{"id":"https://openalex.org/W2018298653","doi":"https://doi.org/10.1149/1.1855851","title":"Residual Stress Effects in Doped Barium Strontium Titanate Thin Films","display_name":"Residual Stress Effects in Doped Barium Strontium Titanate Thin Films","publication_year":2005,"publication_date":"2005-01-01","ids":{"openalex":"https://openalex.org/W2018298653","doi":"https://doi.org/10.1149/1.1855851","mag":"2018298653"},"language":"en","primary_location":{"id":"doi:10.1149/1.1855851","doi":"https://doi.org/10.1149/1.1855851","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.1855851","pdf_url":"https://iopscience.iop.org/article/10.1149/1.1855851/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1149/1.1855851/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111854202","display_name":"W. D. Nothwang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I166416128","display_name":"DEVCOM Army Research Laboratory","ror":"https://ror.org/011hc8f90","country_code":"US","type":"government","lineage":["https://openalex.org/I1304082316","https://openalex.org/I1330347796","https://openalex.org/I166416128","https://openalex.org/I2802705668","https://openalex.org/I4210154437"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"W. D. Nothwang","raw_affiliation_strings":["Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","institution_ids":["https://openalex.org/I166416128"]},{"raw_affiliation_string":"#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#","institution_ids":["https://openalex.org/I166416128"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108084622","display_name":"M. W. Cole","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I166416128","display_name":"DEVCOM Army Research Laboratory","ror":"https://ror.org/011hc8f90","country_code":"US","type":"government","lineage":["https://openalex.org/I1304082316","https://openalex.org/I1330347796","https://openalex.org/I166416128","https://openalex.org/I2802705668","https://openalex.org/I4210154437"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. W. Cole","raw_affiliation_strings":["Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","institution_ids":["https://openalex.org/I166416128"]},{"raw_affiliation_string":"#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#","institution_ids":["https://openalex.org/I166416128"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110308109","display_name":"C. Hubbard","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I166416128","display_name":"DEVCOM Army Research Laboratory","ror":"https://ror.org/011hc8f90","country_code":"US","type":"government","lineage":["https://openalex.org/I1304082316","https://openalex.org/I1330347796","https://openalex.org/I166416128","https://openalex.org/I2802705668","https://openalex.org/I4210154437"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. Hubbard","raw_affiliation_strings":["Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","institution_ids":["https://openalex.org/I166416128"]},{"raw_affiliation_string":"#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#","institution_ids":["https://openalex.org/I166416128"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5034998975","display_name":"E. Ngo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I166416128","display_name":"DEVCOM Army Research Laboratory","ror":"https://ror.org/011hc8f90","country_code":"US","type":"government","lineage":["https://openalex.org/I1304082316","https://openalex.org/I1330347796","https://openalex.org/I166416128","https://openalex.org/I2802705668","https://openalex.org/I4210154437"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. Ngo","raw_affiliation_strings":["Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA","institution_ids":["https://openalex.org/I166416128"]},{"raw_affiliation_string":"#N#Army Research Laboratory, Adelphi, Maryland\u200921005-5069, USA #N#","institution_ids":["https://openalex.org/I166416128"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I166416128"],"apc_list":{"value":1950,"currency":"USD","value_usd":1950},"apc_paid":null,"fwci":0.61,"has_fulltext":true,"cited_by_count":6,"citation_normalized_percentile":{"value":0.65320733,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"152","issue":"3","first_page":"F37","last_page":"F37"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10107","display_name":"Ferroelectric and Piezoelectric Materials","score":0.9726999998092651,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10107","display_name":"Ferroelectric and Piezoelectric Materials","score":0.9726999998092651,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12155","display_name":"Microwave Dielectric Ceramics Synthesis","score":0.0071000000461936,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.003700000001117587,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/barium-strontium-titanate","display_name":"barium strontium titanate","score":0.984000027179718},{"id":"https://openalex.org/keywords/thin-films","display_name":"thin films","score":0.7630000114440918},{"id":"https://openalex.org/keywords/residual-stress","display_name":"residual stress","score":0.996999979019165},{"id":"https://openalex.org/keywords/magnesium-doping","display_name":"magnesium doping","score":0.843999981880188},{"id":"https://openalex.org/keywords/acceptor-doping","display_name":"acceptor doping","score":0.9620000123977661},{"id":"https://openalex.org/keywords/post-deposition-annealing","display_name":"post-deposition