{"id":"https://openalex.org/W2017007853","doi":"https://doi.org/10.1016/0040-6090(85)90353-0","title":"Electrical and optical properties of single-phase CuInS2 films prepared using spray pyrolysis","display_name":"Electrical and optical properties of single-phase CuInS2 films prepared using spray pyrolysis","publication_year":1985,"publication_date":"1985-08-01","ids":{"openalex":"https://openalex.org/W2017007853","doi":"https://doi.org/10.1016/0040-6090(85)90353-0","mag":"2017007853"},"language":"en","primary_location":{"id":"doi:10.1016/0040-6090(85)90353-0","doi":"https://doi.org/10.1016/0040-6090(85)90353-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0040-6090(85)90353-0","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5028942695","display_name":"Ayodhya Nath Tiwari","orcid":"https://orcid.org/0000-0002-8078-5965","observed_orcids":["https://orcid.org/0000-0002-8078-5965"]},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"A.N. Tiwari","raw_affiliation_strings":["Department of Physics, Indian Institute of Technology, New Delhi 110016, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Indian Institute of Technology, New Delhi 110016, India","institution_ids":["https://openalex.org/I68891433"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014914166","display_name":"Dinesh K. Pandya","orcid":"https://orcid.org/0000-0002-1604-1187","observed_orcids":["https://orcid.org/0000-0002-1604-1187"]},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"D.K. Pandya","raw_affiliation_strings":["Department of Physics, Indian Institute of Technology, New Delhi 110016, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Indian Institute of Technology, New Delhi 110016, India","institution_ids":["https://openalex.org/I68891433"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5074891552","display_name":"K. L. Chopra","orcid":"https://orcid.org/0009-0008-1041-4609","observed_orcids":["https://orcid.org/0009-0008-1041-4609"]},"institutions":[{"id":"https://openalex.org/I68891433","display_name":"Indian Institute of Technology Delhi","ror":"https://ror.org/049tgcd06","country_code":"IN","type":"education","lineage":["https://openalex.org/I68891433"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"K.L. Chopra","raw_affiliation_strings":["Department of Physics, Indian Institute of Technology, New Delhi 110016, India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Indian Institute of Technology, New Delhi 110016, India","institution_ids":["https://openalex.org/I68891433"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I68891433"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":3.7836,"has_fulltext":false,"cited_by_count":72,"citation_normalized_percentile":{"value":0.92261191,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"130","issue":"3-4","first_page":"217","last_page":"230"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cuins2-thin-films","display_name":"CuInS2 thin films","score":0.8799999952316284},{"id":"https://openalex.org/keywords/spray-pyrolysis","display_name":"spray pyrolysis","score":0.9340000152587891},{"id":"https://openalex.org/keywords/chalcopyrite-structure","display_name":"chalcopyrite structure","score":0.7360000014305115},{"id":"https://openalex.org/keywords/sphalerite-structure","display_name":"sphalerite structure","score":0.8069999814033508},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.7879999876022339},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.7009999752044678},{"id":"https://openalex.org/keywords/optical-band-gap","display_name":"optical band gap","score":0.9660000205039978},{"id":"https://openalex.org/keywords/photoconductivity","display_name":"photoconductivity","score":0.9909999966621399},{"id":"https://openalex.org/keywords/photosensitivity","display_name":"photosensitivity","score":0.9539999961853027},{"id":"https://openalex.org/keywords/phase-composition","display_name":"phase composition","score":0.3179999887943268}],"concepts":[{"id":"https://openalex.org/C2778188036","wikidata":"https://www.wikidata.org/wiki/Q111044","display_name":"Chalcopyrite","level":3,"score":0.8638492226600647},{"id":"https://openalex.org/C2776268066","wikidata":"https://www.wikidata.org/wiki/Q105006","display_name":"Sphalerite","level":3,"score":0.7807971239089966},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.750557541847229},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.6982046365737915},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.6854530572891235},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6255542635917664},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.6011506915092468},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5414654016494751},{"id":"https://openalex.org/C2988664670","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Spray pyrolysis","level":3,"score":0.5203841924667358},{"id":"https://openalex.org/C201999631","wikidata":"https://www.wikidata.org/wiki/Q2601129","display_name":"Photoconductivity","level":2,"score":0.4847831130027771},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4512278139591217},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3543187379837036},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3263666033744812},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2518545091152191},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2187885046005249},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.11711734533309937},{"id":"https://openalex.org/C2776062231","wikidata":"https://www.wikidata.org/wiki/Q50769","display_name":"Pyrite","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0040-6090(85)90353-0","doi":"https://doi.org/10.1016/0040-6090(85)90353-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0040-6090(85)90353-0","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":19,"referenced_works":["https://openalex.org/W1549342671","https://openalex.org/W1965629840","https://openalex.org/W1966173408","https://openalex.org/W1971987966","https://openalex.org/W1984975552","https://openalex.org/W1986579380","https://openalex.org/W1987364258","https://openalex.org/W1997178004","https://openalex.org/W1999629214","https://openalex.org/W2005555315","https://openalex.org/W2025802187","https://openalex.org/W2046838367","https://openalex.org/W2074573959","https://openalex.org/W2076882372","https://openalex.org/W2087280222","https://openalex.org/W2164412476","https://openalex.org/W2315770607","https://openalex.org/W4233173781","https://openalex.org/W7043819184"],"related_works":["https://openalex.org/W2011405630","https://openalex.org/W2042107085","https://openalex.org/W2496312505","https://openalex.org/W2047043053","https://openalex.org/W2071224589","https://openalex.org/W426429644","https://openalex.org/W2185787476","https://openalex.org/W1979929892","https://openalex.org/W2020916500","https://openalex.org/W1989797995"],"abstract_inverted_index":null,"counts_by_year":[{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":6},{"year":2012,"cited_by_count":5}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}