{"id":"https://openalex.org/W2016415500","doi":"https://doi.org/10.1117/12.746801","title":"Exploring the sources of MEEF in contact SRAMs","display_name":"Exploring the sources of MEEF in contact SRAMs","publication_year":2007,"publication_date":"2007-10-05","ids":{"openalex":"https://openalex.org/W2016415500","doi":"https://doi.org/10.1117/12.746801","mag":"2016415500"},"language":"en","primary_location":{"id":"doi:10.1117/12.746801","doi":"https://doi.org/10.1117/12.746801","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.746801","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5004229374","display_name":"Emily E. Gallagher","orcid":"https://orcid.org/0000-0002-2927-8298","observed_orcids":["https://orcid.org/0000-0002-2927-8298"]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Emily Gallagher","raw_affiliation_strings":["IBM Corp. (United States)","IBM Corporation, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Corp. (United States)","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Corporation, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014350074","display_name":"Ian P. Stobert","orcid":"https://orcid.org/0000-0002-7659-8972","observed_orcids":["https://orcid.org/0000-0002-7659-8972"]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ian Stobert","raw_affiliation_strings":["IBM Corp. (United States)","IBM Corporation, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Corp. (United States)","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Corporation, United States","institution_ids":["https://openalex.org/I1341412227"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Masaru Higuchi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210145730","display_name":"Toppan (United States)","ror":"https://ror.org/044xdg011","country_code":"US","type":"company","lineage":["https://openalex.org/I4210110394","https://openalex.org/I4210145730"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Masaru Higuchi","raw_affiliation_strings":["Toppan Electronics Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Toppan Electronics Inc. (United States)","institution_ids":["https://openalex.org/I4210145730"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5034961603","display_name":"Donald J. Samuels","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1341412227","display_name":"IBM (United States)","ror":"https://ror.org/05hh8d621","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Donald Samuels","raw_affiliation_strings":["IBM Corp. (United States)","IBM Corporation, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IBM Corp. (United States)","institution_ids":["https://openalex.org/I1341412227"]},{"raw_affiliation_string":"IBM Corporation, United States","institution_ids":["https://openalex.org/I1341412227"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.10295615,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"6730","issue":null,"first_page":"67302I","last_page":"67302I"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9911999702453613,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9911999702453613,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/mask-error-enhancement-factor","display_name":"mask error enhancement factor","score":0.9679999947547913},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.843999981880188},{"id":"https://openalex.org/keywords/contact-geometry","display_name":"contact geometry","score":0.6830000281333923},{"id":"https://openalex.org/keywords/mask-metrology","display_name":"mask metrology","score":0.8690000176429749},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.9449999928474426},{"id":"https://openalex.org/keywords/corner-rounding","display_name":"corner rounding","score":0.8849999904632568},{"id":"https://openalex.org/keywords/photomask-patterning","display_name":"photomask patterning","score":0.44600000977516174}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8319495916366577},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.5867388248443604},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.578911304473877},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.4890816807746887},{"id":"https://openalex.org/C136625980","wikidata":"https://www.wikidata.org/wiki/Q663208","display_name":"Rounding","level":2,"score":0.4863036572933197},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.45716771483421326},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.44843852519989014},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.4269598722457886},{"id":"https://openalex.org/C204323151","wikidata":"https://www.wikidata.org/wiki/Q905424","display_name":"Range (aeronautics)","level":2,"score":0.42585843801498413},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.41673800349235535},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3837692141532898},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.37622714042663574},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3368510901927948},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.33545440435409546},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.24180957674980164},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.21252235770225525},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.18494883179664612},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.17566826939582825},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.10598710179328918},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.746801","doi":"https://doi.org/10.1117/12.746801","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.746801","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320307762","display_name":"International Business Machines Corporation","ror":"https://ror.org/05hh8d621"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2093900255","https://openalex.org/W1979936113","https://openalex.org/W1572558507","https://openalex.org/W3013775441","https://openalex.org/W1966512888","https://openalex.org/W4250621542","https://openalex.org/W1966014117","https://openalex.org/W1981719225","https://openalex.org/W2094431279","https://openalex.org/W2048363233"],"abstract_inverted_index":{"Optical":[0],"Proximity":[1],"Correction":[2],"(OPC)":[3],"relies":[4],"on":[5,32,64,107,164],"predictive":[6],"modeling":[7],"to":[8,23,38,61,129,161],"achieve":[9],"consistent":[10],"wafer":[11,43,100,173],"results.":[12],"To":[13],"that":[14,92],"end,":[15],"understanding":[16],"all":[17],"sources":[18,41],"of":[19,27,36,42,47,90,104,115,156,172],"variation":[20,106,163],"is":[21,86,109,122,146],"essential":[22],"the":[24,40,65,112,150,169],"successful":[25],"implementation":[26],"OPC.":[28],"This":[29,154],"paper":[30],"focuses":[31],"challenging":[33],"SRAM":[34],"layouts":[35],"contacts":[37],"study":[39,162],"variation.":[44],"A":[45],"range":[46],"shape":[48],"geometries":[49],"and":[50,99,137,167],"contact":[51,152],"configurations":[52],"are":[53,57],"studied.":[54],"Contact":[55],"shapes":[56,74],"no":[58],"longer":[59],"restricted":[60],"simple":[62],"rectangles":[63],"mask,":[66],"some":[67],"more":[68,81],"complex":[69],"OPC":[70],"outputs":[71],"may":[72],"include":[73,130],"like":[75],"H's":[76],"or":[77,79],"T's":[78],"even":[80],"fragmented":[82],"figures.":[83],"The":[84,102,118],"result":[85],"a":[87],"large":[88],"group":[89],"parameters":[91],"can":[93,179],"be":[94,180],"measured":[95],"at":[96],"both":[97],"mask":[98,105,119,141],"level.":[101],"dependence":[103],"geometry":[108],"studied":[110],"through":[111],"statistical":[113],"distributions":[114],"parameter":[116],"variations.":[117],"metrology":[120],"output":[121],"expanded":[123],"from":[124],"traditional":[125],"linear":[126],"dimensional":[127],"measurements":[128],"area,":[131],"line":[132],"edge":[133],"roughness,":[134],"corner":[135],"rounding,":[136],"shape-to-shape":[138],"metrics.":[139],"Wafer":[140],"error":[142],"enhancement":[143],"factor":[144],"(MEEF)":[145],"then":[147],"calculated":[148],"for":[149],"various":[151],"geometries.":[153],"collection":[155],"data":[157],"makes":[158],"it":[159],"possible":[160],"many":[165],"levels":[166],"determine":[168],"underlying":[170],"source":[171],"variations":[174],"so":[175],"that,":[176],"ultimately,":[177],"they":[178],"minimized.":[181]},"counts_by_year":[],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}