{"id":"https://openalex.org/W2012895276","doi":"https://doi.org/10.1016/0039-6028(76)90356-3","title":"The influence of selective sputtering on surface composition","display_name":"The influence of selective sputtering on surface composition","publication_year":1976,"publication_date":"1976-07-01","ids":{"openalex":"https://openalex.org/W2012895276","doi":"https://doi.org/10.1016/0039-6028(76)90356-3","mag":"2012895276"},"language":"en","primary_location":{"id":"doi:10.1016/0039-6028(76)90356-3","doi":"https://doi.org/10.1016/0039-6028(76)90356-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(76)90356-3","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111381577","display_name":"H. W. Werner","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122849","display_name":"Philips (Netherlands)","ror":"https://ror.org/02p2bgp27","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"H.W. Werner","raw_affiliation_strings":["Philips Research Laboratories, Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Research Laboratories, Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210122849"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5072758717","display_name":"N. Warmoltz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210122849","display_name":"Philips (Netherlands)","ror":"https://ror.org/02p2bgp27","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"N. Warmoltz","raw_affiliation_strings":["Philips Research Laboratories, Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Philips Research Laboratories, Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210122849"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210122849"],"apc_list":{"value":3340,"currency":"USD","value_usd":3340},"apc_paid":null,"fwci":4.2167,"has_fulltext":false,"cited_by_count":46,"citation_normalized_percentile":{"value":0.94006659,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"57","issue":"2","first_page":"706","last_page":"714"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.8755000233650208,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.8755000233650208,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.11999999731779099,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/selective-sputtering","display_name":"selective sputtering","score":0.9750000238418579},{"id":"https://openalex.org/keywords/surface-composition","display_name":"surface composition","score":0.9660000205039978},{"id":"https://openalex.org/keywords/sputter-yield","display_name":"sputter yield","score":0.8650000095367432},{"id":"https://openalex.org/keywords/steady-state","display_name":"steady state","score":0.6309999823570251}],"concepts":[{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.7898865342140198},{"id":"https://openalex.org/C66882249","wikidata":"https://www.wikidata.org/wiki/Q169336","display_name":"Homogeneous","level":2,"score":0.731280505657196},{"id":"https://openalex.org/C7070889","wikidata":"https://www.wikidata.org/wiki/Q902488","display_name":"Monolayer","level":2,"score":0.7140911221504211},{"id":"https://openalex.org/C2776799497","wikidata":"https://www.wikidata.org/wiki/Q484298","display_name":"Surface (topology)","level":2,"score":0.6143883466720581},{"id":"https://openalex.org/C168167062","wikidata":"https://www.wikidata.org/wiki/Q1117970","display_name":"Component (thermodynamics)","level":2,"score":0.6021934151649475},{"id":"https://openalex.org/C40231798","wikidata":"https://www.wikidata.org/wiki/Q1333743","display_name":"Composition (language)","level":2,"score":0.5532622933387756},{"id":"https://openalex.org/C8171440","wikidata":"https://www.wikidata.org/wiki/Q903414","display_name":"Steady state (chemistry)","level":2,"score":0.5381717085838318},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4586141109466553},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4369969367980957},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.43660303950309753},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.411073237657547},{"id":"https://openalex.org/C159467904","wikidata":"https://www.wikidata.org/wiki/Q2001702","display_name":"Chemical physics","level":1,"score":0.35233235359191895},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.34769588708877563},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.1949121057987213},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.1754940152168274},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16352173686027527},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15075239539146423},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.11613431572914124},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.1155799925327301},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.11305975914001465},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0039-6028(76)90356-3","doi":"https://doi.org/10.1016/0039-6028(76)90356-3","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0039-6028(76)90356-3","pdf_url":null,"source":{"id":"https://openalex.org/S137865625","display_name":"Surface Science","issn_l":"0039-6028","issn":["0039-6028","1879-2758"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":28,"referenced_works":["https://openalex.org/W568926953","https://openalex.org/W1965861272","https://openalex.org/W1968751812","https://openalex.org/W1970701804","https://openalex.org/W1975748815","https://openalex.org/W1977095442","https://openalex.org/W1977155421","https://openalex.org/W1992471152","https://openalex.org/W1999376788","https://openalex.org/W2004948080","https://openalex.org/W2009925589","https://openalex.org/W2010058056","https://openalex.org/W2016200948","https://openalex.org/W2022971021","https://openalex.org/W2028785031","https://openalex.org/W2030568919","https://openalex.org/W2034814069","https://openalex.org/W2038574663","https://openalex.org/W2041799823","https://openalex.org/W2064819292","https://openalex.org/W2073802317","https://openalex.org/W2075316598","https://openalex.org/W2080365826","https://openalex.org/W2092665468","https://openalex.org/W2107558564","https://openalex.org/W2130893597","https://openalex.org/W2142877088","https://openalex.org/W2507727556"],"related_works":["https://openalex.org/W4404178744","https://openalex.org/W2053759317","https://openalex.org/W4230648551","https://openalex.org/W815346234","https://openalex.org/W2055219302","https://openalex.org/W2003345652","https://openalex.org/W4405524570","https://openalex.org/W2313498461","https://openalex.org/W4236849052","https://openalex.org/W1999637174"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}