{"id":"https://openalex.org/W2016942166","doi":"https://doi.org/10.1557/proc-337-121","title":"Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors","display_name":"Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors","publication_year":1994,"publication_date":"1994-01-01","ids":{"openalex":"https://openalex.org/W2016942166","doi":"https://doi.org/10.1557/proc-337-121","mag":"2016942166"},"language":"en","primary_location":{"id":"doi:10.1557/proc-337-121","doi":"https://doi.org/10.1557/proc-337-121","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-337-121","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5008426637","display_name":"Rahul Jairath","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Rahul Jairath","raw_affiliation_strings":["On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","[SEMATECH, Austin, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"[SEMATECH, Austin, USA]","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086182490","display_name":"Mukesh Desai","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Mukesh Desai","raw_affiliation_strings":["On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","[SEMATECH, Austin, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"[SEMATECH, Austin, USA]","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085887414","display_name":"Matt Stell","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Matt Stell","raw_affiliation_strings":["On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","[SEMATECH, Austin, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"[SEMATECH, Austin, USA]","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026696372","display_name":"Robert Tolles","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Robert Tolles","raw_affiliation_strings":["On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","[SEMATECH, Austin, USA]"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"On assignmnent from National Semiconductor Corporation,\n        On assignment from IBM,\n        On assignment from Digital Equipment Corporation,\n        SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA","institution_ids":[]},{"raw_affiliation_string":"[SEMATECH, Austin, USA]","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5050472485","display_name":"Debra Scherber-Brewer","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Debra Scherber-Brewer","raw_affiliation_strings":["Rippey Corporation, 5080 Robert J. Mathews Parkway, El Dorado Hills, CA, 95762, USA","Rippey Corporation, El Dorado Hills, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rippey Corporation, 5080 Robert J. Mathews Parkway, El Dorado Hills, CA, 95762, USA","institution_ids":[]},{"raw_affiliation_string":"Rippey Corporation, El Dorado Hills, USA","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.1861,"has_fulltext":false,"cited_by_count":49,"citation_normalized_percentile":{"value":0.75998598,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"337","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10188","display_name":"Advanced machining processes and optimization","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/chemical-mechanical-polishing","display_name":"chemical mechanical polishing","score":0.9980000257492065},{"id":"https://openalex.org/keywords/polishing-slurry","display_name":"polishing slurry","score":0.8769999742507935},{"id":"https://openalex.org/keywords/metal-removal","display_name":"metal removal","score":0.7200000286102295},{"id":"https://openalex.org/keywords/silica-abrasive","display_name":"silica abrasive","score":0.6589999794960022},{"id":"https://openalex.org/keywords/ceria-abrasive","display_name":"ceria abrasive","score":0.9810000061988831},{"id":"https://openalex.org/keywords/alumina-abrasive","display_name":"alumina abrasive","score":1.0},{"id":"https://openalex.org/keywords/dispersants","display_name":"dispersants","score":0.9110000133514404},{"id":"https://openalex.org/keywords/polishing-pad","display_name":"polishing pad","score":0.753000020980835},{"id":"https://openalex.org/keywords/polishing-pressure","display_name":"polishing pressure","score":0.4269999861717224},{"id":"https://openalex.org/keywords/planarity","display_name":"planarity","score":0.5429999828338623},{"id":"https://openalex.org/keywords/pattern-definition","display_name":"pattern definition","score":0.6549999713897705},{"id":"https://openalex.org/keywords/integrated-circuit-fabrication","display_name":"integrated circuit fabrication","score":0.5139999985694885}],"concepts":[{"id":"https://openalex.org/C180088628","wikidata":"https://www.wikidata.org/wiki/Q1069404","display_name":"Chemical-mechanical planarization","level":3,"score":0.9865641593933105},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.9355628490447998},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8024152517318726},{"id":"https://openalex.org/C62126406","wikidata":"https://www.wikidata.org/wiki/Q1681365","display_name":"Consumables","level":2,"score":0.7452607750892639},{"id":"https://openalex.org/C2780957350","wikidata":"https://www.wikidata.org/wiki/Q372301","display_name":"Abrasive","level":2,"score":0.6912621259689331},{"id":"https://openalex.org/C94293008","wikidata":"https://www.wikidata.org/wiki/Q23925154","display_name":"Slurry","level":2,"score":0.6703368425369263},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.517600417137146},{"id":"https://openalex.org/C88380143","wikidata":"https://www.wikidata.org/wiki/Q416674","display_name":"Dissolution","level":2,"score":0.49889636039733887},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.43587902188301086},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3949730396270752},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.33731865882873535},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.21138739585876465},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.16740360856056213},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.07848852872848511},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-337-121","doi":"https://doi.org/10.1557/proc-337-121","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-337-121","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W1481257890","https://openalex.org/W1851240984","https://openalex.org/W2075194566"],"related_works":["https://openalex.org/W1977171798","https://openalex.org/W2100180377","https://openalex.org/W1972606339","https://openalex.org/W2312386506","https://openalex.org/W2559865699","https://openalex.org/W2169119348","https://openalex.org/W2631860642","https://openalex.org/W36515952","https://openalex.org/W964906591","https://openalex.org/W2003349207"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-06-19T15:47:20.252518","created_date":"2016-06-24T00:00:00"}