{"id":"https://openalex.org/W2013156221","doi":"https://doi.org/10.1116/1.585905","title":"Correlation of in-plane and out-of-plane distortion in x-ray lithography masks","display_name":"Correlation of in-plane and out-of-plane distortion in x-ray lithography masks","publication_year":1992,"publication_date":"1992-11-01","ids":{"openalex":"https://openalex.org/W2013156221","doi":"https://doi.org/10.1116/1.585905","mag":"2013156221"},"language":"en","primary_location":{"id":"doi:10.1116/1.585905","doi":"https://doi.org/10.1116/1.585905","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.585905","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5076979836","display_name":"Y. Ku","orcid":"https://orcid.org/0000-0001-7432-3230","observed_orcids":["https://orcid.org/0000-0001-7432-3230"]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Y. C. Ku","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Michael H. Lim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Michael H. Lim","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057590459","display_name":"James M. Carter","orcid":"https://orcid.org/0000-0001-5379-8325","observed_orcids":["https://orcid.org/0000-0001-5379-8325"]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. M. Carter","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071301546","display_name":"Mark K. Mondol","orcid":"https://orcid.org/0000-0002-3031-4890","observed_orcids":["https://orcid.org/0000-0002-3031-4890"]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. K. Mondol","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088073802","display_name":"A. Moel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Moel","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103005688","display_name":"Henry I. Smith","orcid":"https://orcid.org/0000-0001-8690-231X","observed_orcids":["https://orcid.org/0000-0001-8690-231X"]},"institutions":[{"id":"https://openalex.org/I63966007","display_name":"Massachusetts Institute of Technology","ror":"https://ror.org/042nb2s44","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Henry I. Smith","raw_affiliation_strings":["Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139","institution_ids":["https://openalex.org/I63966007"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I63966007"],"apc_list":null,"apc_paid":null,"fwci":1.4044,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.7835741,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"10","issue":"6","first_page":"3169","last_page":"3172"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.018400000408291817,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.006899999920278788,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/x-ray-lithography-masks","display_name":"x-ray lithography masks","score":0.9800000190734863},{"id":"https://openalex.org/keywords/in-plane-distortion","display_name":"in-plane distortion","score":0.9620000123977661},{"id":"https://openalex.org/keywords/out-of-plane-deflection","display_name":"out-of-plane deflection","score":0.9909999966621399},{"id":"https://openalex.org/keywords/moire-method","display_name":"moire method","score":0.9079999923706055},{"id":"https://openalex.org/keywords/holographic-interferometry","display_name":"holographic interferometry","score":0.9990000128746033},{"id":"https://openalex.org/keywords/holographic-lithography","display_name":"holographic lithography","score":0.6650000214576721},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.9779999852180481},{"id":"https://openalex.org/keywords/fringe-pattern-analysis","display_name":"fringe pattern analysis","score":0.5400000214576721}],"concepts":[{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6857877373695374},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5589056611061096},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5572197437286377},{"id":"https://openalex.org/C126780896","wikidata":"https://www.wikidata.org/wiki/Q899871","display_name":"Distortion (music)","level":4,"score":0.5328192114830017},{"id":"https://openalex.org/C128289946","wikidata":"https://www.wikidata.org/wiki/Q5884113","display_name":"Holographic