{"id":"https://openalex.org/W2013238973","doi":"https://doi.org/10.1117/12.2046302","title":"Actinic review of EUV masks: first results from the AIMS EUV system integration","display_name":"Actinic review of EUV masks: first results from the AIMS EUV system integration","publication_year":2014,"publication_date":"2014-04-24","ids":{"openalex":"https://openalex.org/W2013238973","doi":"https://doi.org/10.1117/12.2046302","mag":"2013238973"},"language":"en","primary_location":{"id":"doi:10.1117/12.2046302","doi":"https://doi.org/10.1117/12.2046302","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046302","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5082402438","display_name":"Markus R. Weiss","orcid":"https://orcid.org/0000-0003-4188-4538","observed_orcids":["https://orcid.org/0000-0003-4188-4538"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Markus R. Weiss","raw_affiliation_strings":["Carl Zeiss SMT GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Carl Zeiss SMT GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015773400","display_name":"Dirk Hellweg","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Dirk Hellweg","raw_affiliation_strings":["Carl Zeiss SMT GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Carl Zeiss SMT GmbH (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109869205","display_name":"Jan Hendrik Peters","orcid":"https://orcid.org/0009-0006-9433-9698","observed_orcids":["https://orcid.org/0009-0006-9433-9698"]},"institutions":[{"id":"https://openalex.org/I1302207122","display_name":"Carl Zeiss (Germany)","ror":"https://ror.org/02mp31p96","country_code":"DE","type":"company","lineage":["https://openalex.org/I1302207122"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Jan Hendrik Peters","raw_affiliation_strings":["Carl Zeiss SMS GMBH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Carl Zeiss SMS GMBH (Germany)","institution_ids":["https://openalex.org/I1302207122"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062176485","display_name":"Sascha Perlitz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1302207122","display_name":"Carl Zeiss (Germany)","ror":"https://ror.org/02mp31p96","country_code":"DE","type":"company","lineage":["https://openalex.org/I1302207122"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Sascha Perlitz","raw_affiliation_strings":["Carl Zeiss SMS GMBH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Carl Zeiss SMS GMBH (Germany)","institution_ids":["https://openalex.org/I1302207122"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084795379","display_name":"Anthony D. Garetto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1302207122","display_name":"Carl Zeiss (Germany)","ror":"https://ror.org/02mp31p96","country_code":"DE","type":"company","lineage":["https://openalex.org/I1302207122"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Anthony Garetto","raw_affiliation_strings":["Carl Zeiss SMS GMBH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Carl Zeiss SMS GMBH (Germany)","institution_ids":["https://openalex.org/I1302207122"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113464167","display_name":"Michael Goldstein","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Michael Goldstein","raw_affiliation_strings":["Sematech, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sematech, Inc. (United States)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":4.8174,"has_fulltext":false,"cited_by_count":15,"citation_normalized_percentile":{"value":0.96461258,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"9048","issue":null,"first_page":"90480X","last_page":"90480X"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-masks","display_name":"EUV masks","score":0.8050000071525574},{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.8870000243186951},{"id":"https://openalex.org/keywords/mask-defect-detection","display_name":"mask defect detection","score":0.7440000176429749},{"id":"https://openalex.org/keywords/system-integration","display_name":"system integration","score":0.800000011920929}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9858556985855103},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.48322948813438416},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.480726033449173},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.32836538553237915},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.22805240750312805},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.07700169086456299}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2046302","doi":"https://doi.org/10.1117/12.2046302","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046302","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1974542698","https://openalex.org/W1977551752","https://openalex.org/W1981558927","https://openalex.org/W1989221584","https://openalex.org/W2012806708","https://openalex.org/W2074907109"],"related_works":["https://openalex.org/W2110828939","https://openalex.org/W2326158190","https://openalex.org/W4230160032","https://openalex.org/W2792877832","https://openalex.org/W1981558927","https://openalex.org/W2074907109","https://openalex.org/W1974542698","https://openalex.org/W2766934230","https://openalex.org/W2950600357","https://openalex.org/W2897909262"],"abstract_inverted_index":{"The":[0],"EUV":[1,13,56],"mask":[2],"infrastructure":[3],"is":[4,33],"of":[5,12,23,29,70,84],"key":[6],"importance":[7],"for":[8,20,54],"a":[9,51],"successful":[10],"introduction":[11],"lithography":[14],"into":[15],"volume":[16],"production.":[17],"In":[18,63],"particular,":[19],"the":[21,44,68,71,80,85],"production":[22],"defect":[24,31],"free":[25],"masks,":[26],"actinic":[27,39],"review":[28,40],"potential":[30],"sites":[32],"required.":[34],"To":[35],"realize":[36],"such":[37],"an":[38,55],"tool,":[41],"Zeiss":[42],"and":[43,75],"SEMATECH":[45],"EUVL":[46],"Mask":[47],"Infrastructure":[48],"consortium":[49],"started":[50],"development":[52],"programme":[53],"aerial":[57],"image":[58],"metrology":[59],"system":[60,73],"(AIMS\u2122":[61],"EUV).":[62],"this":[64],"paper,":[65],"we":[66],"discuss":[67],"status":[69],"on-going":[72],"integration":[74],"show":[76],"first":[77,81],"results":[78],"from":[79],"light":[82],"tests":[83],"prototype":[86],"tool.":[87]},"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":5},{"year":2014,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}