{"id":"https://openalex.org/W2013854300","doi":"https://doi.org/10.1016/j.tsf.2005.08.092","title":"Bonding characteristics of Si and Ge incorporated amorphous carbon (a-C) films grown by magnetron sputtering","display_name":"Bonding characteristics of Si and Ge incorporated amorphous carbon (a-C) films grown by magnetron sputtering","publication_year":2005,"publication_date":"2005-09-15","ids":{"openalex":"https://openalex.org/W2013854300","doi":"https://doi.org/10.1016/j.tsf.2005.08.092","mag":"2013854300"},"language":"en","primary_location":{"id":"doi:10.1016/j.tsf.2005.08.092","doi":"https://doi.org/10.1016/j.tsf.2005.08.092","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2005.08.092","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110041022","display_name":"Hae-Suk Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hae-Suk Jung","raw_affiliation_strings":["Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100630945","display_name":"Hyung\u2010Ho Park","orcid":"https://orcid.org/0000-0001-5540-5433","observed_orcids":["https://orcid.org/0000-0001-5540-5433"]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyung-Ho Park","raw_affiliation_strings":["Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111641920","display_name":"Sang-Bae Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang-Bae Jung","raw_affiliation_strings":["Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Ceramic Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113492299","display_name":"Hong Koo Baik","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hong Koo Baik","raw_affiliation_strings":["Department of Metallurgical Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Metallurgical Engineering, Yonsei University, 134 Sinchon-dong, Seodaemoon-ku, Seoul, 120-749, South Korea","institution_ids":["https://openalex.org/I193775966"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I193775966"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.15622594,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":93},"biblio":{"volume":"506-507","issue":null,"first_page":"77","last_page":"81"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9599999785423279,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9599999785423279,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.025100000202655792,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11733","display_name":"X-ray Spectroscopy and Fluorescence Analysis","score":0.001500000013038516,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/amorphous-carbon-films","display_name":"amorphous carbon films","score":0.8999999761581421},{"id":"https://openalex.org/keywords/silicon-incorporation","display_name":"silicon incorporation","score":0.7860000133514404},{"id":"https://openalex.org/keywords/germanium-incorporation","display_name":"germanium incorporation","score":1.0},{"id":"https://openalex.org/keywords/sp3-hybridization","display_name":"sp3 hybridization","score":0.7839999794960022},{"id":"https://openalex.org/keywords/si-c-bonds","display_name":"Si-C bonds","score":0.7409999966621399},{"id":"https://openalex.org/keywords/uv-raman-spectroscopy","display_name":"UV Raman spectroscopy","score":0.8759999871253967},{"id":"https://openalex.org/keywords/structural-evolution","display_name":"structural evolution","score":0.7459999918937683},{"id":"https://openalex.org/keywords/magnetron-sputtering","display_name":"magnetron sputtering","score":0.7990000247955322}],"concepts":[{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.6187586188316345},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6079705357551575},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5805225372314453},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5488711595535278},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.44957104325294495},{"id":"https://openalex.org/C140205800","wikidata":"https://www.wikidata.org/wiki/Q5860","display_name":"Carbon fibers","level":3,"score":0.43991559743881226},{"id":"https://openalex.org/C201931942","wikidata":"https://www.wikidata.org/wiki/Q798012","display_name":"Amorphous carbon","level":3,"score":0.436921626329422},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.43600401282310486},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.4166228175163269},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.37609732151031494},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2822108864784241},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2624000906944275},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.2163935899734497},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.13663077354431152},{"id":"https://openalex.org/C104779481","wikidata":"https://www.wikidata.org/wiki/Q50707","display_name":"Composite number","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.tsf.2005.08.092","doi":"https://doi.org/10.1016/j.tsf.2005.08.092","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.tsf.2005.08.092","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320298","display_name":"University of Leeds","ror":"https://ror.org/024mrxd33"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1981050036","https://openalex.org/W1986669188","https://openalex.org/W1988763103","https://openalex.org/W1999026374","https://openalex.org/W1999650666","https://openalex.org/W2006930423","https://openalex.org/W2011608908","https://openalex.org/W2014491613","https://openalex.org/W2031918282","https://openalex.org/W2041634992","https://openalex.org/W2050105678","https://openalex.org/W2053690304","https://openalex.org/W2066789886","https://openalex.org/W2066851402","https://openalex.org/W2077195269","https://openalex.org/W4211184409"],"related_works":["https://openalex.org/W2012359081","https://openalex.org/W2108174585","https://openalex.org/W2021329404","https://openalex.org/W1981050036","https://openalex.org/W2131047963","https://openalex.org/W7098057877","https://openalex.org/W2996885049","https://openalex.org/W2140707201","https://openalex.org/W2052270901","https://openalex.org/W1971564271"],"abstract_inverted_index":null,"counts_by_year":[{"year":2017,"cited_by_count":1}],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}