{"id":"https://openalex.org/W2013883410","doi":"https://doi.org/10.1109/tim.2014.2383091","title":"Homogeneity Characterization of Lattice Spacing of Silicon Single Crystals","display_name":"Homogeneity Characterization of Lattice Spacing of Silicon Single Crystals","publication_year":2015,"publication_date":"2015-01-07","ids":{"openalex":"https://openalex.org/W2013883410","doi":"https://doi.org/10.1109/tim.2014.2383091","mag":"2013883410"},"language":"en","primary_location":{"id":"doi:10.1109/tim.2014.2383091","doi":"https://doi.org/10.1109/tim.2014.2383091","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2014.2383091","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-3","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5079402691","display_name":"Atsushi Waseda","orcid":"https://orcid.org/0000-0002-3594-5704","observed_orcids":["https://orcid.org/0000-0002-3594-5704"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Atsushi Waseda","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Hiroyuki Fujimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroyuki Fujimoto","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111388795","display_name":"Xiao Wei Zhang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I138728355","display_name":"High Energy Accelerator Research Organization","ror":"https://ror.org/01g5y5k24","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1319490839","https://openalex.org/I138728355"]},{"id":"https://openalex.org/I4405285726","display_name":"Photon Factory","ror":"https://ror.org/001xg8t51","country_code":"JP","type":"facility","lineage":["https://openalex.org/I1319490839","https://openalex.org/I138728355","https://openalex.org/I4389425390","https://openalex.org/I4405285726"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Xiao Wei Zhang","raw_affiliation_strings":["Photon Factory, High Energy Accelerator Research Organization, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Photon Factory, High Energy Accelerator Research Organization, Tsukuba, Japan","institution_ids":["https://openalex.org/I138728355","https://openalex.org/I4405285726"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007242339","display_name":"Naoki Kuramoto","orcid":"https://orcid.org/0000-0002-4375-5214","observed_orcids":["https://orcid.org/0000-0002-4375-5214"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Naoki Kuramoto","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101954354","display_name":"Kenichi Fujii","orcid":"https://orcid.org/0000-0002-5578-0038","observed_orcids":["https://orcid.org/0000-0002-5578-0038"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kenichi Fujii","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2645,"currency":"USD","value_usd":2645},"apc_paid":null,"fwci":2.4282,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.90297272,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"64","issue":"6","first_page":"1692","last_page":"1695"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.8154000043869019,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},"topics":[{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.8154000043869019,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.07100000232458115,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12613","display_name":"X-ray Diffraction in Crystallography","score":0.054499998688697815,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/single-crystal-silicon","display_name":"monocrystalline silicon","score":0.9559999704360962},{"id":"https://openalex.org/keywords/silicon-ingots","display_name":"silicon ingots","score":0.5450000166893005},{"id":"https://openalex.org/keywords/carbon-impurity","display_name":"carbon impurities","score":0.7580000162124634},{"id":"https://openalex.org/keywords/oxygen-impurities","display_name":"oxygen impurities","score":0.996999979019165},{"id":"https://openalex.org/keywords/strain-measurement","display_name":"strain measurement","score":0.699999988079071}],"concepts":[{"id":"https://openalex.org/C140848746","wikidata":"https://www.wikidata.org/wiki/Q6203","display_name":"Avogadro constant","level":2,"score":0.9659165740013123},{"id":"https://openalex.org/C142259097","wikidata":"https://www.wikidata.org/wiki/Q5891314","display_name":"Homogeneity (statistics)","level":2,"score":0.8472068905830383},{"id":"https://openalex.org/C2778547858","wikidata":"https://www.wikidata.org/wiki/Q83893","display_name":"Ingot","level":3,"score":0.8119966387748718},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.7406530976295471},{"id":"https://openalex.org/C132612359","wikidata":"https://www.wikidata.org/wiki/Q625641","display_name":"Lattice