{"id":"https://openalex.org/W2015265132","doi":"https://doi.org/10.1149/1.1391580","title":"Mechanism of Direct Copper Plating on Nonconducting Substrates","display_name":"Mechanism of Direct Copper Plating on Nonconducting Substrates","publication_year":1999,"publication_date":"1999-01-01","ids":{"openalex":"https://openalex.org/W2015265132","doi":"https://doi.org/10.1149/1.1391580","mag":"2015265132"},"language":"en","primary_location":{"id":"doi:10.1149/1.1391580","doi":"https://doi.org/10.1149/1.1391580","is_oa":false,"landing_page_url":"https://doi.org/10.1149/1.1391580","pdf_url":null,"source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101622451","display_name":"Sachiko Ono","orcid":"https://orcid.org/0000-0003-4378-2578","observed_orcids":["https://orcid.org/0000-0003-4378-2578"]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Sachiko Ono","raw_affiliation_strings":["Advanced Research Institute for Science and Engineering, Waseda University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Research Institute for Science and Engineering, Waseda University","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059111452","display_name":"Tetsuya \u014csaka","orcid":"https://orcid.org/0000-0001-8307-132X","observed_orcids":["https://orcid.org/0000-0001-8307-132X"]},"institutions":[{"id":"https://openalex.org/I150744194","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83","country_code":"JP","type":"education","lineage":["https://openalex.org/I150744194"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuya Osaka","raw_affiliation_strings":["Advanced Research Institute for Science and Engineering, Waseda University","Department of Applied Chemistry School of Science and Engineering, Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, Tokyo 169, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Research Institute for Science and Engineering, Waseda University","institution_ids":["https://openalex.org/I150744194"]},{"raw_affiliation_string":"Department of Applied Chemistry School of Science and Engineering, Kagami Memorial Laboratory for Materials Science and Technology, Waseda University, Tokyo 169, Japan","institution_ids":["https://openalex.org/I150744194"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020568900","display_name":"Kazuhisa Naitoh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405265021","display_name":"Okuno Chemical Industries Co., Ltd. (Japan)","ror":"https://ror.org/03mp00c35","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405265021"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuhisa Naitoh","raw_affiliation_strings":["Okuno Chemical Industries Company, Limited, Osaka 538, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Okuno Chemical Industries Company, Limited, Osaka 538, Japan","institution_ids":["https://openalex.org/I4405265021"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5038029832","display_name":"Yutaka Nakagishi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405265021","display_name":"Okuno Chemical Industries Co., Ltd. (Japan)","ror":"https://ror.org/03mp00c35","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405265021"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yutaka Nakagishi","raw_affiliation_strings":["Okuno Chemical Industries Company, Limited, Osaka 538, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Okuno Chemical Industries Company, Limited, Osaka 538, Japan","institution_ids":["https://openalex.org/I4405265021"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":1950,"currency":"USD","value_usd":1950},"apc_paid":null,"fwci":1.8704,"has_fulltext":false,"cited_by_count":20,"citation_normalized_percentile":{"value":0.81193139,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"146","issue":"1","first_page":"160","last_page":"166"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11907","display_name":"Copper-based nanomaterials and applications","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10460","display_name":"Electronic Packaging and Soldering Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/palladium-colloids","display_name":"palladium colloids","score":0.8529999852180481},{"id":"https://openalex.org/keywords/lateral-propagation","display_name":"lateral propagation","score":0.5},{"id":"https://openalex.org/keywords/propagation-speed","display_name":"propagation velocity","score":0.5049999952316284},{"id":"https://openalex.org/keywords/plating-uniformity","display_name":"plating uniformity","score":0.8069999814033508},{"id":"https://openalex.org/keywords/colloidal-clusters","display_name":"colloidal clusters","score":0.4659999907016754}],"concepts":[{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.8740679025650024},{"id":"https://openalex.org/C29216876","wikidata":"https://www.wikidata.org/wiki/Q1769505","display_name":"Copper