{"id":"https://openalex.org/W2018512837","doi":"https://doi.org/10.1016/s0040-6090(00)00872-5","title":"Low temperature buffer growth for modulation doped SiGe/Ge/SiGe heterostructures with high hole mobility","display_name":"Low temperature buffer growth for modulation doped SiGe/Ge/SiGe heterostructures with high hole mobility","publication_year":2000,"publication_date":"2000-07-01","ids":{"openalex":"https://openalex.org/W2018512837","doi":"https://doi.org/10.1016/s0040-6090(00)00872-5","mag":"2018512837"},"language":"en","primary_location":{"id":"doi:10.1016/s0040-6090(00)00872-5","doi":"https://doi.org/10.1016/s0040-6090(00)00872-5","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(00)00872-5","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5031109039","display_name":"Tetsuji Ueno","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405287038","display_name":"Research Center for Advanced Science and Technology, The University of Tokyo","ror":"https://ror.org/03xzehp18","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]},{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Tetsuji Ueno","raw_affiliation_strings":["Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan","institution_ids":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080097517","display_name":"Toshifumi Irisawa","orcid":"https://orcid.org/0000-0002-8801-7688","observed_orcids":["https://orcid.org/0000-0002-8801-7688"]},"institutions":[{"id":"https://openalex.org/I4405287038","display_name":"Research Center for Advanced Science and Technology, The University of Tokyo","ror":"https://ror.org/03xzehp18","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]},{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Toshifumi Irisawa","raw_affiliation_strings":["Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan","institution_ids":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002193728","display_name":"Yasuhiro Shiraki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405287038","display_name":"Research Center for Advanced Science and Technology, The University of Tokyo","ror":"https://ror.org/03xzehp18","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]},{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuhiro Shiraki","raw_affiliation_strings":["Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center for Advanced Science and Technology (RCAST), University of Tokyo, 4-6-1, Komaba, Meguro-ku, Tokyo 153-8904, Japan","institution_ids":["https://openalex.org/I4405287038","https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068817003","display_name":"Akira Uedono","orcid":"https://orcid.org/0000-0001-6224-4869","observed_orcids":["https://orcid.org/0000-0001-6224-4869"]},"institutions":[{"id":"https://openalex.org/I146399215","display_name":"University of Tsukuba","ror":"https://ror.org/02956yf07","country_code":"JP","type":"education","lineage":["https://openalex.org/I146399215"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akira Uedono","raw_affiliation_strings":["Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan","#N#Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki\u2009305-8573, Japan #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan","institution_ids":["https://openalex.org/I146399215"]},{"raw_affiliation_string":"#N#Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki\u2009305-8573, Japan #N#","institution_ids":["https://openalex.org/I146399215"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110021569","display_name":"Shoichiro Tanigawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I146399215","display_name":"University of Tsukuba","ror":"https://ror.org/02956yf07","country_code":"JP","type":"education","lineage":["https://openalex.org/I146399215"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shoichiro Tanigawa","raw_affiliation_strings":["Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan","#N#Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki\u2009305-8573, Japan #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan","institution_ids":["https://openalex.org/I146399215"]},{"raw_affiliation_string":"#N#Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki\u2009305-8573, Japan #N#","institution_ids":["https://openalex.org/I146399215"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5031109039"],"corresponding_institution_ids":["https://openalex.org/I4405287038","https://openalex.org/I74801974"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":3.6272,"has_fulltext":false,"cited_by_count":42,"citation_normalized_percentile":{"value":0.93283222,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"369","issue":"1-2","first_page":"320","last_page":"323"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.40720000863075256,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.40720000863075256,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12579","display_name":"Muon and positron interactions and applications","score":0.20080000162124634,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.19130000472068787,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/modulation-doping","display_name":"modulation doping","score":0.781000018119812},{"id":"https://openalex.org/keywords/hole-mobility","display_name":"hole mobility","score":0.8299999833106995},{"id":"https://openalex.org/keywords/point-defects","display_name":"point defects","score":0.6800000071525574},{"id":"https://openalex.org/keywords/vacancy-clusters","display_name":"vacancy clusters","score":0.9779999852180481},{"id":"https://openalex.org/keywords/strain-relaxation","display_name":"strain relaxation","score":0.9120000004768372},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.6859999895095825},{"id":"https://openalex.org/keywords/roughness-scattering","display_name":"roughness scattering","score":0.8309999704360962},{"id":"https://openalex.org/keywords/positron-annihilation-spectroscopy","display_name":"positron annihilation spectroscopy","score":0.6510000228881836},{"id":"https://openalex.org/keywords/molecular-beam-epitaxy","display_name":"molecular beam epitaxy","score":0.7829999923706055}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7448974251747131},{"id":"https://openalex.org/C3792809","wikidata":"https://www.wikidata.org/wiki/Q898542","display_name":"Molecular beam epitaxy","level":4,"score":0.743273913860321},{"id":"https://openalex.org/C79794668","wikidata":"https://www.wikidata.org/wiki/Q1616270","display_name":"Heterojunction","level":2,"score":0.6032242178916931},{"id":"https://openalex.org/C2778711141","wikidata":"https://www.wikidata.org/wiki/Q3966593","display_name":"Positron annihilation spectroscopy","level":5,"score":0.5978608131408691},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5657903552055359},{"id":"https://openalex.org/C106782819","wikidata":"https://www.wikidata.org/wiki/Q6501076","display_name":"Electron mobility","level":2,"score":0.5151482820510864},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.5109009146690369},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.5018911361694336},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.48013660311698914},{"id":"https://openalex.org/C2776029896","wikidata":"https://www.wikidata.org/wiki/Q3935810","display_name":"Relaxation (psychology)","level":2,"score":0.4338223934173584},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.43314674496650696},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.41342025995254517},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.254130095243454},{"id":"https://openalex.org/C2985595821","wikidata":"https://www.wikidata.org/wiki/Q1206668","display_name":"Positron annihilation","level":4,"score":0.1871885359287262},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.13241612911224365},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.12126138806343079},{"id":"https://openalex.org/C202100949","wikidata":"https://www.wikidata.org/wiki/Q3229","display_name":"Positron","level":3,"score":0.08148318529129028},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.0},{"id":"https://openalex.org/C77805123","wikidata":"https://www.wikidata.org/wiki/Q161272","display_name":"Social psychology","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0040-6090(00)00872-5","doi":"https://doi.org/10.1016/s0040-6090(00)00872-5","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(00)00872-5","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320912","display_name":"Ministry of Education, Culture, Sports, Science and Technology","ror":"https://ror.org/048rj2z13"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1969950458","https://openalex.org/W1969995533","https://openalex.org/W2000538180","https://openalex.org/W2001780565","https://openalex.org/W2021323350","https://openalex.org/W2035569596","https://openalex.org/W2064098054","https://openalex.org/W2068183079"],"related_works":["https://openalex.org/W2001587409","https://openalex.org/W2047174501","https://openalex.org/W2138133819","https://openalex.org/W7100782438","https://openalex.org/W2332444778","https://openalex.org/W2477190622","https://openalex.org/W2009049521","https://openalex.org/W6987383688","https://openalex.org/W2040083835","https://openalex.org/W2334696288"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2016-06-24T00:00:00"}