constant","level":3,"score":0.6497361660003662},{"id":"https://openalex.org/C2781204021","wikidata":"https://www.wikidata.org/wiki/Q6497091","display_name":"Lattice (music)","level":2,"score":0.6355224847793579},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6226818561553955},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.5605162382125854},{"id":"https://openalex.org/C66882249","wikidata":"https://www.wikidata.org/wiki/Q169336","display_name":"Homogeneous","level":2,"score":0.5388559699058533},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.37793880701065063},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3674493730068207},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.32704275846481323},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.18702593445777893},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.15892332792282104},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.15518930554389954},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.1266745626926422},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.12002098560333252},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.10207369923591614},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.09926098585128784},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.08160921931266785},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C2780026712","wikidata":"https://www.wikidata.org/wiki/Q37756","display_name":"Alloy","level":2,"score":0.0},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1109/tim.2014.2383091","doi":"https://doi.org/10.1109/tim.2014.2383091","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tim.2014.2383091","pdf_url":null,"source":{"id":"https://openalex.org/S10892749","display_name":"IEEE Transactions on Instrumentation and Measurement","issn_l":"0018-9456","issn":["0018-9456","1557-9662"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-3","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal-article"},{"id":"pmh:oai:irdb.nii.ac.jp:07567:0007354093","doi":null,"is_oa":false,"landing_page_url":"https://kek.repo.nii.ac.jp/records/2047550","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Proc. CPEM","raw_type":"conference paper"},{"id":"pmh:oai:irdb.nii.ac.jp:07567:0007355756","doi":null,"is_oa":false,"landing_page_url":"https://kek.repo.nii.ac.jp/records/2049213","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"IEEE Transactions on Instrumentation and Measurement","raw_type":"journal article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G4503191811","display_name":"Development of a two-dimensional dark fringe method to measure sphere diameters and an accurate determination of the Avogadro constant by using a 28Si crystal","funder_award_id":"24360037","funder_id":"https://openalex.org/F4320334764","funder_display_name":"Japan Society for the Promotion of Science"}],"funders":[{"id":"https://openalex.org/F4320334764","display_name":"Japan Society for the Promotion of Science","ror":"https://ror.org/00hhkn466"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1981878833","https://openalex.org/W2031055066","https://openalex.org/W2052461464","https://openalex.org/W2152531397","https://openalex.org/W3090224131","https://openalex.org/W4234867332"],"related_works":["https://openalex.org/W2324443811","https://openalex.org/W2575726355","https://openalex.org/W2000394791","https://openalex.org/W2031283275","https://openalex.org/W3010580370","https://openalex.org/W4244366116","https://openalex.org/W3010099414","https://openalex.org/W2520514276","https://openalex.org/W4231423124","https://openalex.org/W1891037366"],"abstract_inverted_index":{"The":[0,53,65],"homogeneity":[1],"of":[2,6,49,57,77],"the":[3,33,46,50,72],"lattice":[4,15,54,66],"spacing":[5,55,67],"silicon":[7],"single":[8,22],"crystals":[9,23],"was":[10,29,39,61,69],"investigated":[11],"by":[12],"a":[13],"self-referenced":[14],"comparator.":[16],"Strain":[17],"measurements":[18],"were":[19],"performed":[20],"on":[21],"from":[24,45],"an28Si":[25],"ingot":[26],"(Avo28),":[27],"which":[28],"used":[30],"to":[31],"determine":[32],"Avogadro":[34],"constant.":[35],"A":[36],"swirl":[37],"pattern":[38],"observed":[40],"for":[41,71],"sample":[42,59,73],"9.R1":[43],"cut":[44],"tail":[47],"side":[48],"Avo28":[51],"ingot.":[52],"distribution":[56,68],"seed-side":[58],"4.R1":[60],"smooth":[62],"and":[63,79],"homogeneous.":[64],"larger":[70],"with":[74],"higher":[75],"impurities":[76],"carbon":[78],"oxygen.":[80]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}