{"id":"https://openalex.org/W2017330296","doi":"https://doi.org/10.1116/1.3700227","title":"Influence of ionization degree on film properties when using high power impulse magnetron sputtering","display_name":"Influence of ionization degree on film properties when using high power impulse magnetron sputtering","publication_year":2012,"publication_date":"2012-04-03","ids":{"openalex":"https://openalex.org/W2017330296","doi":"https://doi.org/10.1116/1.3700227","mag":"2017330296"},"language":"en","primary_location":{"id":"doi:10.1116/1.3700227","doi":"https://doi.org/10.1116/1.3700227","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3700227","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-78582","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050510363","display_name":"Mattias Samuelsson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Mattias Samuelsson","raw_affiliation_strings":["Impact Coatings Plasma & Coatings Physics Division, IFM-Materials Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden and , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Impact Coatings Plasma & Coatings Physics Division, IFM-Materials Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden and , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016682524","display_name":"Daniel Lundin","orcid":"https://orcid.org/0000-0001-8591-1003","observed_orcids":["https://orcid.org/0000-0001-8591-1003"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Daniel Lundin","raw_affiliation_strings":["Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075325186","display_name":"Kostas Sarakinos","orcid":"https://orcid.org/0000-0003-2864-9509","observed_orcids":["https://orcid.org/0000-0003-2864-9509"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Kostas Sarakinos","raw_affiliation_strings":["Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050659821","display_name":"Fredrik Bj\u00f6refors","orcid":"https://orcid.org/0000-0002-3598-3903","observed_orcids":["https://orcid.org/0000-0002-3598-3903"]},"institutions":[{"id":"https://openalex.org/I123387679","display_name":"Uppsala University","ror":"https://ror.org/048a87296","country_code":"SE","type":"education","lineage":["https://openalex.org/I123387679"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Fredrik Bj\u00f6refors","raw_affiliation_strings":["Uppsala University Department of Materials Chemistry, The A\u02dangstr\u00f6m Laboratory, , Box 538, SE-751 21 Uppsala, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Uppsala University Department of Materials Chemistry, The A\u02dangstr\u00f6m Laboratory, , Box 538, SE-751 21 Uppsala, Sweden","institution_ids":["https://openalex.org/I123387679"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060041930","display_name":"Bengt W\u00e4livaara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130401","display_name":"Impact Coatings (Sweden)","ror":"https://ror.org/02qv4je94","country_code":"SE","type":"company","lineage":["https://openalex.org/I4210130401"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Bengt W\u00e4livaara","raw_affiliation_strings":["Impact Coatings , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Impact Coatings , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I4210130401"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036137125","display_name":"Henrik Ljungcrantz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130401","display_name":"Impact Coatings (Sweden)","ror":"https://ror.org/02qv4je94","country_code":"SE","type":"company","lineage":["https://openalex.org/I4210130401"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"Henrik Ljungcrantz","raw_affiliation_strings":["Impact Coatings , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Impact Coatings , Westmansgatan 29, SE-582 16 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I4210130401"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5034910199","display_name":"Ulf Helmersson","orcid":"https://orcid.org/0000-0002-1744-7322","observed_orcids":["https://orcid.org/0000-0002-1744-7322"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"U. Helmersson","raw_affiliation_strings":["Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Link\u00f6ping University Plasma & Coatings Physics Division, IFM-Materials Physics, , SE-581 83 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.5567,"has_fulltext":false,"cited_by_count":43,"citation_normalized_percentile":{"value":0.91202594,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"30","issue":"3","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.8550000190734863,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.8550000190734863,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.04050000011920929,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.032099999487400055,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/high-power-impulse-magnetron-sputtering","display_name":"high power impulse magnetron sputtering","score":0.9929999709129333},{"id":"https://openalex.org/keywords/chromium-thin-films","display_name":"chromium thin films","score":0.8799999952316284},{"id":"https://openalex.org/keywords/degree-of-ionization","display_name":"degree of ionization","score":0.8880000114440918},{"id":"https://openalex.org/keywords/dc-magnetron-sputtering","display_name":"DC magnetron sputtering","score":0.8339999914169312},{"id":"https://openalex.org/keywords/deposition-rate","display_name":"deposition rate","score":0.6470000147819519},{"id":"https://openalex.org/keywords/film-microstructure","display_name":"film microstructure","score":0.7149999737739563},{"id":"https://openalex.org/keywords/electrical-properties","display_name":"electrical properties","score":0.9120000004768372},{"id":"https://openalex.org/keywords/electrochemical-properties","display_name":"electrochemical