{"id":"https://openalex.org/W2017052842","doi":"https://doi.org/10.1117/12.150461","title":"Chromeless phase mask by resist silylation for i-line lithography","display_name":"Chromeless phase mask by resist silylation for i-line lithography","publication_year":1993,"publication_date":"1993-08-08","ids":{"openalex":"https://openalex.org/W2017052842","doi":"https://doi.org/10.1117/12.150461","mag":"2017052842"},"language":"en","primary_location":{"id":"doi:10.1117/12.150461","doi":"https://doi.org/10.1117/12.150461","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.150461","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5071117642","display_name":"Lothar Bauch","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lothar Bauch","raw_affiliation_strings":["Institut fuer Halbleiterphysik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut fuer Halbleiterphysik GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111658560","display_name":"Joachim J. Bauer","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Joachim J. Bauer","raw_affiliation_strings":["Institut fuer Halbleiterphysik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut fuer Halbleiterphysik GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048654849","display_name":"Monika Boettcher","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Monika Boettcher","raw_affiliation_strings":["Institut fuer Halbleiterphysik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut fuer Halbleiterphysik GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040997047","display_name":"Ulrich Haak","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ulrich Haak","raw_affiliation_strings":["Institut fuer Halbleiterphysik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut fuer Halbleiterphysik GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007443680","display_name":"W. H\u00f6ppner","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Wolfgang W. Hoeppner","raw_affiliation_strings":["Institut fuer Halbleiterphysik GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institut fuer Halbleiterphysik GmbH (Germany)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5015533284","display_name":"Georg G. Mehliss","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Georg G. Mehliss","raw_affiliation_strings":["Allresist GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Allresist GmbH (Germany)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.18265923,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"1927","issue":null,"first_page":"666","last_page":"666"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/i-line-lithography","display_name":"i-line lithography","score":0.9369999766349792},{"id":"https://openalex.org/keywords/novolak-resists","display_name":"novolak resists","score":0.902999997138977},{"id":"https://openalex.org/keywords/resist-swelling","display_name":"resist swelling","score":0.9490000009536743},{"id":"https://openalex.org/keywords/image-transmission","display_name":"image transmission","score":0.6470000147819519},{"id":"https://openalex.org/keywords/optical-simulation","display_name":"optical simulation","score":0.47200000286102295},{"id":"https://openalex.org/keywords/high-resolution-lithography","display_name":"high-resolution lithography","score":0.6800000071525574},{"id":"https://openalex.org/keywords/scanning-electron-microscopy-images","display_name":"scanning electron microscopy images","score":0.4090000092983246}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.9800075888633728},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8048198819160461},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6719107031822205},{"id":"https://openalex.org/C5304478","wikidata":"https://www.wikidata.org/wiki/Q502457","display_name":"Silylation","level":3,"score":0.5877556800842285},{"id":"https://openalex.org/C3017524520","wikidata":"https://www.wikidata.org/wiki/Q212111","display_name":"Line width","level":2,"score":0.5731787085533142},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5654679536819458},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.5551036596298218},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5009815692901611},{"id":"https://openalex.org/C2778540859","wikidata":"https://www.wikidata.org/wiki/Q152234","display_name":"Swelling","level":2,"score":0.49991297721862793},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.48334571719169617},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3543510437011719},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.28604692220687866},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.13819000124931335},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.12430569529533386},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.08424636721611023},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.07286423444747925},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.05352059006690979},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.150461","doi":"https://doi.org/10.1117/12.150461","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.150461","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2057152256","https://openalex.org/W1991786372","https://openalex.org/W2083773853","https://openalex.org/W1967832043","https://openalex.org/W1981172354","https://openalex.org/W2028723325","https://openalex.org/W3180935739","https://openalex.org/W1992717490","https://openalex.org/W2065656059","https://openalex.org/W1549183868"],"abstract_inverted_index":{"The":[0,23,52],"generation":[1],"of":[2,11,19,29,32,40,55],"the":[3,17,20,26],"required":[4],"phase":[5,46],"difference":[6],"is":[7,64],"made":[8],"by":[9,37,66],"silylation":[10],"a":[12,59],"novolak":[13],"based":[14],"resist":[15],"using":[16,44],"swelling":[18],"exposed":[21],"resist.":[22],"contrast":[24],"and":[25,50],"image":[27,42],"transfer":[28,43],"these":[30],"kinds":[31],"transparent":[33],"masks":[34],"are":[35,48],"calculated":[36],"simulation.":[38],"Results":[39],"optical":[41],"this":[45],"mask":[47],"presented":[49],"discussed.":[51],"high":[53],"resolution":[54],"0.3":[56],"micrometers":[57],"for":[58],"simple":[60],"i-":[61],"line":[62],"technique":[63],"demonstrated":[65],"SEM":[67],"micrographs.":[68]},"counts_by_year":[],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}