{"id":"https://openalex.org/W2017387368","doi":"https://doi.org/10.1117/12.240407","title":"UV-laser investigation of dielectric thin films","display_name":"UV-laser investigation of dielectric thin films","publication_year":1996,"publication_date":"1996-05-27","ids":{"openalex":"https://openalex.org/W2017387368","doi":"https://doi.org/10.1117/12.240407","mag":"2017387368"},"language":"en","primary_location":{"id":"doi:10.1117/12.240407","doi":"https://doi.org/10.1117/12.240407","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.240407","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5001512515","display_name":"K. Ettrich","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I76198965","display_name":"Friedrich Schiller University Jena","ror":"https://ror.org/05qpz1x62","country_code":"DE","type":"education","lineage":["https://openalex.org/I76198965"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"K. Ettrich","raw_affiliation_strings":["Friedrich-Schiller-Univ. Jena (Germany)","Friedrich-Schiller-University Jena, , Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Friedrich-Schiller-Univ. Jena (Germany)","institution_ids":["https://openalex.org/I76198965"]},{"raw_affiliation_string":"Friedrich-Schiller-University Jena, , Germany","institution_ids":["https://openalex.org/I76198965"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030266732","display_name":"Holger Blaschke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I76198965","display_name":"Friedrich Schiller University Jena","ror":"https://ror.org/05qpz1x62","country_code":"DE","type":"education","lineage":["https://openalex.org/I76198965"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Holger Blaschke","raw_affiliation_strings":["Friedrich-Schiller-Univ. Jena (Germany)","Friedrich-Schiller-University Jena, , Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Friedrich-Schiller-Univ. Jena (Germany)","institution_ids":["https://openalex.org/I76198965"]},{"raw_affiliation_string":"Friedrich-Schiller-University Jena, , Germany","institution_ids":["https://openalex.org/I76198965"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079496107","display_name":"Eberhard Welsch","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I76198965","display_name":"Friedrich Schiller University Jena","ror":"https://ror.org/05qpz1x62","country_code":"DE","type":"education","lineage":["https://openalex.org/I76198965"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Eberhard Welsch","raw_affiliation_strings":["Friedrich-Schiller-Univ. Jena (Germany)","Friedrich-Schiller-University Jena, , Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Friedrich-Schiller-Univ. Jena (Germany)","institution_ids":["https://openalex.org/I76198965"]},{"raw_affiliation_string":"Friedrich-Schiller-University Jena, , Germany","institution_ids":["https://openalex.org/I76198965"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070978472","display_name":"Peter Thomsen-Schmidt","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Peter Thomsen-Schmidt","raw_affiliation_strings":["Berliner Institut fuer Optik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Berliner Institut fuer Optik GmbH (Germany)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5069339092","display_name":"Dieter Schaefer","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Dieter Schaefer","raw_affiliation_strings":["Berliner Institut fuer Optik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Berliner Institut fuer Optik GmbH (Germany)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.19966159,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"2714","issue":null,"first_page":"426","last_page":"426"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.0020000000949949026,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dielectric-thin-films","display_name":"dielectric thin films","score":0.7459999918937683},{"id":"https://openalex.org/keywords/multilayer-stacks","display_name":"multilayer stacks","score":0.843999981880188},{"id":"https://openalex.org/keywords/al2o3-sio2","display_name":"SiO2-Al2O3","score":0.9900000095367432},{"id":"https://openalex.org/keywords/damage-threshold","display_name":"damage threshold","score":0.8029999732971191},{"id":"https://openalex.org/keywords/deposition-techniques","display_name":"deposition techniques","score":0.6079999804496765},{"id":"https://openalex.org/keywords/substrate-effects","display_name":"substrate effects","score":0.5659999847412109}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.682991623878479},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.6557662487030029},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6441770195960999},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5081133842468262},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4477696716785431},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4419183135032654},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3809328079223633},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.37429988384246826},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.33684661984443665},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.15088075399398804},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.12716549634933472},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09938174486160278},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.240407","doi":"https://doi.org/10.1117/12.240407","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.240407","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2085164902","https://openalex.org/W2044829177","https://openalex.org/W2036513068","https://openalex.org/W2055014323","https://openalex.org/W1989323059","https://openalex.org/W1652654983","https://openalex.org/W2055292123","https://openalex.org/W1995784954","https://openalex.org/W1980559439","https://openalex.org/W2059982127"],"abstract_inverted_index":{"Utilizing":[0],"thermal":[1,44],"Mirage":[2],"technique,":[3],"UV":[4,53],"laser":[5,55,85],"damage":[6,59,74],"resistivity":[7],"studies":[8],"on":[9,76],"LaF3/MgF2,":[10],"Al2O3/SiO2,":[11],"and":[12,38,43],"HfO2/SiO2":[13],"multilayer":[14,79],"stacks":[15,30],"have":[16],"been":[17],"performed":[18],"at":[19],"(lambda)":[20],"equals":[21,25],"248":[22],"nm,":[23],"(tau)":[24],"20":[26],"ns.":[27],"Investigating":[28],"these":[29],"by":[31,68],"changing":[32],"the":[33,39,58,69,82,88],"number":[34],"of":[35,61,84],"(HL)":[36],"pairs":[37],"substrate":[40],"material,":[41],"optical":[42],"coating":[45],"properties":[46],"were":[47],"shown":[48],"to":[49,65],"be":[50,66],"responsible":[51],"for":[52],"single-shot":[54],"damage.":[56],"Similarly,":[57],"threshold":[60],"selected":[62],"samples":[63],"is":[64],"influenced":[67],"deposition":[70],"technique.":[71],"Furthermore,":[72],"multishot":[73],"measurements":[75],"LaF3/MgF2":[77],"high-reflecting":[78],"coatings":[80],"reveal":[81],"accumulation":[83],"energy":[86],"in":[87],"predamage":[89],"range.":[90]},"counts_by_year":[{"year":2020,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}