{"id":"https://openalex.org/W2016447845","doi":"https://doi.org/10.1116/1.3100270","title":"Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists","display_name":"Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists","publication_year":2009,"publication_date":"2009-03-01","ids":{"openalex":"https://openalex.org/W2016447845","doi":"https://doi.org/10.1116/1.3100270","mag":"2016447845"},"language":"en","primary_location":{"id":"doi:10.1116/1.3100270","doi":"https://doi.org/10.1116/1.3100270","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3100270","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5085683353","display_name":"Christopher N. Anderson","orcid":"https://orcid.org/0000-0001-9641-853X","observed_orcids":["https://orcid.org/0000-0001-9641-853X"]},"institutions":[{"id":"https://openalex.org/I95457486","display_name":"University of California, Berkeley","ror":"https://ror.org/01an7q238","country_code":"US","type":"education","lineage":["https://openalex.org/I95457486"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Christopher N. Anderson","raw_affiliation_strings":["University of California at Berkeley Applied Science and Technology Graduate Group, , Berkeley, Berkeley, California 94720"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of California at Berkeley Applied Science and Technology Graduate Group, , Berkeley, Berkeley, California 94720","institution_ids":["https://openalex.org/I95457486"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5003343236","display_name":"Patrick P Naulleau","orcid":"https://orcid.org/0000-0001-6242-1837","observed_orcids":["https://orcid.org/0000-0001-6242-1837"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Patrick P. Naulleau","raw_affiliation_strings":["Lawrence Berkeley National Laboratory Center for X-ray Optics, , 1 Cyclotron Road, Berkeley, California 94720"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Laboratory Center for X-ray Optics, , 1 Cyclotron Road, Berkeley, California 94720","institution_ids":["https://openalex.org/I148283060"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.5776,"has_fulltext":true,"cited_by_count":21,"citation_normalized_percentile":{"value":0.88884078,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"27","issue":"2","first_page":"665","last_page":"670"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":1.0},{"id":"https://openalex.org/keywords/shot-noise","display_name":"shot noise","score":0.9980000257492065},{"id":"https://openalex.org/keywords/chemical-contrast","display_name":"chemical contrast","score":0.8709999918937683},{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.7099999785423279},{"id":"https://openalex.org/keywords/resist-patterning","display_name":"resist patterning","score":0.3370000123977661}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.940660834312439},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.7868050932884216},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.7278705835342407},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.7052034735679626},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6496198773384094},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5133115649223328},{"id":"https://openalex.org/C2776798109","wikidata":"https://www.wikidata.org/wiki/Q11391","display_name":"Ultraviolet","level":2,"score":0.4766436517238617},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.4142623543739319},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.41043734550476074},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.352314293384552},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3037009835243225},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2640785872936249},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.22602447867393494},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.19339942932128906},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.09985250234603882},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.09751155972480774},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0820915699005127},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":6,"locations":[{"id":"doi:10.1116/1.3100270","doi":"https://doi.org/10.1116/1.3100270","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3100270","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"},{"id":"pmh:info:ark/67531/metadc929719","doi":null,"is_oa":true,"landing_page_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/","pdf_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/","source":{"id":"https://openalex.org/S4306400792","display_name":"University of North Texas Digital Library (University of North Texas)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I123534392","host_organization_name":"University of North