plating","level":4,"score":0.762441873550415},{"id":"https://openalex.org/C2776985018","wikidata":"https://www.wikidata.org/wiki/Q7202314","display_name":"Plating (geology)","level":2,"score":0.6755980253219604},{"id":"https://openalex.org/C52859227","wikidata":"https://www.wikidata.org/wiki/Q7877","display_name":"Electrochemistry","level":3,"score":0.6444050073623657},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.5223430395126343},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.48880311846733093},{"id":"https://openalex.org/C59789625","wikidata":"https://www.wikidata.org/wiki/Q181780","display_name":"Colloid","level":2,"score":0.48753759264945984},{"id":"https://openalex.org/C179104552","wikidata":"https://www.wikidata.org/wiki/Q11165","display_name":"Inorganic chemistry","level":1,"score":0.46635523438453674},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.4528343677520752},{"id":"https://openalex.org/C150394285","wikidata":"https://www.wikidata.org/wiki/Q180254","display_name":"Adsorption","level":2,"score":0.45090359449386597},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.4300454258918762},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.41419824957847595},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4029194712638855},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.2931275963783264},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.24021509289741516},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2016671597957611},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.18966716527938843},{"id":"https://openalex.org/C51807945","wikidata":"https://www.wikidata.org/wiki/Q3503392","display_name":"Electroplating","level":3,"score":0.12969380617141724},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.11652892827987671},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1149/1.1391580","doi":"https://doi.org/10.1149/1.1391580","is_oa":false,"landing_page_url":"https://doi.org/10.1149/1.1391580","pdf_url":null,"source":{"id":"https://openalex.org/S138759888","display_name":"Journal of The Electrochemical Society","issn_l":"0013-4651","issn":["0013-4651","1945-7111"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of The Electrochemical Society","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322638","display_name":"Waseda University","ror":"https://ror.org/00ntfnx83"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2323684031","https://openalex.org/W2044868227","https://openalex.org/W2329681508","https://openalex.org/W2034767232","https://openalex.org/W2131164028","https://openalex.org/W2167313928","https://openalex.org/W7096471706","https://openalex.org/W2101605960","https://openalex.org/W2169477900","https://openalex.org/W2055519985"],"abstract_inverted_index":{"The":[0,27,84,102,157,177],"mechanism":[1,135],"of":[2,70,95,104,119,122,169,172],"direct":[3,49,123],"copper":[4,42,54,105,139,158,173],"plating":[5],"on":[6,116],"nonconducting":[7],"resin":[8],"substrates":[9,28],"was":[10],"investigated":[11],"by":[12,31,130],"high":[13],"resolution":[14],"transmission":[15],"electron":[16,20],"microscopy":[17,21],"and":[18,23,35,44],"scanning":[19],"observation":[22],"surface":[24],"analysis":[25],"techniques.":[26],"were":[29,61],"catalyzed":[30],"Pd/Sn":[32],"mixed":[33],"catalyst":[34],"accelerated":[36],"in":[37,78,107,136,142,152,165],"an":[38,162],"alkaline":[39],"solution":[40,110,147],"containing":[41,145],"ions":[43,106],"a":[45,112,131,149],"reductant":[46],"before":[47],"the":[48,52,67,108,117,143,154,167,170],"plating.":[50,124,174],"After":[51],"acceleration,":[53],"crystalline":[55],"particles":[56,97,140,159],"measuring":[57,88,98],"approximately":[58,99],"300":[59],"nm":[60,92],"found":[62],"to":[63,80,90],"be":[64,128],"dispersed":[65,138],"at":[66],"population":[68],"density":[69],"1.4":[71],"\u00d7":[72],"10":[73],"11":[74],"m":[75],"\u2212":[76],"2":[77,100],"addition":[79,103],"adsorbed":[81],"palladium":[82],"colloids.":[83],"colloids":[85],"formed":[86,141],"clusters":[87],"20":[89],"50":[91],"which":[93,137],"consist":[94],"individual":[96],"nm.":[101],"acceleration":[109],"exerted":[111],"remarkable":[113],"promotion":[114],"effect":[115,126],"speed":[118],"lateral":[120],"propagation":[121,134,155,171],"This":[125],"can":[127],"explained":[129],"modified":[132],"stepwise":[133],"Cu(II)":[144],"accelerating":[146],"play":[148,161],"critical":[150],"role":[151,164],"determining":[153,166],"speed.":[156],"also":[160],"important":[163],"uniformity":[168],"\u00a9":[175],"1999":[176],"Electrochemical":[178],"Society.":[179],"All":[180],"rights":[181],"reserved.":[182]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}