{"id":"https://openalex.org/W2018134338","doi":"https://doi.org/10.1117/12.568014","title":"Effect of electrostatic chucking on EUVL mask flatness","display_name":"Effect of electrostatic chucking on EUVL mask flatness","publication_year":2004,"publication_date":"2004-06-02","ids":{"openalex":"https://openalex.org/W2018134338","doi":"https://doi.org/10.1117/12.568014","mag":"2018134338"},"language":"en","primary_location":{"id":"doi:10.1117/12.568014","doi":"https://doi.org/10.1117/12.568014","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.568014","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5004706816","display_name":"Andrew R. Mikkelson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Andrew R. Mikkelson","raw_affiliation_strings":["Univ. of Wisconsin/Madison (United States)","University of Wisconsin - Madison, United States;"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Wisconsin/Madison (United States)","institution_ids":["https://openalex.org/I135310074"]},{"raw_affiliation_string":"University of Wisconsin - Madison, United States;","institution_ids":["https://openalex.org/I135310074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108214356","display_name":"Roxann L. Engelstad","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Roxann L. Engelstad","raw_affiliation_strings":["Univ. of Wisconsin/Madison (United States)","University of Wisconsin - Madison, United States;"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Wisconsin/Madison (United States)","institution_ids":["https://openalex.org/I135310074"]},{"raw_affiliation_string":"University of Wisconsin - Madison, United States;","institution_ids":["https://openalex.org/I135310074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015771082","display_name":"Edward G. Lovell","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I135310074","display_name":"University of Wisconsin\u2013Madison","ror":"https://ror.org/01y2jtd41","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Edward G. Lovell","raw_affiliation_strings":["Univ. of Wisconsin/Madison (United States)","University of Wisconsin - Madison, United States;"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Wisconsin/Madison (United States)","institution_ids":["https://openalex.org/I135310074"]},{"raw_affiliation_string":"University of Wisconsin - Madison, United States;","institution_ids":["https://openalex.org/I135310074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049604469","display_name":"Lutz Aschke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I160414472","display_name":"Schott (Germany)","ror":"https://ror.org/000q08p21","country_code":"DE","type":"company","lineage":["https://openalex.org/I160414472"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Lutz Aschke","raw_affiliation_strings":["Schott Lithotec AG (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Schott Lithotec AG (Germany)","institution_ids":["https://openalex.org/I160414472"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089659694","display_name":"Frauke Rueggeberg","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I160414472","display_name":"Schott (Germany)","ror":"https://ror.org/000q08p21","country_code":"DE","type":"company","lineage":["https://openalex.org/I160414472"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Frauke Rueggeberg","raw_affiliation_strings":["Schott Lithotec AG (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Schott Lithotec AG (Germany)","institution_ids":["https://openalex.org/I160414472"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111627331","display_name":"Frank Sobel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I160414472","display_name":"Schott (Germany)","ror":"https://ror.org/000q08p21","country_code":"DE","type":"company","lineage":["https://openalex.org/I160414472"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Frank Sobel","raw_affiliation_strings":["Schott Lithotec AG (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Schott Lithotec AG (Germany)","institution_ids":["https://openalex.org/I160414472"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.6602,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.80602348,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"5504","issue":null,"first_page":"120","last_page":"120"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography-masks","display_name":"EUV lithography masks","score":0.8029999732971191},{"id":"https://openalex.org/keywords/clamping-pressure","display_name":"clamping pressure","score":0.8360000252723694},{"id":"https://openalex.org/keywords/finite-element-analysis","display_name":"finite element analysis","score":0.7839999794960022}],"concepts":[{"id":"https://openalex.org/C2778530986","wikidata":"https://www.wikidata.org/wiki/Q5457948","display_name":"Flatness (cosmology)","level":3,"score":0.8466299772262573},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.7933377027511597},{"id":"https://openalex.org/C84111939","wikidata":"https://www.wikidata.org/wiki/Q5125465","display_name":"Clamping","level":2,"score":0.7740931510925293},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6941109299659729},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5192685127258301},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5157830715179443},{"id":"https://openalex.org/C111458787","wikidata":"https://www.wikidata.org/wiki/Q215405","display_name":"Legendre polynomials","level":2,"score":0.4973960220813751},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4366393983364105},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.27917975187301636},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15776482224464417},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.12352877855300903},{"id":"https://openalex.org/C26405456","wikidata":"https://www.wikidata.org/wiki/Q338","display_name":"Cosmology","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1117/12.568014","doi":"https://doi.org/10.1117/12.568014","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.568014","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.820.5722","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.820.5722","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://proceedings.spiedigitallibrary.org/data/Conferences/SPIEP/24439/120_1.pdf","raw_type":"text"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320307102","display_name":"Intel Corporation","ror":"https://ror.org/01ek73717"},{"id":"https://openalex.org/F4320307764","display_name":"Microsoft","ror":"https://ror.org/00d0nc645"},{"id":"https://openalex.org/F4320332180","display_name":"Defense Advanced Research Projects Agency","ror":"https://ror.org/02caytj08"},{"id":"https://openalex.org/F4320338286","display_name":"Lawrence Livermore National Laboratory","ror":"https://ror.org/041nk4h53"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2037403245","https://openalex.org/W2046855516","https://openalex.org/W1990590010","https://openalex.org/W2095256571","https://openalex.org/W1966082226","https://openalex.org/W1981653105","https://openalex.org/W2007008054","https://openalex.org/W2056230128","https://openalex.org/W1981756174","https://openalex.org/W1999562060"],"abstract_inverted_index":{"The":[0,25,163,225,245],"International":[1],"Technology":[2],"Roadmap":[3],"for":[4,6,202],"Semiconductors":[5],"Extreme":[7],"Ultraviolet":[8],"Lithography":[9],"(EUVL)":[10],"places":[11],"strict":[12],"requirements":[13],"on":[14,89,115,233],"the":[15,20,35,59,70,78,82,86,90,93,98,110,116,119,149,157,171,175,179,184,190,208,215,221,228,234,240,252],"quality":[16],"and":[17,22,38,54,76,85,131,188,223,237,242],"flatness":[18,91,226],"of":[19,72,81,92,100,112,118,134,159,174,199,207,220,227,239],"substrate":[21,36,257],"patterned":[23],"mask.":[24,95,162,176],"SEMI":[26],"EUVL":[27,73,103,136,161,204,229,256],"Mask":[28],"Substrate":[29],"Standard":[30],"(SEMI":[31],"P37)":[32],"specifies":[33],"that":[34,251,263],"frontside":[37],"backside":[39,243],"nonflatness":[40],"be":[41,265],"no":[42],"more":[43],"than":[44],"50":[45,60],"nm":[46,61],"peak-to-valley":[47],"(p-v).":[48],"Recent":[49],"technological":[50],"advances":[51,254],"in":[52,69,211,247,255,261],"polishing":[53,258],"finishing":[55],"techniques":[56],"have":[57,125,144,259],"placed":[58],"p-v":[62],"specification":[63],"within":[64,183],"reach.":[65],"A":[66],"key":[67],"ingredient":[68],"development":[71],"is":[74],"understanding":[75],"characterizing":[77],"clamping":[79,172,200],"ability":[80],"electrostatic":[83,113],"chuck":[84],"resulting":[87],"effect":[88,111],"chucked":[94,266],"By":[96],"implementing":[97],"shape":[99,117],"a":[101,107,197],"representative":[102,203],"mask":[104,120,137,192,230],"surface":[105,138],"into":[106],"numerical":[108],"model,":[109],"chucking":[114],"was":[121,214],"determined.":[122],"Legendre":[123,150],"polynomials":[124],"been":[126,145,194],"identified":[127],"as":[128,152,196],"an":[129,160],"effective":[130],"efficient":[132],"means":[133],"representing":[135],"shapes.":[139],"Finite":[140],"element":[141],"(FE)":[142],"models":[143,165],"developed":[146],"to":[147,155,169],"utilize":[148],"coefficients":[151],"input":[153],"data":[154],"define":[156],"surfaces":[158],"FE":[164],"were":[166],"then":[167],"used":[168],"determine":[170],"response":[173],"In":[177],"particular,":[178],"maximum":[180],"mask-to-chuck":[181],"gap":[182],"Flatness":[185],"Quality":[186],"Area":[187],"over":[189],"entire":[191],"has":[193],"tracked":[195],"function":[198],"pressure":[201],"surfaces.":[205],"One":[206],"important":[209],"parameters":[210],"this":[212,248],"study":[213],"chuck's":[216],"mechanical":[217],"stiffness":[218],"(comprised":[219],"thickness":[222,238],"modulus).":[224],"also":[231],"depends":[232],"intrinsic":[235],"stress":[236],"multilayer":[241],"layers.":[244],"results":[246],"paper":[249],"show":[250],"recent":[253],"resulted":[260],"masks":[262],"can":[264],"relatively":[267],"flat.":[268]},"counts_by_year":[],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}