Texas","host_organization_lineage":["https://openalex.org/I123534392"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"JVST B","raw_type":"Article"},{"id":"pmh:oai:escholarship.org/ark:/13030/qt5fj2s0jn","doi":null,"is_oa":true,"landing_page_url":"https://escholarship.org/uc/item/5fj2s0jn","pdf_url":"https://escholarship.org/uc/item/5fj2s0jn","source":{"id":"https://openalex.org/S4306400115","display_name":"eScholarship (California Digital Library)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I2801248553","host_organization_name":"California Digital Library","host_organization_lineage":["https://openalex.org/I2801248553"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"article"},{"id":"pmh:qt5fj2s0jn","doi":null,"is_oa":true,"landing_page_url":"http://www.escholarship.org/uc/item/5fj2s0jn","pdf_url":"http://www.escholarship.org/uc/item/5fj2s0jn","source":{"id":"https://openalex.org/S4306400115","display_name":"eScholarship (California Digital Library)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I2801248553","host_organization_name":"California Digital Library","host_organization_lineage":["https://openalex.org/I2801248553"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Anderson, Christopher N.(2009). Don't always blame the photons: Relationships between deprotection blur, LER, and shot noise in EUV photoresists. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/5fj2s0jn","raw_type":"article"},{"id":"pmh:oai:osti.gov:950847","doi":null,"is_oa":true,"landing_page_url":"https://www.osti.gov/servlets/purl/950847","pdf_url":null,"source":{"id":"https://openalex.org/S4306402487","display_name":"OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I139351228","host_organization_name":"Office of Scientific and Technical Information","host_organization_lineage":["https://openalex.org/I139351228"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null},{"id":"mag:1575705797","doi":null,"is_oa":false,"landing_page_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/m2/1/high_res_d/950847.pdf","pdf_url":null,"source":{"id":"https://openalex.org/S2764971142","display_name":"Lawrence Berkeley National Laboratory","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4320800592","host_organization_name":"United States Department of Energy","host_organization_lineage":["https://openalex.org/P4320800592"],"host_organization_lineage_names":["United States Department of Energy"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Lawrence Berkeley National Laboratory","raw_type":null}],"best_oa_location":{"id":"pmh:info:ark/67531/metadc929719","doi":null,"is_oa":true,"landing_page_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/","pdf_url":"https://digital.library.unt.edu/ark:/67531/metadc929719/","source":{"id":"https://openalex.org/S4306400792","display_name":"University of North Texas Digital Library (University of North Texas)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I123534392","host_organization_name":"University of North Texas","host_organization_lineage":["https://openalex.org/I123534392"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"JVST B","raw_type":"Article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1079818582","display_name":null,"funder_award_id":"AC02\u201005CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"},{"id":"https://openalex.org/G1143651532","display_name":null,"funder_award_id":"DE-AC02-05CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"},{"id":"https://openalex.org/G1286236842","display_name":null,"funder_award_id":"-AC02-05CH11231","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"},{"id":"https://openalex.org/G1286251239","display_name":null,"funder_award_id":"DE-AC02","funder_id":"https://openalex.org/F4320337480","funder_display_name":"Basic Energy Sciences"},{"id":"https://openalex.org/G1863003419","display_name":null,"funder_award_id":"DEAC02-05CH11231","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G30714459","display_name":null,"funder_award_id":"DE-AC02-05CH11231.","funder_id":"https://openalex.org/F4320337480","funder_display_name":"Basic Energy Sciences"},{"id":"https://openalex.org/G3083819904","display_name":null,"funder_award_id":"05CH11231","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"},{"id":"https://openalex.org/G419881185","display_name":null,"funder_award_id":"DEAC02\u201305CH11231","funder_id":"https://openalex.org/F4320332359","funder_display_name":"Office of Science"},{"id":"https://openalex.org/G42916606","display_name":null,"funder_award_id":"DE AC02 05CH11231","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"},{"id":"https://openalex.org/G4501827968","display_name":null,"funder_award_id":"AC02-05CH11231","funder_id":"https://openalex.org/F4320332359","funder_display_name":"Office of Science"},{"id":"https://openalex.org/G498139845","display_name":null,"funder_award_id":"DE-AC02","funder_id":"https://openalex.org/F4320332359","funder_display_name":"Office