properties","score":0.9919999837875366}],"concepts":[{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.9791980981826782},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.6343002319335938},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6295786499977112},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5327872037887573},{"id":"https://openalex.org/C198291218","wikidata":"https://www.wikidata.org/wiki/Q190382","display_name":"Ionization","level":3,"score":0.49709179997444153},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.457193523645401},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.44926804304122925},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4364315867424011},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.3616212010383606},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.35504627227783203},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.33898815512657166},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2709776759147644},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16124099493026733},{"id":"https://openalex.org/C107872376","wikidata":"https://www.wikidata.org/wiki/Q321355","display_name":"Environmental chemistry","level":1,"score":0.06533694267272949},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1116/1.3700227","doi":"https://doi.org/10.1116/1.3700227","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3700227","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},{"id":"pmh:oai:DiVA.org:liu-78582","doi":null,"is_oa":true,"landing_page_url":"http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-78582","pdf_url":null,"source":{"id":"https://openalex.org/S4306400838","display_name":"DiVA (Linkoping University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I102134673","host_organization_name":"Link\u00f6ping University","host_organization_lineage":["https://openalex.org/I102134673"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":{"id":"pmh:oai:DiVA.org:liu-78582","doi":null,"is_oa":true,"landing_page_url":"http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-78582","pdf_url":null,"source":{"id":"https://openalex.org/S4306400838","display_name":"DiVA (Linkoping University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I102134673","host_organization_name":"Link\u00f6ping University","host_organization_lineage":["https://openalex.org/I102134673"],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"info:eu-repo/semantics/article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W1978371071","https://openalex.org/W1985639844","https://openalex.org/W2009655625","https://openalex.org/W2024867939","https://openalex.org/W2025801567","https://openalex.org/W2029283206","https://openalex.org/W2033098126","https://openalex.org/W2037840071","https://openalex.org/W2037938846","https://openalex.org/W2051087806","https://openalex.org/W2051944828","https://openalex.org/W2057693531","https://openalex.org/W2059144383","https://openalex.org/W2065138335","https://openalex.org/W2070052387","https://openalex.org/W2087318476","https://openalex.org/W2090071143","https://openalex.org/W2091123330","https://openalex.org/W2119368217","https://openalex.org/W2137879896","https://openalex.org/W2161508873","https://openalex.org/W2171852470","https://openalex.org/W2475749900"],"related_works":["https://openalex.org/W2112295128","https://openalex.org/W6991617673","https://openalex.org/W2615265738","https://openalex.org/W2207445862","https://openalex.org/W2908408444","https://openalex.org/W3033786072","https://openalex.org/W2756113806","https://openalex.org/W2617826581","https://openalex.org/W215935753","https://openalex.org/W145115650"],"abstract_inverted_index":{"Chromium":[0],"thin":[1],"films":[2,106],"are":[3],"deposited":[4],"by":[5,47,136],"combining":[6],"direct":[7],"current":[8],"magnetron":[9,15],"sputtering":[10,16],"and":[11,33,53,101,109,174],"high":[12],"power":[13,45,75,133,145],"impulse":[14],"(HiPIMS)":[17],"on":[18,98],"a":[19,29,92],"single":[20],"cathode":[21],"in":[22,148],"an":[23],"industrial":[24],"deposition":[25,31,49,65,94,158,189],"system.":[26],"While":[27],"maintaining":[28],"constant":[30,93],"rate":[32,159,190],"unchanged":[34],"metal":[35,57,60],"ion":[36,58],"energy":[37],"distribution":[38],"function,":[39],"the":[40,43,56,64,71,82,105,113,121,131,137,143,153,166,176,188],"fraction":[41,84,146],"of":[42,63,104,115,120,130,142,152,168,187],"total":[44,73,132],"supplied":[46,135],"either":[48],"technique":[50],"is":[51,68,85,107,134],"altered,":[52],"thereby":[54],"also":[55],"to":[59,77,87,90],"neutral":[61],"ratio":[62],"flux.":[66],"It":[67],"observed":[69],"that":[70,165,175],"required":[72],"average":[74],"needed":[76],"be":[78,88,171,183,197],"proportionally":[79],"increased":[80,86],"as":[81],"HiPIMS":[83,138,144,181],"able":[89],"keep":[91],"rate.":[95],"The":[96,162],"influence":[97,119,151],"microstructure,":[99],"electrical,":[100],"electrochemical":[102],"properties":[103,123,155],"investigated":[108],"shows":[110],"improvements":[111],"with":[112,179],"use":[114],"HiPIMS.":[116],"However,":[117],"considerable":[118],"studied":[122,154],"occurs":[124],"already":[125],"when":[126],"only":[127],"some":[128],"40%":[129],"technique.":[139],"Further":[140],"increase":[141],"results":[147,163],"comparatively":[149],"minor":[150],"yet":[156],"significant":[157],"efficiency":[160],"reduction.":[161],"show":[164],"degree":[167],"ionization":[169],"can":[170,182,196],"controlled":[172],"separately,":[173],"advantages":[177],"associated":[178],"using":[180],"obtained":[184],"while":[185],"much":[186],"reduction,":[191],"often":[192],"reported":[193],"for":[194],"HiPIMS,":[195],"avoided.":[198]},"counts_by_year":[{"year":2025,"cited_by_count":6},{"year":2024,"cited_by_count":4},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":5},{"year":2020,"cited_by_count":3},{"year":2019,"cited_by_count":4},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":3},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":5},{"year":2012,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}