{"id":"https://openalex.org/W2014788652","doi":"https://doi.org/10.2494/photopolymer.21.613","title":"An Update on the Progress in High-n Immersion Lithography","display_name":"An Update on the Progress in High-n Immersion Lithography","publication_year":2008,"publication_date":"2008-01-01","ids":{"openalex":"https://openalex.org/W2014788652","doi":"https://doi.org/10.2494/photopolymer.21.613","mag":"2014788652"},"language":"en","primary_location":{"id":"doi:10.2494/photopolymer.21.613","doi":"https://doi.org/10.2494/photopolymer.21.613","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.613","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/5/21_5_613/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/5/21_5_613/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5108439125","display_name":"Harry Sewell","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Harry Sewell","raw_affiliation_strings":["ASML"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083256172","display_name":"Paul Graeupner","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Paul Graeupner","raw_affiliation_strings":["Zeiss-SMT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Zeiss-SMT","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069003759","display_name":"Diane C. McCafferty","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Diane McCafferty","raw_affiliation_strings":["ASML"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008429034","display_name":"Louis Markoya","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Louis Markoya","raw_affiliation_strings":["ASML"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058633552","display_name":"Nandasiri Samarakone","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Nandasiri Samarakone","raw_affiliation_strings":["ASML, Sunnyvale"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML, Sunnyvale","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5022818806","display_name":"Paul van Wijnen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Paul van Wijnen","raw_affiliation_strings":["ASML, De Run"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML, De Run","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034811116","display_name":"Jan Mulkens","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Jan Mulkens","raw_affiliation_strings":["ASML, De Run"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML, De Run","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5003991994","display_name":"Jos P. H. Benschop","orcid":"https://orcid.org/0000-0002-7992-9992","observed_orcids":["https://orcid.org/0000-0002-7992-9992"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Jos Benschop","raw_affiliation_strings":["ASML, De Run"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML, De Run","institution_ids":["https://openalex.org/I927257375"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8747,"has_fulltext":true,"cited_by_count":5,"citation_normalized_percentile":{"value":0.76046421,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"21","issue":"5","first_page":"613","last_page":"620"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.002400000113993883,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/immersion-fluid","display_name":"immersion fluid","score":0.7429999709129333},{"id":"https://openalex.org/keywords/high-refractive-index","display_name":"high refractive index","score":0.5590000152587891},{"id":"https://openalex.org/keywords/lutetium-aluminum-garnet","display_name":"Lu3Al5O12","score":0.8650000095367432},{"id":"https://openalex.org/keywords/spinel","display_name":"spinel","score":0.984000027179718},{"id":"https://openalex.org/keywords/carbon-contamination","display_name":"carbon contamination","score":0.847000002861023},{"id":"https://openalex.org/keywords/lens-cleaning","display_name":"lens cleaning","score":0.5149999856948853},{"id":"https://openalex.org/keywords/defect-formation","display_name":"defect formation","score":0.7919999957084656},{"id":"https://openalex.org/keywords/double-patterning","display_name":"double patterning","score":0.8119999766349792},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.6389999985694885}],"concepts":[{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.8777236938476562},{"id":"https://openalex.org/C199068039","wikidata":"https://www.wikidata.org/wiki/Q574523","display_name":"Immersion (mathematics)","level":2,"score":0.7167013883590698},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7048117518424988},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.63670414686203},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.5818421840667725},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5439157485961914},{"id":"https://openalex.org/C47378062","wikidata":"https://www.wikidata.org/wiki/Q15726150","display_name":"High-refractive-index polymer","level":3,"score":0.5154331922531128},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.51539146900177},{"id":"https://openalex.org/C177634673","wikidata":"https://www.wikidata.org/wiki/Q904377","display_name":"Oil