{"id":"https://openalex.org/W2013664586","doi":"https://doi.org/10.1117/12.240988","title":"Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range","display_name":"Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range","publication_year":1996,"publication_date":"1996-06-07","ids":{"openalex":"https://openalex.org/W2013664586","doi":"https://doi.org/10.1117/12.240988","mag":"2013664586"},"language":"en","primary_location":{"id":"doi:10.1117/12.240988","doi":"https://doi.org/10.1117/12.240988","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.240988","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5017931605","display_name":"Pierre M. Boher","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Pierre Boher","raw_affiliation_strings":["SOPRA SA (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SOPRA SA (France)","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109986702","display_name":"Jean-Philippe Piel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Jean-Philippe Piel","raw_affiliation_strings":["SOPRA SA (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SOPRA SA (France)","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113545462","display_name":"Christophe Defranoux","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Christophe Defranoux","raw_affiliation_strings":["SOPRA SA (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SOPRA SA (France)","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110144627","display_name":"Jean-Louis P. Stehle","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Jean-Louis P. Stehle","raw_affiliation_strings":["SOPRA SA (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SOPRA SA (France)","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5039126517","display_name":"Louis Hennet","orcid":"https://orcid.org/0000-0002-2992-4800","observed_orcids":["https://orcid.org/0000-0002-2992-4800"]},"institutions":[{"id":"https://openalex.org/I4405264217","display_name":"Universit\u00e9 Henri Poincar\u00e9","ror":"https://ror.org/019wrwh65","country_code":"FR","type":"education","lineage":["https://openalex.org/I4405264217","https://openalex.org/I90183372"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Louis Hennet","raw_affiliation_strings":["Univ. Henri Poincare (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. Henri Poincare (France)","institution_ids":["https://openalex.org/I4405264217"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":10.3331,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.98243181,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":null,"biblio":{"volume":"2726","issue":null,"first_page":"608","last_page":"620"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.8485999703407288,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.8485999703407288,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.08139999955892563,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.04569999873638153,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/antireflection-coatings","display_name":"antireflection coatings","score":0.9940000176429749},{"id":"https://openalex.org/keywords/photoresist","display_name":"photoresist","score":0.9179999828338623},{"id":"https://openalex.org/keywords/spectroscopic-ellipsometry","display_name":"spectroscopic ellipsometry","score":0.9679999947547913},{"id":"https://openalex.org/keywords/deep-ultraviolet","display_name":"deep ultraviolet","score":0.5910000205039978},{"id":"https://openalex.org/keywords/uv-lithography","display_name":"UV lithography","score":0.4690000116825104},{"id":"https://openalex.org/keywords/193-nm","display_name":"193 nm","score":0.7990000247955322},{"id":"https://openalex.org/keywords/thin-film-thickness","display_name":"thin film thickness","score":0.6420000195503235},{"id":"https://openalex.org/keywords/three-layer-structure","display_name":"three-layer structure","score":0.7699999809265137},{"id":"https://openalex.org/keywords/reflectance-simulation","display_name":"reflectance simulation","score":0.9300000071525574}],"concepts":[{"id":"https://openalex.org/C108406538","wikidata":"https://www.wikidata.org/wiki/Q583040","display_name":"Anti-reflective coating","level":3,"score":0.9340860843658447},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8790538311004639},{"id":"https://openalex.org/C18293161","wikidata":"https://www.wikidata.org/wiki/Q898774","display_name":"Ellipsometry","level":3,"score":0.7078427076339722},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6464985609054565},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.6422484517097473},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5607640743255615},{"id":"https://openalex.org/C65682993","wikidata":"https://www.wikidata.org/wiki/Q1056451","display_name":"Reflection (computer programming)","level":2,"score":0.5495700240135193},{"id":"https://openalex.org/C83415579","wikidata":"https://www.wikidata.org/wiki/Q161973","display_name":"Arc (geometry)","level":2,"score":0.546390950679779},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.4804089367389679},{"id":"https://openalex.org/C177562468","wikidata":"https://www.wikidata.org/wiki/Q182893","display_name":"Dispersion (optics)","level":2,"score":0.4362823963165283},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4179348349571228},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.3918892443180084},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.19734275341033936},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1613626778125763},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.156112402677536},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.1376500129699707},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.13329944014549255},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.06891769170761108},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1117/12.240988","doi":"https://doi.org/10.1117/12.240988","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.240988","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},{"id":"pmh:oai:HAL:hal-02540731v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-02540731","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"SPIE's 1996 International Symposium on Microlithography, Mar 1996, Santa Clara, United States. pp.608-620, ⟨10.1117/12.240988⟩","raw_type":"info:eu-repo/semantics/conferenceObject"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2079587880","https://openalex.org/W1988724105","https://openalex.org/W2064081842","https://openalex.org/W2090658263","https://openalex.org/W2128479623","https://openalex.org/W2076158073","https://openalex.org/W2022417789","https://openalex.org/W30275287","https://openalex.org/W2078497534","https://openalex.org/W2545173773"],"abstract_inverted_index":{"Antireflective":[0],"coatings":[1],"and":[2,14,48,117,153],"resists":[3],"are":[4,61,135,146],"characterized":[5],"precisely":[6],"by":[7,58],"spectroscopic":[8],"ellipsometry":[9],"from":[10],"800nm":[11],"to":[12,29,63],"UV":[13,16],"deep":[15],"193nm.":[17],"A":[18],"procedure":[19,60,79],"based":[20],"on":[21,50,74],"the":[22,33,37,40,75,93,102,106,124,131,138,149,154],"use":[23],"of":[24,36,105,130],"a":[25,112,115,118],"polynomial":[26],"dispersion":[27],"law":[28],"take":[30],"into":[31],"account":[32],"optical":[34,94],"indexes":[35,95],"ARC":[38,120],"in":[39,65,100,123],"region":[41],"where":[42],"it":[43],"is":[44,46,80,121],"transparent":[45],"developed":[47],"tested":[49],"samples":[51],"with":[52,68],"different":[53,139],"thicknesses.":[54],"The":[55,78,127,142],"values":[56],"obtained":[57],"this":[59,91],"shown":[62],"be":[64,97],"perfect":[66],"agreement":[67],"grazing":[69],"x-ray":[70],"reflection":[71],"measurements":[72],"made":[73],"same":[76,125,150,155],"samples.":[77],"valid":[81],"even":[82],"for":[83],"very":[84],"thin":[85],"ARC.":[86],"We":[87],"show":[88],"that":[89],"using":[90,148],"thickness,":[92],"can":[96],"extracted":[98],"directly":[99],"all":[101],"wavelength":[103],"range":[104],"SE":[107],"measurements.":[108],"Practical":[109],"example":[110],"including":[111],"top":[113],"ARC,":[114],"resist":[116],"bottom":[119],"analyzed":[122],"way.":[126],"physical":[128,151],"parameters":[129],"entire":[132],"trilayer":[133],"structure":[134],"deduced":[136],"at":[137],"working":[140],"wavelengths.":[141],"expected":[143],"reflectance":[144],"performance":[145],"simulated":[147],"model":[152],"software.":[156]},"counts_by_year":[],"updated_date":"2026-10-25T09:29:13.331239","created_date":"2016-06-24T00:00:00"}