{"id":"https://openalex.org/W2017453054","doi":"https://doi.org/10.1117/12.853318","title":"A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography","display_name":"A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography","publication_year":2010,"publication_date":"2010-03-11","ids":{"openalex":"https://openalex.org/W2017453054","doi":"https://doi.org/10.1117/12.853318","mag":"2017453054"},"language":"en","primary_location":{"id":"doi:10.1117/12.853318","doi":"https://doi.org/10.1117/12.853318","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.853318","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5090273938","display_name":"C. M. Ke","orcid":"https://orcid.org/0009-0009-7068-0156","observed_orcids":["https://orcid.org/0009-0009-7068-0156"]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"C. M. Ke","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033699851","display_name":"Victor Shih","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Victor Shih","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5104579930","display_name":"Jacky Huang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Jacky Huang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016194936","display_name":"L. J. Chen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"L. J. Chen","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010062653","display_name":"Willie Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Willie Wang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111765737","display_name":"G. T. Huang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"G. T. Huang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064277907","display_name":"Wencheng Yang","orcid":"https://orcid.org/0000-0001-7800-2215","observed_orcids":["https://orcid.org/0000-0001-7800-2215","https://orcid.org/0000-0001-9798-770X"]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"W. T. Yang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Sophia Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Sophia Wang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109391055","display_name":"C. R. Liang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"C. R. Liang","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053139771","display_name":"H. H. Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"H. H. Liu","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110232774","display_name":"H. J. Lee","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"H. J. Lee","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027050598","display_name":"L. G. Terng","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"L. G. Terng","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109953175","display_name":"Tsai-Sheng Gau","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"T. S. Gau","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001546493","display_name":"John C. H. Lin","orcid":"https://orcid.org/0000-0002-1976-0574","observed_orcids":["https://orcid.org/0000-0002-1976-0574"]},"institutions":[{"id":"https://openalex.org/I4210120917","display_name":"Taiwan Semiconductor Manufacturing Company (Taiwan)","ror":"https://ror.org/02wx79d08","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210120917"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"John Lin","raw_affiliation_strings":["Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)","institution_ids":["https://openalex.org/I4210120917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061941970","display_name":"Kaustuve Bhattacharyya","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Kaustuve Bhattacharyya","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105216633","display_name":"Maurits van der Schaar","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Maurits van der Schaar","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002386370","display_name":"Noelle Wright","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Noelle Wright","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014676393","display_name":"Marc Noot","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Marc Noot","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028363620","display_name":"Mir Shahrjerdy","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Mir Shahrjerdy","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020118471","display_name":"Vivien Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Vivien Wang","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080644357","display_name":"Spencer Lin","orcid":"https://orcid.org/0009-0007-0974-3395","observed_orcids":["https://orcid.org/0009-0007-0974-3395"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Spencer Lin","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081427837","display_name":"Jon Wu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Jon Wu","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Sophie Peng","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Sophie Peng","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022645399","display_name":"Gavin Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Gavin Liu","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034876336","display_name":"Wei-Shun Tzeng","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Wei-Shun Tzeng","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028963231","display_name":"Jim Hao Chen","orcid":"https://orcid.org/0000-0002-3255-9656","observed_orcids":["https://orcid.org/0000-0002-3255-9656","https://orcid.org/0009-0002-7143-4466"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Jim Chen","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102020062","display_name":"Andreas Fuchs","orcid":"https://orcid.org/0009-0001-3573-2346","observed_orcids":["https://orcid.org/0009-0001-3573-2346"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Andreas Fuchs","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110030633","display_name":"Omer A. O. Adam","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Omer