immersion","level":2,"score":0.5057163238525391},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.4493449628353119},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.4421391785144806},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3007861077785492},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.28306400775909424},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2800522446632385},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.13597160577774048},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2494/photopolymer.21.613","doi":"https://doi.org/10.2494/photopolymer.21.613","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.613","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/5/21_5_613/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2494/photopolymer.21.613","doi":"https://doi.org/10.2494/photopolymer.21.613","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.21.613","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/21/5/21_5_613/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2014788652.pdf","grobid_xml":"https://content.openalex.org/works/W2014788652.grobid-xml"},"referenced_works_count":13,"referenced_works":["https://openalex.org/W1965308141","https://openalex.org/W1971928613","https://openalex.org/W1984532514","https://openalex.org/W1996426988","https://openalex.org/W1996726946","https://openalex.org/W2014199844","https://openalex.org/W2021976088","https://openalex.org/W2044633110","https://openalex.org/W2062811533","https://openalex.org/W2062961319","https://openalex.org/W2091141150","https://openalex.org/W2094073588","https://openalex.org/W3181731351"],"related_works":["https://openalex.org/W2094065343","https://openalex.org/W1966065652","https://openalex.org/W2012210956","https://openalex.org/W1975185927","https://openalex.org/W1976308293","https://openalex.org/W2002068323","https://openalex.org/W2084630988","https://openalex.org/W2535877053","https://openalex.org/W2094860458","https://openalex.org/W2066184715"],"abstract_inverted_index":{"High-n":[0,45,51,229,333],"immersion":[1,206,315,331,334,357],"lithography":[2,358],"has":[3,245,250],"been":[4,28,63,94,152,233,246,251],"under":[5],"development":[6,372],"for":[7,164,217,291,381,393],"the":[8,12,20,35,108,121,127,131,144,157,168,210,218,224,248,289,292,306,313,327,345,365,379,382,387],"past":[9],"three":[10],"years,":[11],"target":[13],"being":[14],"to":[15,19,96,188,260,326,340,364,395],"extend":[16],"Optical":[17],"Lithography":[18],"32nm":[21],"node":[22],"and":[23,49,58,70,81,154,243,344],"beyond.":[24],"Feasibility":[25],"studies":[26,124],"have":[27,62,75,93,151,183,197,232,304],"generating":[29,323],"results":[30,40,117],"on":[31,143,252,308],"all":[32],"aspects":[33],"of":[34,79,88,111,130,140,156,170,203,212,283,311,318,329,373,389],"technology.":[36],"This":[37],"paper":[38],"reports":[39],"obtained":[41],"in":[42,386],"key":[43,162],"areas:":[44],"Immersion":[46,60,301],"Fluid":[47],"performance":[48],"lifetime;":[50],"Final":[52,178],"Lens":[53],"material":[54,181,216,265,286,376],"development;":[55],"Defect":[56],"generation":[57,294,310],"control.High-n":[59],"Fluids":[61],"developed":[64,153],"by":[65],"companies":[66],"such":[67,240],"as":[68,241],"DuPont":[69],"JSR.":[71],"The":[72,123,201,369],"fluids":[73,92],"typically":[74],"a":[76,84,97,137,184,262,267,279],"refractive":[77,172,185],"index":[78,173,186],"1.65":[80],"will":[82,287],"support":[83,189],"system":[85],"numerical":[86],"aperture":[87],">1.55.":[89],"These":[90],"new":[91,355],"engineered":[95],"point":[98],"where":[99],"they":[100],"are":[101,118,257,321],"now":[102,384],"more":[103,338],"transparent":[104],"than":[105,342],"water":[106],"at":[107,133,273],"exposing":[109],"wavelength":[110],"193nm,":[112],"but":[113],"challenges":[114],"remain.":[115],"Test":[116],"reported":[119],"from":[120],"UV":[122,128],"indicate":[125],"that":[126,209,256,269,281,378],"irradiation":[129],"fluid":[132,207,316,335],"high":[134,171,271],"doses":[135],"causes":[136],"build":[138],"up":[139],"carbonaceous":[141],"contamination":[142],"final":[145,174,219,263],"lens":[146,175,179,220],"element":[147,176,180,221],"surface.":[148],"Cleaning":[149],"procedures":[150],"calculations":[155],"expected":[158],"cleaning":[159],"schedule":[160],"made.,br>A":[161],"requirement":[163],"this":[165,300],"technology":[166,226,383],"is":[167,223,270,295,336],"availability":[169,202,282],"material.":[177],"must":[182,195,352],">1.70":[187],"optics":[190],"design":[191],"with":[192,238,266,299,362],">1.55NA;":[193],"it":[194],"also":[196],"sufficient":[198],"optical":[199,213,264,284,375],"transparency.":[200],"viable":[204],"high-n":[205,215,314,330,356,374],"means":[208],"supply":[211],"grade":[214,285],"fabrication":[222],"potential":[225,380],"show":[227],"stopper.":[228],"materials":[230,239,255],"(>1.9)":[231],"identified.":[234],"Initial":[235],"technical":[236],"progress":[237],"LuAG":[242],"Spinel":[244],"encouraging;":[247],"focus":[249],"obtaining":[253],"starting":[254],"pure":[258],"enough":[259,272],"ensure":[261],"transparency":[268],"193nm":[274],"wavelength.":[275],"There":[276,320],"is,":[277],"though,":[278],"risk":[280],"miss":[288],"window":[290],"technology.Defect":[293],"another":[296],"major":[297],"concern":[298],"Lithography.":[302],"We":[303],"studied":[305],"effect":[307],"defect":[309,322],"using":[312],"instead":[317],"water.":[319],"mechanisms":[324],"specific":[325],"use":[328],"fluid.":[332],"much":[337],"difficult":[339],"purify":[341],"water,":[343],"purification":[346],"process":[347],"can":[348,359],"generate":[349],"particles":[350],"which":[351],"be":[353,360],"removed.The":[354],"assessed":[361],"regard":[363],"Semiconductor":[366],"Industry":[367],"roadmap.":[368],"relatively":[370],"slow":[371],"implies":[377],"lies":[385],"context":[388],"Double":[390],"Pattern":[391],"Processing":[392],"application":[394],"sub-32nm":[396],"nodes.":[397]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2014,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}