of Science"},{"id":"https://openalex.org/G650090426","display_name":null,"funder_award_id":"AC02\u201305CH11231","funder_id":"https://openalex.org/F4320337480","funder_display_name":"Basic Energy Sciences"},{"id":"https://openalex.org/G7354628648","display_name":null,"funder_award_id":"05CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"},{"id":"https://openalex.org/G969889393","display_name":null,"funder_award_id":"DE-AC02-","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"}],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320306084","display_name":"U.S. Department of Energy","ror":"https://ror.org/01bj3aw27"},{"id":"https://openalex.org/F4320317283","display_name":"Engineering Research Centers","ror":null},{"id":"https://openalex.org/F4320332359","display_name":"Office of Science","ror":"https://ror.org/00mmn6b08"},{"id":"https://openalex.org/F4320332911","display_name":"University at Albany","ror":"https://ror.org/012zs8222"},{"id":"https://openalex.org/F4320337480","display_name":"Basic Energy Sciences","ror":"https://ror.org/05mg91w61"},{"id":"https://openalex.org/F4320338292","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2016447845.pdf","grobid_xml":"https://content.openalex.org/works/W2016447845.grobid-xml"},"referenced_works_count":24,"referenced_works":["https://openalex.org/W1531772046","https://openalex.org/W1567790516","https://openalex.org/W1567884812","https://openalex.org/W1965618765","https://openalex.org/W1972904929","https://openalex.org/W1984184999","https://openalex.org/W1986698454","https://openalex.org/W2001674320","https://openalex.org/W2005936361","https://openalex.org/W2009027802","https://openalex.org/W2014038471","https://openalex.org/W2020593533","https://openalex.org/W2033205388","https://openalex.org/W2056003104","https://openalex.org/W2061963067","https://openalex.org/W2080416894","https://openalex.org/W2082038703","https://openalex.org/W2089738587","https://openalex.org/W2092723172","https://openalex.org/W2095179359","https://openalex.org/W2126362172","https://openalex.org/W2128288176","https://openalex.org/W2234538420","https://openalex.org/W2601672620"],"related_works":["https://openalex.org/W1575705797","https://openalex.org/W2601672620","https://openalex.org/W2089738587","https://openalex.org/W1567884812","https://openalex.org/W2891849628","https://openalex.org/W1645166026","https://openalex.org/W1522818775","https://openalex.org/W1896953295","https://openalex.org/W2059268103","https://openalex.org/W2770335674"],"abstract_inverted_index":{"A":[0],"corner":[1,120],"rounding":[2],"metric":[3],"has":[4,178],"been":[5,179],"used":[6,137],"to":[7,138,190,198],"determine":[8],"the":[9,60,80,109,119,126,144,168,172,182,199],"deprotection":[10,101,116,147,193],"blur":[11,117,194],"of":[12,82,128],"Rohm":[13],"and":[14,20,45,49,67,90,124,150],"Haas":[15],"XP":[16,18,21,61,63,65],"5435,":[17,62],"5271,":[19,64],"5496":[22],"extreme":[23],"ultraviolet":[24],"(EUV)":[25],"photoresists":[26,52],"as":[27,39,53],"base":[28,40,76],"wt":[29,41,77],"%":[30,42,78],"is":[31,43,57,165,195],"varied,":[32,44],"an":[33],"experimental":[34],"open":[35],"platform":[36],"photoresist":[37],"(EH27)":[38],"TOK":[46,104],"EUVR":[47,105],"P1123":[48,106],"FUJI":[50],"1195":[51],"postexposure":[54],"bake":[55],"temperature":[56,111],"varied.":[58],"In":[59,103],"5496,":[66],"EH27":[68],"resist":[69],"platforms,":[70],"a":[71,140],"six":[72],"times":[73],"increase":[74],"in":[75,153],"reduces":[79,114,125],"size":[81],"successfully":[83],"patterned":[84],"1:1":[85,130],"lines":[86,131],"by":[87,96],"over":[88,97,181],"10nm":[89],"lowers":[91],"intrinsic":[92],"line-edge":[93],"roughness":[94],"(LER)":[95],"2.5nm":[98],"without":[99],"changing":[100],"blur.":[102],"photoresist,":[107],"lowering":[108],"PEB":[110],"from":[112,122,132],"100to80\u00b0C":[113],"measured":[115],"(using":[118],"metric)":[121],"30to20nm":[123],"LER":[127,175,191],"50nm":[129],"4.8to4.3nm.":[133],"These":[134],"data":[135],"are":[136],"drive":[139],"lengthy":[141],"discussion":[142],"about":[143],"relationships":[145],"between":[146],"blur,":[148],"LER,":[149],"shot":[151,163],"noise":[152,164],"EUV":[154,174],"photoresists.":[155],"The":[156],"authors":[157],"provide":[158],"two":[159],"separate":[160],"conclusions:":[161],"(1)":[162],"probably":[166],"not":[167],"dominant":[169],"mechanism":[170],"causing":[171],"3\u20134nm":[173],"floor":[176],"that":[177],"observed":[180],"past":[183],"several":[184],"years;":[185],"(2)":[186],"chemical":[187],"contrast":[188],"contributes":[189],"whenever":[192],"large":[196],"relative":[197],"printed":[200],"half-pitch.":[201]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":5}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}