{"id":"https://openalex.org/W2017062889","doi":"https://doi.org/10.1117/12.209264","title":"Optical proximity correction on attenuated phase-shifting photo mask for dense contact array","display_name":"Optical proximity correction on attenuated phase-shifting photo mask for dense contact array","publication_year":1995,"publication_date":"1995-05-26","ids":{"openalex":"https://openalex.org/W2017062889","doi":"https://doi.org/10.1117/12.209264","mag":"2017062889"},"language":"en","primary_location":{"id":"doi:10.1117/12.209264","doi":"https://doi.org/10.1117/12.209264","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.209264","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102080166","display_name":"Yongkyoo Choi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yongkyoo Choi","raw_affiliation_strings":["LG Semicon Co. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Semicon Co. (South Korea)","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110089044","display_name":"Young Jin Song","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Young Jin Song","raw_affiliation_strings":["LG Semicon Co. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Semicon Co. (South Korea)","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081959378","display_name":"Hong\u2010Seok Kim","orcid":"https://orcid.org/0000-0002-2356-8403","observed_orcids":["https://orcid.org/0000-0002-2356-8403","https://orcid.org/0009-0007-9789-159X"]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hong-Seok Kim","raw_affiliation_strings":["LG Semicon Co. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Semicon Co. (South Korea)","institution_ids":["https://openalex.org/I4210131320"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081550018","display_name":"Woo Seob Kim","orcid":"https://orcid.org/0000-0002-4104-3926","observed_orcids":["https://orcid.org/0000-0002-4104-3926"]},"institutions":[{"id":"https://openalex.org/I4210131320","display_name":"LG (South Korea)","ror":"https://ror.org/03ddh2c27","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210131320"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Woo S. Kim","raw_affiliation_strings":["LG Semicon Co. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"LG Semicon Co. (South Korea)","institution_ids":["https://openalex.org/I4210131320"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210131320"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"2440","issue":null,"first_page":"328","last_page":"338"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.996999979019165},{"id":"https://openalex.org/keywords/attenuated-phase-shifting-mask","display_name":"attenuated phase shift mask","score":0.9649999737739563},{"id":"https://openalex.org/keywords/proximity-effect","display_name":"proximity effect","score":0.7419999837875366},{"id":"https://openalex.org/keywords/sidelobe-suppression","display_name":"sidelobe suppression","score":0.8059999942779541},{"id":"https://openalex.org/keywords/process-window","display_name":"process window","score":0.7139999866485596},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.8539999723434448},{"id":"https://openalex.org/keywords/photomask-design","display_name":"mask design","score":0.4230000078678131}],"concepts":[{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6605920195579529},{"id":"https://openalex.org/C32022120","wikidata":"https://www.wikidata.org/wiki/Q797225","display_name":"Interference (communication)","level":3,"score":0.5890885591506958},{"id":"https://openalex.org/C150493377","wikidata":"https://www.wikidata.org/wiki/Q1427863","display_name":"Transmittance","level":2,"score":0.5802672505378723},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.5444198846817017},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.532211184501648},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.463521808385849},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.4471721947193146},{"id":"https://openalex.org/C186370098","wikidata":"https://www.wikidata.org/wiki/Q442787","display_name":"Energy (signal processing)","level":2,"score":0.4146840274333954},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.41227665543556213},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3707171678543091},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3446519374847412},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.20719343423843384},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.1392395794391632},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.209264","doi":"https://doi.org/10.1117/12.209264","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.209264","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W1986132142","https://openalex.org/W2092647220"],"related_works":["https://openalex.org/W1991658516","https://openalex.org/W2070311975","https://openalex.org/W1990454356","https://openalex.org/W2011803676","https://openalex.org/W1998062853","https://openalex.org/W2020061319","https://openalex.org/W2077509736","https://openalex.org/W2061716897","https://openalex.org/W2579859068","https://openalex.org/W2055595803"],"abstract_inverted_index":{"The":[0,52,81],"application":[1],"of":[2,15,32,41,54,79,127],"attenuated":[3,113],"PSM":[4,114],"to":[5,28,37,75,87,122],"dense":[6,98,124],"contact":[7,99,125],"array":[8],"is":[9,22,35],"restricted":[10],"by":[11,65],"intense":[12],"optical":[13],"interference":[14],"sidelobe":[16,84,96],"peaks":[17],"around":[18],"hole":[19,100,126],"pattern":[20,117],"which":[21,48],"called":[23],"proximity":[24],"effect.":[25],"In":[26],"order":[27],"reduce":[29,95],"the":[30,39,45,77,102,123],"effect":[31],"proximity,":[33],"it":[34],"necessary":[36],"optimize":[38],"transmittance":[40],"mask":[42,50],"field":[43],"and":[44,111],"exposing":[46],"energy":[47],"cause":[49],"bias.":[51],"vast":[53],"data":[55],"are":[56],"required":[57],"for":[58,83],"doing":[59],"above":[60],"job.":[61],"Using":[62],"simulation,":[63],"however,":[64],"sidelobe,":[66],"E-":[67],"D":[68],"curves":[69],"can":[70],"not":[71],"be":[72,119],"used":[73],"directly":[74],"find":[76,88],"depth":[78],"focus.":[80],"criterion":[82],"was":[85],"defined":[86],"process":[89],"window":[90],"from":[91],"E-D":[92],"curve.":[93],"To":[94],"in":[97],"array,":[101],"auxiliary":[103,116],"patterns":[104],"were":[105],"placed":[106],"between":[107],"holes.":[108],"By":[109],"simulations":[110],"experiments,":[112],"with":[115],"could":[118],"applied":[120],"effectively":[121],"64MDRAM.":[128]},"counts_by_year":[],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}