{"id":"https://openalex.org/W2016850843","doi":"https://doi.org/10.1116/1.576260","title":"The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films","display_name":"The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films","publication_year":1989,"publication_date":"1989-05-01","ids":{"openalex":"https://openalex.org/W2016850843","doi":"https://doi.org/10.1116/1.576260","mag":"2016850843"},"language":"en","primary_location":{"id":"doi:10.1116/1.576260","doi":"https://doi.org/10.1116/1.576260","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.576260","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111709372","display_name":"R.P. Howson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I143804889","display_name":"Loughborough University","ror":"https://ror.org/04vg4w365","country_code":"GB","type":"education","lineage":["https://openalex.org/I143804889"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"R. P. Howson","raw_affiliation_strings":["Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England","institution_ids":["https://openalex.org/I143804889"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110069571","display_name":"Alaric G. Spencer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I143804889","display_name":"Loughborough University","ror":"https://ror.org/04vg4w365","country_code":"GB","type":"education","lineage":["https://openalex.org/I143804889"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"A. G. Spencer","raw_affiliation_strings":["Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England","institution_ids":["https://openalex.org/I143804889"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111840157","display_name":"K. Oka","orcid":"https://orcid.org/0000-0001-6806-2767","observed_orcids":["https://orcid.org/0000-0001-6806-2767"]},"institutions":[{"id":"https://openalex.org/I143804889","display_name":"Loughborough University","ror":"https://ror.org/04vg4w365","country_code":"GB","type":"education","lineage":["https://openalex.org/I143804889"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"K. Oka","raw_affiliation_strings":["Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England","institution_ids":["https://openalex.org/I143804889"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5048168908","display_name":"R Lewin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I143804889","display_name":"Loughborough University","ror":"https://ror.org/04vg4w365","country_code":"GB","type":"education","lineage":["https://openalex.org/I143804889"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"R. W. Lewin","raw_affiliation_strings":["Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, Loughborough University of Technology, Loughborough, Leicestershire, LE11 3TU England","institution_ids":["https://openalex.org/I143804889"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I143804889"],"apc_list":null,"apc_paid":null,"fwci":9.2241,"has_fulltext":false,"cited_by_count":80,"citation_normalized_percentile":{"value":0.98430643,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"7","issue":"3","first_page":"1230","last_page":"1234"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.7738999724388123,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.7738999724388123,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.08940000087022781,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.06970000267028809,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-dc-magnetron-sputtering","display_name":"reactive DC magnetron sputtering","score":0.8840000033378601},{"id":"https://openalex.org/keywords/thin-film-deposition","display_name":"thin film deposition","score":0.7990000247955322},{"id":"https://openalex.org/keywords/optical-emission-spectroscopy","display_name":"optical emission spectroscopy","score":0.8149999976158142},{"id":"https://openalex.org/keywords/plasma-flow-control","display_name":"plasma flow control","score":0.6299999952316284},{"id":"https://openalex.org/keywords/substrate-bias","display_name":"substrate bias","score":0.8569999933242798},{"id":"https://openalex.org/keywords/indium-oxide-films","display_name":"indium oxide films","score":0.7599999904632568},{"id":"https://openalex.org/keywords/titanium-oxide-films","display_name":"titanium oxide films","score":0.9679999947547913},{"id":"https://openalex.org/keywords/high-rate-deposition","display_name":"high deposition rate","score":0.7720000147819519},{"id":"https://openalex.org/keywords/film-resistivity","display_name":"film resistivity","score":0.7799999713897705},{"id":"https://openalex.org/keywords/refractive-index","display_name":"refractive index","score":0.9890000224113464}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6657469868659973},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.6653324365615845},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6464972496032715},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.5804442167282104},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.5760289430618286},{"id":"https://openalex.org/C166524527","wikidata":"https://www.wikidata.org/wiki/Q61670599","display_name":"Titanium oxide","level":2,"score":0.5757275819778442},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5712109804153442},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5491020679473877},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5468946099281311},{"id":"https://openalex.org/C2776620479","wikidata":"https://www.wikidata.org/wiki/Q159241","display_name":"Direct current","level":3,"score":0.5412828922271729},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5058281421661377},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.49563682079315186},{"id":"https://openalex.org/C172120300","wikidata":"https://www.wikidata.org/wiki/Q1134348","display_name":"Volumetric flow rate","level":2,"score":0.4683845341205597},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4575599133968353},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.44605520367622375},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3351967930793762},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.22055795788764954},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2131885290145874},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1324104368686676},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.08580037951469421},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.058908700942993164},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.576260","doi":"https://doi.org/10.1116/1.576260","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.576260","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1982093448","https://openalex.org/W2037082524","https://openalex.org/W863204525","https://openalex.org/W7204358248","https://openalex.org/W2093173386","https://openalex.org/W2559280092","https://openalex.org/W1994293766","https://openalex.org/W1995873666","https://openalex.org/W1992727139","https://openalex.org/W2080532757"],"abstract_inverted_index":{"The":[0,30],"process":[1],"of":[2,64,69,79,91,101],"reactive":[3,27],"dc":[4],"magnetron":[5],"sputtering":[6],"is":[7,18,39],"shown":[8],"to":[9,24,41],"provide":[10],"a":[11,43,48,89,98],"high-rate,":[12],"large-area":[13],"deposition":[14],"system":[15],"when":[16,35,106],"stability":[17],"achieved":[19],"using":[20],"optical":[21],"emission":[22],"spectroscopy":[23],"control":[25],"the":[26,36,54,67],"gas":[28],"flow.":[29],"film":[31],"properties":[32],"are":[33,83],"improved":[34],"isolated":[37],"substrate":[38],"allowed":[40],"acquire":[42],"bias":[44],"by":[45],"immersion":[46],"in":[47],"plasma":[49],"directed":[50],"onto":[51,108],"it":[52],"from":[53],"source.":[55],"These":[56],"techniques":[57],"give":[58],"good":[59],"results":[60],"at":[61,103],"high":[62],"rates":[63],"production":[65],"without":[66],"complications":[68],"rf":[70],"or":[71],"ion":[72],"beam":[73],"systems.":[74],"Results":[75],"for":[76],"oxide":[77,86,97],"systems":[78],"indium":[80],"and":[81,95],"titanium":[82,96],"presented.":[84],"Indium":[85],"films":[87],"gave":[88],"resistivity":[90],"4\u00d710\u22126":[92],"\u03a9":[93],"m":[94],"refractive":[99],"value":[100],"2.55":[102],"633":[104],"nm":[105],"deposited":[107],"room-temperature":[109],"substrates.":[110]},"counts_by_year":[{"year":2023,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}