interferometry","level":3,"score":0.4980947971343994},{"id":"https://openalex.org/C166689943","wikidata":"https://www.wikidata.org/wiki/Q850283","display_name":"Interferometry","level":2,"score":0.3851246237754822},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.36163949966430664},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.11820453405380249},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.0},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.585905","doi":"https://doi.org/10.1116/1.585905","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.585905","pdf_url":null,"source":{"id":"https://openalex.org/S4210169477","display_name":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","issn_l":"1071-1023","issn":["1071-1023","1520-8567"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-70"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320306087","display_name":"Semiconductor Research Corporation","ror":"https://ror.org/047z4n946"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2007644115","https://openalex.org/W2087522049","https://openalex.org/W2051625480","https://openalex.org/W2044873611","https://openalex.org/W2010081301","https://openalex.org/W2008556478","https://openalex.org/W2148876435","https://openalex.org/W2039173051","https://openalex.org/W2088802131","https://openalex.org/W2034235868"],"abstract_inverted_index":{"The":[0,51,261],"implementation":[1],"of":[2,21,28,55,132,140,165],"x-ray":[3,167,181],"lithography":[4,172],"requires":[5],"that":[6,93,101,155],"in-plane":[7,108,123,142,224,269,281,288],"distortion":[8,38,225,270,289],"caused":[9,76],"by":[10,77,243],"absorber":[11,42,57,78,88,182,228],"stress":[12,43,58,92,109],"be":[13,16,253],"eliminated":[14],"(i.e.,":[15,33],"made":[17],"less":[18],"than":[19,271],"\u223c10%":[20],"minimum":[22],"feature":[23],"sizes).":[24],"As":[25],"a":[26,68,91,99,117,144,148,160,206,212,256,265,284],"rule":[27],"thumb,":[29],"for":[30,86,293],"large-area":[31],"membranes":[32,60],"\u226530":[34],"mm":[35],"diam)":[36],"stress-induced":[37],"is":[39,44,61,75,82,104,110,116,183,194,216,236],"negligible":[40],"if":[41,114],"kept":[45],"below":[46,290],"108":[47],"dynes/cm2":[48],"(10":[49],"MPa).":[50],"most":[52],"common":[53],"way":[54,100],"determining":[56],"on":[59,162,255],"to":[62,89,128,268,279,287],"measure":[63,280],"the":[64,130,166,177,188,197,202,223,231,234,239,272],"out-of-plane":[65,121],"deflection":[66,74],"in":[67,84,97,126,238],"Linnik":[69],"or":[70,158],"Mireau":[71],"interferometer.":[72],"Out-of-plane":[73],"bending":[79,102],"moment.":[80],"It":[81],"possible,":[83],"principle,":[85],"an":[87,180],"have":[90,136],"varies":[94],"with":[95],"depth":[96],"such":[98],"moment":[103],"zero":[105],"but":[106,204],"net":[107],"not.":[111],"To":[112],"determine":[113],"there":[115],"one-to-one":[118],"correspondence":[119],"between":[120],"and":[122,125,147,173,185,226,275],"distortion,":[124],"order":[127],"check":[129],"validity":[131],"Yanof\u2019s":[133],"model,":[134],"we":[135],"developed":[137],"two":[138,244],"methods":[139],"measuring":[141],"distortion:":[143],"moir\u00e9":[145,189,214,273],"method":[146,190,263,274],"holographic":[149,171,192],"interferometry":[150],"(HI)":[151],"method.":[152],"Both":[153],"require":[154],"one":[156,163,220,278],"etch":[157],"lift-off":[159],"grid":[161],"surface":[164,179],"mask":[168,235],"membrane":[169],"using":[170],"reactive-ion":[174],"etching.":[175],"On":[176],"opposite":[178],"deposited":[184],"patterned.":[186],"In":[187,230],"another":[191],"exposure":[193],"performed,":[195],"at":[196,205,283],"same":[198],"spatial":[199],"period":[200],"as":[201],"grid,":[203],"small":[207],"azimuthal":[208],"rotation.":[209],"After":[210],"development,":[211],"clear":[213],"pattern":[215,250,295],"formed,":[217],"from":[218],"which":[219],"can":[221,251],"calculate":[222],"corresponding":[227,286],"stress.":[229],"HI":[232,262],"method,":[233],"placed":[237],"standing":[240],"wave":[241],"produced":[242],"intersecting":[245],"laser":[246],"beams.":[247],"A":[248],"fringe":[249],"then":[252],"seen":[254],"charge":[257],"coupled":[258],"device":[259],"camera.":[260],"provides":[264],"higher":[266],"sensitivity":[267],"should":[276],"enable":[277],"strain":[282],"level":[285],"1":[291],"nm":[292],"typical":[294],"geometries.":[296]},"counts_by_year":[],"updated_date":"2026-10-17T09:40:24.721904","created_date":"2016-06-24T00:00:00"}