{"id":"https://openalex.org/W2013629918","doi":"https://doi.org/10.1117/12.25713","title":"Systems-oriented survey of noncontact temperature measurement techniques for rapid thermal processing","display_name":"Systems-oriented survey of noncontact temperature measurement techniques for rapid thermal processing","publication_year":1991,"publication_date":"1991-04-01","ids":{"openalex":"https://openalex.org/W2013629918","doi":"https://doi.org/10.1117/12.25713","mag":"2013629918"},"language":"en","primary_location":{"id":"doi:10.1117/12.25713","doi":"https://doi.org/10.1117/12.25713","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.25713","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"David Peyton","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"David Peyton","raw_affiliation_strings":["Univ. of Texas/Austin (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Texas/Austin (United States)","institution_ids":["https://openalex.org/I86519309"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090368577","display_name":"Hiroyuki Kinoshita","orcid":"https://orcid.org/0000-0002-2221-7871","observed_orcids":["https://orcid.org/0000-0002-2221-7871","https://orcid.org/0009-0009-5510-7458"]},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hiroyuki Kinoshita","raw_affiliation_strings":["Univ. of Texas/Austin (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Texas/Austin (United States)","institution_ids":["https://openalex.org/I86519309"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069967616","display_name":"G. Q. Lo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"G. Q. Lo","raw_affiliation_strings":["Univ. of Texas/Austin (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Texas/Austin (United States)","institution_ids":["https://openalex.org/I86519309"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5107430060","display_name":"Dim\u2010Lee Kwong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I86519309","display_name":"The University of Texas at Austin","ror":"https://ror.org/00hj54h04","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Dim-Lee Kwong","raw_affiliation_strings":["Univ. of Texas/Austin (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. of Texas/Austin (United States)","institution_ids":["https://openalex.org/I86519309"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I86519309"],"apc_list":null,"apc_paid":null,"fwci":7.0133,"has_fulltext":false,"cited_by_count":15,"citation_normalized_percentile":{"value":0.97062212,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":null,"biblio":{"volume":"1393","issue":null,"first_page":"295","last_page":"308"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12019","display_name":"Calibration and Measurement Techniques","score":0.7993000149726868,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12019","display_name":"Calibration and Measurement Techniques","score":0.7993000149726868,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11856","display_name":"Thermography and Photoacoustic Techniques","score":0.10080000013113022,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13928","display_name":"Advanced Sensor Technologies Research","score":0.06800000369548798,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/rapid-thermal-processing","display_name":"rapid thermal processing","score":0.9480000138282776},{"id":"https://openalex.org/keywords/non-contact-temperature-measurement","display_name":"non-contact temperature measurement","score":0.8679999709129333},{"id":"https://openalex.org/keywords/wafer-temperature-control","display_name":"wafer temperature control","score":0.8679999709129333},{"id":"https://openalex.org/keywords/optical-pyrometry","display_name":"optical pyrometry","score":0.9369999766349792},{"id":"https://openalex.org/keywords/ulsi-manufacturing","display_name":"ULSI manufacturing","score":0.781000018119812},{"id":"https://openalex.org/keywords/chemical-vapor-deposition","display_name":"chemical vapor deposition","score":0.6570000052452087},{"id":"https://openalex.org/keywords/closed-loop-temperature-control","display_name":"closed-loop temperature control","score":0.6259999871253967},{"id":"https://openalex.org/keywords/response-time-sensor","display_name":"response time (sensor)","score":0.3959999978542328}],"concepts":[{"id":"https://openalex.org/C32993116","wikidata":"https://www.wikidata.org/wiki/Q903715","display_name":"Pyrometer","level":3,"score":0.8526608943939209},{"id":"https://openalex.org/C72832162","wikidata":"https://www.wikidata.org/wiki/Q2131545","display_name":"Rapid thermal processing","level":3,"score":0.7815649509429932},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6522200107574463},{"id":"https://openalex.org/C168068576","wikidata":"https://www.wikidata.org/wiki/Q190241","display_name":"Thermocouple","level":2,"score":0.6188175678253174},{"id":"https://openalex.org/C72293138","wikidata":"https://www.wikidata.org/wiki/Q909741","display_name":"Temperature