{"id":"https://openalex.org/W2016156533","doi":"https://doi.org/10.1116/1.3385672","title":"Effects of AlxGa1\u2212xN interlayer for GaN epilayer grown on Si substrate by metal-organic chemical-vapor deposition","display_name":"Effects of AlxGa1\u2212xN interlayer for GaN epilayer grown on Si substrate by metal-organic chemical-vapor deposition","publication_year":2010,"publication_date":"2010-04-19","ids":{"openalex":"https://openalex.org/W2016156533","doi":"https://doi.org/10.1116/1.3385672","mag":"2016156533"},"language":"en","primary_location":{"id":"doi:10.1116/1.3385672","doi":"https://doi.org/10.1116/1.3385672","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3385672","pdf_url":null,"source":{"id":"https://openalex.org/S4210235835","display_name":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","issn_l":"2166-2746","issn":["2166-2746","2166-2754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109558953","display_name":"Kung Liang Lin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Kung-Liang Lin","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013545831","display_name":"Edward Yi Chang","orcid":"https://orcid.org/0000-0003-1616-5240","observed_orcids":["https://orcid.org/0000-0003-1616-5240","https://orcid.org/0000-0003-3586-2535"]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Edward-Yi Chang","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110194022","display_name":"Yu-Lin Hsiao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yu-Lin Hsiao","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111630431","display_name":"Wei-Ching Huang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Wei-Ching Huang","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035182287","display_name":"Tien\u2010Tung Luong","orcid":"https://orcid.org/0000-0002-8134-3421","observed_orcids":["https://orcid.org/0000-0002-8134-3421"]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Tien-Tung Luong","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112044139","display_name":"Yuen\u2010Yee Wong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yuen-Yee Wong","raw_affiliation_strings":["National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Materials Science and Engineering, , Hsinchu 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018684713","display_name":"Tingkai Li","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Tingkai Li","raw_affiliation_strings":["SHARP Laboratories of America, Inc. , Camas, Washington","Sharp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SHARP Laboratories of America, Inc. , Camas, Washington","institution_ids":[]},{"raw_affiliation_string":"Sharp","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023876426","display_name":"Doug Tweet","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Doug Tweet","raw_affiliation_strings":["SHARP Laboratories of America, Inc. , Camas, Washington","Sharp"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SHARP Laboratories of America, Inc. , Camas, Washington","institution_ids":[]},{"raw_affiliation_string":"Sharp","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110026003","display_name":"Chen-Hao Chiang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148366613","display_name":"National Yang Ming Chiao Tung University","ror":"https://ror.org/00se2k293","country_code":"TW","type":"education","lineage":["https://openalex.org/I148366613"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chen-Hao Chiang","raw_affiliation_strings":["National Chiao Tung University Department of Electrophysics, 300, Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Chiao Tung University Department of Electrophysics, 300, Taiwan","institution_ids":["https://openalex.org/I148366613"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.7087,"has_fulltext":false,"cited_by_count":12,"citation_normalized_percentile":{"value":0.66843841,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"28","issue":"3","first_page":"473","last_page":"477"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":1.0,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":1.0,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/gan-epilayers","display_name":"GaN epilayers","score":0.7070000171661377},{"id":"https://openalex.org/keywords/aln-buffer-layer","display_name":"AlN buffer layer","score":0.8140000104904175},{"id":"https://openalex.org/keywords/silicon-substrate","display_name":"silicon substrate","score":0.5},{"id":"https://openalex.org/keywords/lattice-mismatch-stress","display_name":"lattice mismatch stress","score":0.46399998664855957},{"id":"https://openalex.org/keywords/al-composition","display_name":"Al composition","score":0.550000011920929},{"id":"https://openalex.org/keywords/crack-free-growth","display_name":"crack-free growth","score":0.6819999814033508},{"id":"https://openalex.org/keywords/low-pressure-metalorganic-chemical-vapor-deposition","display_name":"low-pressure metalorganic chemical vapor deposition","score":0.8140000104904175},{"id":"https://openalex.org/keywords/si-111-substrate","display_name":"Si(111) substrate","score":0.6769999861717224},{"id":"https://openalex.org/keywords/strain-relaxation","display_name":"strain