annealing","score":0.9089999794960022},{"id":"https://openalex.org/keywords/compressive-stress","display_name":"compressive stress","score":0.6399999856948853},{"id":"https://openalex.org/keywords/interfacial-stress","display_name":"interfacial stress","score":0.7289999723434448},{"id":"https://openalex.org/keywords/dielectric-tunability","display_name":"dielectric tunability","score":0.6729999780654907},{"id":"https://openalex.org/keywords/mgo-substrate","display_name":"MgO substrate","score":0.527999997138977}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8544898629188538},{"id":"https://openalex.org/C37292000","wikidata":"https://www.wikidata.org/wiki/Q1257918","display_name":"Residual stress","level":2,"score":0.7941640019416809},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6694629192352295},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.5873750448226929},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.5831794738769531},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5240804553031921},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4998018741607666},{"id":"https://openalex.org/C2781063764","wikidata":"https://www.wikidata.org/wiki/Q421340","display_name":"Strontium titanate","level":3,"score":0.4125056564807892},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.21862554550170898},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.20960411429405212}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1149/1.1855851","doi":"https://doi.org/10.1149/1.1855851","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.1855851","pdf_url":"https://iopscience.iop.org/article/10.1149/1.1855851/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1149/1.1855851","doi":"https://doi.org/10.1149/1.1855851","is_oa":true,"landing_page_url":"https://doi.org/10.1149/1.1855851","pdf_url":"https://iopscience.iop.org/article/10.1149/1.1855851/pdf","source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2018298653.pdf","grobid_xml":"https://content.openalex.org/works/W2018298653.grobid-xml"},"referenced_works_count":19,"referenced_works":["https://openalex.org/W1452222056","https://openalex.org/W1965421710","https://openalex.org/W1974085346","https://openalex.org/W1978211200","https://openalex.org/W1995324902","https://openalex.org/W1996020354","https://openalex.org/W2003978230","https://openalex.org/W2025748101","https://openalex.org/W2043569838","https://openalex.org/W2053645835","https://openalex.org/W2053993902","https://openalex.org/W2058388825","https://openalex.org/W2077455360","https://openalex.org/W2089053378","https://openalex.org/W2089894096","https://openalex.org/W2092841031","https://openalex.org/W2112592535","https://openalex.org/W2137033619","https://openalex.org/W2291539874"],"related_works":["https://openalex.org/W2127652893","https://openalex.org/W423116986","https://openalex.org/W2350853426","https://openalex.org/W2522561266","https://openalex.org/W2366697499","https://openalex.org/W1990719975","https://openalex.org/W2255904075","https://openalex.org/W2043314826","https://openalex.org/W9024416","https://openalex.org/W2264989323"],"abstract_inverted_index":{"Barium":[0],"strontium":[1],"titanate":[2],"BST)":[3],"thin":[4,43],"films":[5,44,102,144],"are":[6],"the":[7,41,50,73,87,101,127,143,151,164,178],"principal":[8],"materials":[9],"of":[10,18,30,80,94,180,189],"interest":[11],"for":[12],"microwave":[13],"antenna":[14],"design,":[15],"primarily":[16],"because":[17],"their":[19],"low":[20],"loss,":[21],"high":[22,119],"dielectric":[23,77],"constant,":[24],"and":[25,76,111,130,176],"large":[26],"tunability.":[27],"The":[28,97,133,195],"effects":[29,179],"acceptor":[31],"(Mg)":[32],"doping,":[33],"added":[34],"to":[35,49,67,155],"further":[36],"tune":[37],"film":[38],"properties,":[39,78],"on":[40,56,72,183],"BST":[42,185],"were":[45,54,123],"investigated":[46],"in":[47,83,100,105],"parallel":[48],"annealing":[51,131,191],"temperature.":[52,132],"Films":[53],"deposited":[55],"MgO":[57],"single-crystal":[58],"substrates":[59],"using":[60],"metallorganic":[61],"solution":[62],"deposition.":[63],"Residual":[64],"stress,":[65],"known":[66],"have":[68],"a":[69,146,156,187],"drastic":[70],"effect":[71],"mechanical,":[74],"electrical,":[75],"becomes":[79],"particular":[81],"importance":[82],"thin-film":[84],"materials,":[85],"where":[86],"residual":[88,98,181],"stress":[89,99,138,149,162,182],"can":[90],"be":[91],"several":[92],"orders":[93],"magnitude":[95],"higher.":[96],"was":[103],"measured":[104],"three":[106,137],"ways":[107],"(reflective":[108],"curvature,":[109],"nanoindentation,":[110],"glancing":[112],"angle":[113],"X-ray":[114],"diffraction).":[115],"Measured":[116],"stresses":[117],"(as":[118],"as":[120,167,186],"2":[121],"Gpa)":[122],"tunable":[124],"by":[125],"varying":[126],"dopant":[128],"concentration":[129],"results":[134],"from":[135],"all":[136],"measurement":[139],"techniques":[140],"showed":[141],"that":[142,153],"had":[145],"highly":[147],"compressive":[148],"at":[150,163],"interface":[152],"transitioned":[154],"significantly":[157],"lower,":[158],"but":[159],"still":[160],"nonzero,":[161],"top":[165],"surface":[166],"theory":[168],"would":[169],"suggest.":[170],"In":[171],"this":[172],"paper,":[173],"we":[174],"evaluate":[175],"report":[177],"acceptor-doped":[184],"function":[188],"postdeposition":[190],"conditions.":[192],"\u00a9":[193],"2005":[194],"Electrochemical":[196],"Society.":[197],"All":[198],"rights":[199],"reserved.":[200]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}