measurement","level":2,"score":0.6043179631233215},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.5930169820785522},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.528938353061676},{"id":"https://openalex.org/C536315585","wikidata":"https://www.wikidata.org/wiki/Q7698332","display_name":"Temperature control","level":2,"score":0.525217592716217},{"id":"https://openalex.org/C163651212","wikidata":"https://www.wikidata.org/wiki/Q899670","display_name":"Emissivity","level":2,"score":0.4495401382446289},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.41166695952415466},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.39579448103904724},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3777323067188263},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3737608790397644},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.3662091791629791},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3534203767776489},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.3145391345024109},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.18848800659179688},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.10593155026435852},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.25713","doi":"https://doi.org/10.1117/12.25713","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.25713","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1857364227","https://openalex.org/W1984921619","https://openalex.org/W1993460860","https://openalex.org/W2056722718","https://openalex.org/W2071624897","https://openalex.org/W2129509986","https://openalex.org/W2151071609","https://openalex.org/W2179697185","https://openalex.org/W2992268183"],"related_works":["https://openalex.org/W1971906994","https://openalex.org/W2022711608","https://openalex.org/W2064249409","https://openalex.org/W2316272916","https://openalex.org/W2092742199","https://openalex.org/W2142226094","https://openalex.org/W2136338901","https://openalex.org/W2169188605","https://openalex.org/W2096353027","https://openalex.org/W2003818353"],"abstract_inverted_index":{"Rapid":[0],"Thermal":[1],"Processing":[2],"(RTP)":[3],"is":[4,26,62,210],"becoming":[5],"a":[6,105,162,179,187],"popular":[7],"approach":[8,189,209],"for":[9,65,77,96,118,158,193],"future":[10],"ULSI":[11],"manufacturing":[12,219],"due":[13],"to":[14,41,73,81],"its":[15,215],"unique":[16],"low":[17],"thermal":[18],"budget":[19],"and":[20,49,80,84,137,170,186,205],"process":[21,78],"flexibility.":[22],"Furthermore":[23],"when":[24],"RTP":[25],"combined":[27],"with":[28,45,140],"Chemical":[29],"Vapor":[30],"Deposition":[31],"(CVD)":[32],"the":[33,63,114,133,145,153],"so-called":[34],"RTP-CVD":[35],"technology":[36],"it":[37],"can":[38],"be":[39,127],"used":[40,156],"deposit":[42],"ultrathin":[43],"films":[44],"extremely":[46,66],"sharp":[47],"interfaces":[48],"excellent":[50],"material":[51],"qualities.":[52],"One":[53],"major":[54],"consequence":[55],"of":[56,59,69,116,164,214],"this":[57],"type":[58],"processing":[60,228],"however":[61],"need":[64],"tight":[67],"control":[68,79],"wafer":[70],"temperature":[71,92],"both":[72,100,184],"obtain":[74],"reproducible":[75],"results":[76],"minimize":[82],"slip":[83],"warpage":[85],"arising":[86],"from":[87,178],"nonuniformities":[88],"in":[89,144,212],"temperature.":[90],"Specifically":[91],"measurement":[93,124,196],"systems":[94,160,180],"suitable":[95],"RiP":[97,159],"must":[98,126],"have":[99,138],"high":[101],"precision--within":[102],"1-2":[103],"degrees--and":[104],"short":[106],"response":[107,134],"time--to":[108],"output":[109],"an":[110],"accurate":[111],"reading":[112],"on":[113,227],"order":[115],"milliseconds":[117],"closedloop":[119],"control.":[120],"Any":[121],"such":[122,176],"in-situ":[123],"technique":[125,157],"non-contact":[128],"since":[129],"thermocouples":[130],"cannot":[131],"meet":[132],"time":[135],"requirements":[136],"problems":[139],"conductive":[141],"heat":[142],"flow":[143],"wafer.":[146],"To":[147],"date":[148],"optical":[149,182,202],"pyrometry":[150,183],"has":[151],"been":[152],"most":[154],"widely":[155],"although":[161],"number":[163],"other":[165],"techniques":[166,177,192],"are":[167],"being":[168],"considered":[169],"researched.":[171],"This":[172],"article":[173],"examines":[174],"several":[175],"perspective:":[181],"conventional":[185],"new":[188],"using":[190],"ellipsometric":[191],"concurrent":[194],"emissivity":[195],"Raman":[197],"scattering":[198],"infrared":[199],"laser":[200],"thermometry":[201,204],"diffraction":[203],"photoacoustic":[206],"thermometry.":[207],"Each":[208],"evaluated":[211],"terms":[213],"actual":[216],"or":[217],"estimated":[218],"cost":[220],"remote":[221],"sensing":[222],"capability":[223],"precision":[224],"repeatability":[225],"dependence":[226],"history":[229],"range":[230]},"counts_by_year":[],"updated_date":"2026-10-27T15:51:10.671819","created_date":"2016-06-24T00:00:00"}