relaxation","score":0.3310000002384186},{"id":"https://openalex.org/keywords/reciprocal-space-mapping","display_name":"reciprocal space mapping","score":0.5699999928474426}],"concepts":[{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.8206765651702881},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7305827736854553},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.636784017086029},{"id":"https://openalex.org/C175665537","wikidata":"https://www.wikidata.org/wiki/Q1924991","display_name":"Metalorganic vapour phase epitaxy","level":4,"score":0.6335393190383911},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.6225276589393616},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.5184704661369324},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.47130072116851807},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.4708057641983032},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.453390896320343},{"id":"https://openalex.org/C149849071","wikidata":"https://www.wikidata.org/wiki/Q1263816","display_name":"Chemical composition","level":2,"score":0.4451524019241333},{"id":"https://openalex.org/C50515024","wikidata":"https://www.wikidata.org/wiki/Q826582","display_name":"X-ray crystallography","level":3,"score":0.4436451494693756},{"id":"https://openalex.org/C145018004","wikidata":"https://www.wikidata.org/wiki/Q4985944","display_name":"Buffer (optical fiber)","level":2,"score":0.4403679668903351},{"id":"https://openalex.org/C89957378","wikidata":"https://www.wikidata.org/wiki/Q164129","display_name":"Reciprocal lattice","level":3,"score":0.43704551458358765},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3823319673538208},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.20838871598243713},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.19286677241325378},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1927032470703125},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.18239450454711914},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.16924729943275452},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.3385672","doi":"https://doi.org/10.1116/1.3385672","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.3385672","pdf_url":null,"source":{"id":"https://openalex.org/S4210235835","display_name":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","issn_l":"2166-2746","issn":["2166-2746","2166-2754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321040","display_name":"National Science Council","ror":"https://ror.org/02kv4zf79"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1670938987","https://openalex.org/W1963667882","https://openalex.org/W1978127031","https://openalex.org/W1979662163","https://openalex.org/W1982277883","https://openalex.org/W1986047242","https://openalex.org/W1999014017","https://openalex.org/W2014046589","https://openalex.org/W2014858802","https://openalex.org/W2018007676","https://openalex.org/W2025176982","https://openalex.org/W2032496307","https://openalex.org/W2034532454","https://openalex.org/W2035346756","https://openalex.org/W2072012330","https://openalex.org/W2072562852","https://openalex.org/W2091104642","https://openalex.org/W2092637242","https://openalex.org/W2156450885","https://openalex.org/W4232892344"],"related_works":["https://openalex.org/W2110835902","https://openalex.org/W2092637242","https://openalex.org/W6991570037","https://openalex.org/W2325929585","https://openalex.org/W7065389258","https://openalex.org/W2085475698","https://openalex.org/W1966692729","https://openalex.org/W2147802592","https://openalex.org/W3140013373","https://openalex.org/W2036664031"],"abstract_inverted_index":{"GaN":[0,38,44,64,100],"film":[1,65,101],"grown":[2,66,105],"on":[3,106],"Si":[4,41,109],"substrate":[5,42],"using":[6,69,112],"multilayer":[7,113],"AlN/AlxGa1\u2212xN":[8],"buffer":[9,97,117],"is":[10,84],"studied":[11,68],"by":[12],"the":[13,34,40,49,53,59,63,91,95],"low-pressure":[14],"metal-organic":[15],"chemical-vapor":[16],"deposition":[17],"method.":[18],"The":[19,46],"AlxGa1\u2212xN":[20,54,96,116],"films":[21,55],"with":[22,56,87],"Al":[23,50,92],"composition":[24,51,93],"varying":[25],"from":[26],"1":[27],"to":[28,32,58],"0.66":[29],"were":[30],"used":[31],"accommodate":[33],"stress":[35,60],"induced":[36,61],"between":[37],"and":[39,75,79,115],"during":[43],"growth.":[45],"correlation":[47],"of":[48,90],"in":[52,62,94],"respect":[57],"was":[67],"high-resolution":[70],"x-ray":[71],"diffraction,":[72],"including":[73],"symmetrical":[74],"asymmetrical":[76],"\u03c9/2\u03b8":[77],"scans":[78],"reciprocal":[80],"space":[81],"maps.":[82],"It":[83],"found":[85],"that":[86],"proper":[88],"design":[89],"layer,":[98],"crack-free":[99],"can":[102],"be":[103],"successfully":[104],"6":[107],"in.":[108],"(111)":[110],"substrates":[111],"AlN":[114],"layers.":[118]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":3},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":2}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}