Adam","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111913118","display_name":"Cathy Wang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Cathy Wang","raw_affiliation_strings":["ASML Netherlands B.V. (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML Netherlands B.V. (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.1769,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.86840395,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"7638","issue":null,"first_page":"76383P","last_page":"76383P"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9692000150680542,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9692000150680542,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.010700000450015068,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.0035000001080334187,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/scatterometry","display_name":"scatterometry","score":0.9110000133514404},{"id":"https://openalex.org/keywords/lithography-metrology","display_name":"lithography metrology","score":0.847000002861023},{"id":"https://openalex.org/keywords/overlay-metrology","display_name":"overlay metrology","score":0.7590000033378601},{"id":"https://openalex.org/keywords/critical-dimension-metrology","display_name":"critical dimension measurement","score":0.9509999752044678},{"id":"https://openalex.org/keywords/focus-measurement","display_name":"focus measurement","score":0.7900000214576721},{"id":"https://openalex.org/keywords/integrated-metrology","display_name":"integrated metrology","score":0.828000009059906},{"id":"https://openalex.org/keywords/feedback-control","display_name":"feedback control","score":0.5730000138282776}],"concepts":[{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.8956053853034973},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.7309743762016296},{"id":"https://openalex.org/C136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","level":2,"score":0.7234913110733032},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6745931506156921},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.661051332950592},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.6435837745666504},{"id":"https://openalex.org/C157764524","wikidata":"https://www.wikidata.org/wiki/Q1383412","display_name":"Throughput","level":3,"score":0.5439749360084534},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.4658758342266083},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.4348643720149994},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.429180771112442},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3029027283191681},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.22343146800994873},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.19813767075538635},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.12868887186050415},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.12166404724121094},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1199985146522522},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.09947580099105835},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C555944384","wikidata":"https://www.wikidata.org/wiki/Q249","display_name":"Wireless","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.853318","doi":"https://doi.org/10.1117/12.853318","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.853318","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2092420787","https://openalex.org/W2054807825","https://openalex.org/W2103624766","https://openalex.org/W2016673714","https://openalex.org/W2006863651","https://openalex.org/W2004650723","https://openalex.org/W2078954801","https://openalex.org/W1240394498","https://openalex.org/W3023124505","https://openalex.org/W2057082011"],"abstract_inverted_index":{"Advanced":[0],"lithography":[1],"is":[2,38,74,131],"becoming":[3],"increasingly":[4],"demanding":[5],"when":[6],"speed":[7],"and":[8,14,45,101,109,139,150,158,179],"sophistication":[9],"in":[10,32,48,66,133],"communication":[11],"between":[12],"litho":[13],"metrology":[15,42,92,171],"(feedback":[16],"control)":[17],"are":[18,23,197],"most":[19],"crucial.":[20],"Overall":[21],"requirements":[22],"so":[24],"extreme":[25],"that":[26],"all":[27],"measures":[28],"must":[29],"be":[30,154,173],"taken":[31,125],"order":[33],"to":[34,49],"meet":[35],"them.":[36],"This":[37,128],"directly":[39],"driving":[40,56],"the":[41,57,64,118,122,144,163],"resolution,":[43,99],"precision":[44,100],"matching":[46,102],"needs":[47],"deep":[50],"sub-nanometer":[51],"level":[52],"as":[53,55,105,107,187,189],"well":[54,106,188],"need":[58],"for":[59,103,112,156],"higher":[60],"sampling":[61],"(throughput).":[62],"Keeping":[63],"above":[65],"mind,":[67],"a":[68,85],"new":[69,91,129],"scatterometry-based":[70],"platform":[71],"(called":[72],"YieldStar)":[73],"under":[75],"development":[76],"at":[77],"ASML.":[78],"Authors":[79],"have":[80],"already":[81],"published":[82],"results":[83,97,124,168,183],"of":[84,88],"thorough":[86],"investigation":[87],"this":[89,115],"promising":[90],"technique":[93],"which":[94],"showed":[95],"excellent":[96],"on":[98],"overlay,":[104,148],"basic":[108],"advanced":[110],"capabilities":[111],"CD.":[113],"In":[114],"technical":[116],"presentation":[117],"authors":[119],"will":[120,153,172],"report":[121],"newest":[123],"from":[126,169,184,191],"YieldStar.":[127],"work":[130],"divided":[132],"two":[134],"sections:":[135],"monitor":[136,145],"wafer":[137,141,146,165],"applications":[138,152],"product":[140,164],"applications.":[142],"Under":[143,162],"application:":[147,166],"CD":[149,181],"focus":[151],"discussed":[155],"scanner":[157],"track":[159],"hotplate":[160],"control.":[161],"first":[167],"integrated":[170],"reported":[174],"followed":[175],"by":[176],"poly":[177],"layer":[178],"3D":[180],"reconstruction":[182],"hole":[185],"layers":[186],"overlay-results":[190],"small":[192],"(30x60um),":[193],"process-robust":[194],"overlay":[195],"targets":[196],"reported.":[198]},"counts_by_year":[{"year":2016,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2}],"updated_date":"2026-11-01T11:40:01.658920","created_date":"2016-06-24T00:00:00"}