{"id":"https://openalex.org/W2015215249","doi":"https://doi.org/10.1117/12.534763","title":"High-etch-rate ArF BARC composed of polyester","display_name":"High-etch-rate ArF BARC composed of polyester","publication_year":2004,"publication_date":"2004-05-14","ids":{"openalex":"https://openalex.org/W2015215249","doi":"https://doi.org/10.1117/12.534763","mag":"2015215249"},"language":"en","primary_location":{"id":"doi:10.1117/12.534763","doi":"https://doi.org/10.1117/12.534763","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.534763","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Young Sun Hwang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Young Sun Hwang","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113706033","display_name":"Jae Chang Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jae Chang Jung","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003293746","display_name":"Keun Do Ban","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Keun Do Ban","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077633848","display_name":"Sarohan Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sarohan Park","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090859608","display_name":"Cheol-Kyu Bok","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Cheol Kyu Bok","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109151869","display_name":"Seung Chan Moon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seung Chan Moon","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5074259459","display_name":"Ki-Soo Shin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272917","display_name":"SK Hynix (South Korea)","ror":"https://ror.org/04z2p0w98","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ki Soo Shin","raw_affiliation_strings":["Hynix Semiconductor Inc. (South Korea)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hynix Semiconductor Inc. (South Korea)","institution_ids":["https://openalex.org/I4405272917"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4405272917"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"5376","issue":null,"first_page":"718","last_page":"718"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bottom-anti-reflective-coating","display_name":"bottom anti-reflective coating","score":0.9139999747276306},{"id":"https://openalex.org/keywords/bhabha-atomic-research-centre","display_name":"BARC","score":0.8759999871253967},{"id":"https://openalex.org/keywords/arf-excimer-laser-lithography","display_name":"ArF excimer laser lithography","score":0.7870000004768372},{"id":"https://openalex.org/keywords/polyester-resin","display_name":"polyester resin","score":0.640999972820282},{"id":"https://openalex.org/keywords/polyoxymethylene","display_name":"polyoxymethylene","score":0.9390000104904175},{"id":"https://openalex.org/keywords/polyacrylate","display_name":"polyacrylate","score":1.0},{"id":"https://openalex.org/keywords/pattern-collapse","display_name":"pattern collapse","score":0.8069999814033508},{"id":"https://openalex.org/keywords/resist-thickness","display_name":"resist thickness","score":0.6660000085830688},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.6309999823570251},{"id":"https://openalex.org/keywords/contact-hole-patterning","display_name":"contact hole patterning","score":0.7250000238418579}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8645350933074951},{"id":"https://openalex.org/C119394753","wikidata":"https://www.wikidata.org/wiki/Q188245","display_name":"Polyester","level":2,"score":0.7687594890594482},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7370866537094116},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6851211190223694},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.678766667842865},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6017270088195801},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.5845847725868225},{"id":"https://openalex.org/C6556556","wikidata":"https://www.wikidata.org/wiki/Q899239","display_name":"Contact angle","level":2,"score":0.43136125802993774},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4274398982524872},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3370826840400696}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.534763","doi":"https://doi.org/10.1117/12.534763","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.534763","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2066673152","https://openalex.org/W2048826388","https://openalex.org/W2071859060","https://openalex.org/W2066387452","https://openalex.org/W2891885046","https://openalex.org/W2103025908","https://openalex.org/W2052670771","https://openalex.org/W2005949624","https://openalex.org/W1980267791","https://openalex.org/W2055290028"],"abstract_inverted_index":{"As":[0],"the":[1,5,15,20,36,56,91,107,123,145,157],"pattern":[2,16,67,113],"size":[3],"decreases,":[4],"thickness":[6,63],"of":[7,22,28,41,90,112,126],"resist":[8,64,181],"also":[9,118],"should":[10],"be":[11,32,53,70],"decreased":[12],"owing":[13],"to":[14,35,55],"collapse":[17,37,57,68],"problem.":[18,38],"So":[19],"using":[21],"surfactant":[23],"containing":[24],"rinse":[25],"material,":[26],"instead":[27],"DI":[29],"water,":[30],"can":[31],"a":[33],"solution":[34],"The":[39],"developing":[40],"Bottom":[42],"Anti":[43],"Reflective":[44],"Coating":[45],"(BARC)":[46],"that":[47,130],"has":[48],"high":[49],"etch":[50,138,154],"rate":[51,139],"will":[52,69],"helpful":[54],"issue":[58],"because":[59],"it":[60],"enables":[61],"low":[62],"process":[65],"and":[66,77,101,161,182],"decrease.":[71],"In":[72,110],"this":[73],"paper,":[74],"Polyacetal,":[75],"polyacrylate":[76,100],"polyesters":[78,102],"BARCs":[79,151,167],"were":[80],"evaluated.":[81],"Polyacetal":[82],"type":[83,94,116,173],"BARC":[84,95,117,129,174],"shows":[85,96,119,136],"best":[86,120],"coating":[87,104],"property.":[88],"Regardless":[89],"topology,":[92],"polyacetal":[93,115],"good":[97,169],"conformality.":[98],"However,":[99,143,171],"show":[103,168],"fail":[105],"on":[106],"topology":[108],"wafer.":[109],"terms":[111],"collapse,":[114],"results.":[121],"Among":[122],"three":[124,166],"types":[125],"BARC,":[127],"ArF":[128],"is":[131,148],"made":[132],"by":[133],"polyester":[134,172],"resin":[135],"highest":[137],"after":[140],"2000\u00c5BRAC":[141],"etch.":[142],"when":[144],"etching":[146],"target":[147],"60nm,":[149],"all":[150,164],"have":[152],"same":[153],"rate.":[155],"For":[156],"matching":[158],"with":[159,178],"line":[160],"space":[162],"resist,":[163],"these":[165],"profile.":[170],"does":[175],"not":[176,184],"match":[177],"contact":[179,186],"hole":[180,187],"could":[183],"define":[185],"pattern.":[188]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}