","https://openalex.org/W2006374280","https://openalex.org/W2020608129","https://openalex.org/W2033265799","https://openalex.org/W2037180006","https://openalex.org/W2038503901","https://openalex.org/W2038985243","https://openalex.org/W2046870563","https://openalex.org/W2063061207","https://openalex.org/W2063505034","https://openalex.org/W2074937372","https://openalex.org/W2083518322","https://openalex.org/W2087388196","https://openalex.org/W2108237160","https://openalex.org/W2324362536","https://openalex.org/W2486913452","https://openalex.org/W6788042262"],"related_works":["https://openalex.org/W2014325219","https://openalex.org/W2091789677","https://openalex.org/W2306834769","https://openalex.org/W1997891135","https://openalex.org/W2354795986","https://openalex.org/W2004615175","https://openalex.org/W2370809304","https://openalex.org/W1996220696","https://openalex.org/W1999976638","https://openalex.org/W2394548526"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":9},{"year":2019,"cited_by_count":5},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}