{"id":"https://openalex.org/W2014779264","doi":"https://doi.org/10.1143/jjap.27.l652","title":"Reversible Resistivity Control of Ba2YCu3O7-\u03b4 Thin Films by Laser Annealing","display_name":"Reversible Resistivity Control of Ba2YCu3O7-\u03b4 Thin Films by Laser Annealing","publication_year":1988,"publication_date":"1988-04-01","ids":{"openalex":"https://openalex.org/W2014779264","doi":"https://doi.org/10.1143/jjap.27.l652","mag":"2014779264"},"language":"en","primary_location":{"id":"doi:10.1143/jjap.27.l652","doi":"https://doi.org/10.1143/jjap.27.l652","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.27.l652","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.27.L652/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1143/JJAP.27.L652/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111704261","display_name":"Hideomi Koinuma","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hideomi Koinuma","raw_affiliation_strings":["The Research Laboratory of Engineering Materials, Tokyo Institute of Technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Research Laboratory of Engineering Materials, Tokyo Institute of Technology","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112066419","display_name":"Yasuhiko Takemura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125918","display_name":"Semiconductor Energy Laboratory (Japan)","ror":"https://ror.org/02vszc135","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210125918"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yasuhiko Takemura","raw_affiliation_strings":["The Semiconductor Energy Laboratory"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Semiconductor Energy Laboratory","institution_ids":["https://openalex.org/I4210125918"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055091280","display_name":"Takuya Hishimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takuya Hishimoto","raw_affiliation_strings":["Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113632002","display_name":"Kou Takeuchi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kou Takeuchi","raw_affiliation_strings":["Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111367615","display_name":"Kazuo Fueki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuo Fueki","raw_affiliation_strings":["Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Department of Industrial Chemistry, University of Tokyo","institution_ids":["https://openalex.org/I74801974"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":1.3734,"has_fulltext":true,"cited_by_count":15,"citation_normalized_percentile":{"value":0.82715726,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"27","issue":"4A","first_page":"L652","last_page":"L652"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10037","display_name":"Physics of Superconductivity and Magnetism","score":0.8521000146865845,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10037","display_name":"Physics of Superconductivity and Magnetism","score":0.8521000146865845,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.06379999965429306,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.030899999663233757,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ba2ycu3o7-delta","display_name":"Ba2YCu3O7-\u03b4","score":0.972000002861023},{"id":"https://openalex.org/keywords/high-temperature-superconducting-films","display_name":"high-temperature superconducting thin films","score":0.8659999966621399},{"id":"https://openalex.org/keywords/laser-annealing","display_name":"laser annealing","score":0.9909999966621399},{"id":"https://openalex.org/keywords/resistivity-control","display_name":"resistivity control","score":0.7369999885559082},{"id":"https://openalex.org/keywords/amorphization","display_name":"amorphization","score":0.972000002861023},{"id":"https://openalex.org/keywords/rapid-quenching","display_name":"rapid quenching","score":0.6460000276565552},{"id":"https://openalex.org/keywords/mask-free-patterning","display_name":"mask-free patterning","score":0.703000009059906},{"id":"https://openalex.org/keywords/nd-yag-laser","display_name":"Nd:YAG laser","score":0.9430000185966492}],"concepts":[{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7814491987228394},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7584408521652222},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.7299168109893799},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.7211110591888428},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.700903594493866},{"id":"https://openalex.org/C54101563","wikidata":"https://www.wikidata.org/wiki/Q124131","display_name":"Superconductivity","level":2,"score":0.6225682497024536},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6212900876998901},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5902077555656433},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.5277248620986938},{"id":"https://openalex.org/C200649887","wikidata":"https://www.wikidata.org/wiki/Q17154544","display_name":"Laser power scaling","level":3,"score":0.43158817291259766},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.42082226276397705},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36129850149154663},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3336940407752991},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2492741048336029},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.22193211317062378},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.22061142325401306},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.18540602922439575},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.17374387383460999},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1457633674144745},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.14269641041755676},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1143/jjap.27.l652","doi":"https://doi.org/10.1143/jjap.27.l652","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.27.l652","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.27.L652/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},{"id":"mag:2985778117","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/130003468212","pdf_url":null,"source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":null}],"best_oa_location":{"id":"doi:10.1143/jjap.27.l652","doi":"https://doi.org/10.1143/jjap.27.l652","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.27.l652","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.27.L652/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2014779264.pdf","grobid_xml":"https://content.openalex.org/works/W2014779264.grobid-xml"},"referenced_works_count":7,"referenced_works":["https://openalex.org/W1510486551","https://openalex.org/W1970922993","https://openalex.org/W1973103100","https://openalex.org/W2012124647","https://openalex.org/W2020318405","https://openalex.org/W2044987424","https://openalex.org/W2085744850"],"related_works":["https://openalex.org/W1989718846","https://openalex.org/W2012621917","https://openalex.org/W2053147445","https://openalex.org/W1992940824","https://openalex.org/W1988658969","https://openalex.org/W2030861075","https://openalex.org/W2034167079","https://openalex.org/W2220662172","https://openalex.org/W2046716655","https://openalex.org/W1644904050"],"abstract_inverted_index":{"Laser":[0],"annealing":[1,63],"of":[2,48,56,77],"superconducting":[3,27,78],"Ba2YCu3O7-\u03b4":[4],"(BYCO)":[5],"thin":[6],"films":[7,29,79],"has":[8],"been":[9],"investigated":[10],"by":[11,44,62],"using":[12],"a":[13,45,68],"Nd:YAG":[14],"cw":[15],"laser.":[16],"By":[17],"laser":[18,52,73],"irradiation":[19,74],"at":[20],"power":[21],"densities":[22],"higher":[23],"than":[24],"1.4\u00d7105":[25],"W/cm2,":[26],"polycrystalline":[28],"became":[30],"amorphous":[31],"and":[32],"showed":[33],"semiconductor-like":[34],"temperature":[35],"dependence":[36],"on":[37],"resistivity.":[38],"The":[39,54],"amorphization":[40],"is":[41],"apparently":[42],"caused":[43],"rapid":[46],"quenching":[47],"molten":[49],"BYCO":[50],"after":[51],"irradiation.":[53],"superconductivity":[55],"the":[57,64],"film":[58,66],"could":[59],"be":[60,81],"recovered":[61],"laser-irradiated":[65],"in":[67],"furnace.":[69],"With":[70],"this":[71],"mask-free":[72],"process,":[75],"patterning":[76],"can":[80],"achieved.":[82]},"counts_by_year":[],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}