{"id":"https://openalex.org/W2012245461","doi":"https://doi.org/10.1016/j.msea.2005.05.027","title":"Plasma spray formed near-net-shape MoSi2\u2013Si3N4 bulk nanocomposites\u2014structure property evaluation","display_name":"Plasma spray formed near-net-shape MoSi2\u2013Si3N4 bulk nanocomposites\u2014structure property evaluation","publication_year":2005,"publication_date":"2005-07-02","ids":{"openalex":"https://openalex.org/W2012245461","doi":"https://doi.org/10.1016/j.msea.2005.05.027","mag":"2012245461"},"language":"en","primary_location":{"id":"doi:10.1016/j.msea.2005.05.027","doi":"https://doi.org/10.1016/j.msea.2005.05.027","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.msea.2005.05.027","pdf_url":null,"source":{"id":"https://openalex.org/S154732359","display_name":"Materials Science and Engineering A","issn_l":"0921-5093","issn":["0921-5093","1873-4936"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-2","norway-2","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science and Engineering: A","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://stars.library.ucf.edu/facultybib2000/5278","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5056325957","display_name":"Soon\u2010Jik Hong","orcid":"https://orcid.org/0000-0003-1293-6538","observed_orcids":["https://orcid.org/0000-0003-1293-6538"]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S.J. Hong","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023054730","display_name":"V. Viswanathan","orcid":"https://orcid.org/0000-0003-3843-9871","observed_orcids":["https://orcid.org/0000-0003-3843-9871"]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"V. Viswanathan","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032509241","display_name":"Keith E. Rea","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"K. Rea","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110226611","display_name":"Swanand D. Patil","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Patil","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":null,"display_name":"S. Deshpande","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Deshpande","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":null,"display_name":"P. Georgieva","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"P. Georgieva","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113477045","display_name":"Tim McKechnie","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210152060","display_name":"Plasma Processes (United States)","ror":"https://ror.org/03yywea39","country_code":"US","type":"company","lineage":["https://openalex.org/I4210152060"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"T. McKechnie","raw_affiliation_strings":["Plasma Process Inc., Huntsville, AL, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Plasma Process Inc., Huntsville, AL, USA","institution_ids":["https://openalex.org/I4210152060"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5026168431","display_name":"Sudipta Seal","orcid":"https://orcid.org/0000-0002-0963-3344","observed_orcids":["https://orcid.org/0000-0002-0963-3344"]},"institutions":[{"id":"https://openalex.org/I106165777","display_name":"University of Central Florida","ror":"https://ror.org/036nfer12","country_code":"US","type":"education","lineage":["https://openalex.org/I106165777"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Seal","raw_affiliation_strings":["Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surface Engineering and Nanotechnology Facility, Advanced Materials Processing and Analysis Center and Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, Orlando, FL 32816-2450, USA","institution_ids":["https://openalex.org/I106165777"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3430,"currency":"USD","value_usd":3430},"apc_paid":null,"fwci":2.4146,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":{"value":0.85584137,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"404","issue":"1-2","first_page":"165","last_page":"172"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10132","display_name":"Advanced ceramic materials synthesis","score":0.850600004196167,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10132","display_name":"Advanced ceramic materials synthesis","score":0.850600004196167,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10626","display_name":"High-Temperature Coating Behaviors","score":0.09600000083446503,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11100","display_name":"Intermetallics and Advanced Alloy Properties","score":0.0044999998062849045,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/plasma-spraying","display_name":"plasma spraying","score":0.7120000123977661},{"id":"https://openalex.org/keywords/mosi2","display_name":"molybdenum disilicide","score":0.7749999761581421},{"id":"https://openalex.org/keywords/silicon-nitride","display_name":"silicon nitride","score":0.7770000100135803},{"id":"https://openalex.org/keywords/silicon-carbide","display_name":"silicon carbide","score":0.8360000252723694},{"id":"https://openalex.org/keywords/vickers-hardness","display_name":"Vickers hardness","score":0.7110000252723694},{"id":"https://openalex.org/keywords/fracture-toughness","display_name":"fracture toughness","score":1.0},{"id":"https://openalex.org/keywords/oxidation-resistance","display_name":"oxidation resistance","score":0.9629999995231628},{"id":"https://openalex.org/keywords/particle-size-distribution","display_name":"particle size distribution","score":0.7879999876022339},{"id":"https://openalex.org/keywords/composite-consolidation","display_name":"composite consolidation","score":0.4429999887943268}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6871075630187988},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5591743588447571},{"id":"https://openalex.org/C14166107","wikidata":"https://www.wikidata.org/wiki/Q253829","display_name":"Net (polyhedron)","level":2,"score":0.4990272521972656},{"id":"https://openalex.org/C2777759229","wikidata":"https://www.wikidata.org/wiki/Q6984396","display_name":"Near net shape","level":2,"score":0.4911620318889618},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.48335546255111694},{"id":"https://openalex.org/C92880739","wikidata":"https://www.wikidata.org/wiki/Q2639556","display_name":"Nanocomposite","level":2,"score":0.4763336777687073},{"id":"https://openalex.org/C189950617","wikidata":"https://www.wikidata.org/wiki/Q937228","display_name":"Property (philosophy)","level":2,"score":0.42541825771331787},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.19020569324493408},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.08923795819282532},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.05422842502593994},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/j.msea.2005.05.027","doi":"https://doi.org/10.1016/j.msea.2005.05.027","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.msea.2005.05.027","pdf_url":null,"source":{"id":"https://openalex.org/S154732359","display_name":"Materials Science and Engineering A","issn_l":"0921-5093","issn":["0921-5093","1873-4936"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-2","norway-2","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science and Engineering: A","raw_type":"journal-article"},{"id":"pmh:oai:stars.library.ucf.edu:facultybib2000-6277","doi":null,"is_oa":true,"landing_page_url":"https://stars.library.ucf.edu/facultybib2000/5278","pdf_url":null,"source":{"id":"https://openalex.org/S4210172555","display_name":"Journal of International Crisis and Risk Communication Research","issn_l":"2576-0017","issn":["2576-0017","2576-0025"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","vabb-shw"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Faculty Bibliography 2000s","raw_type":"text"},{"id":"pmh:oai:stars.library.ucf.edu:scopus2000-4727","doi":null,"is_oa":true,"landing_page_url":"https://stars.library.ucf.edu/scopus2000/3728","pdf_url":null,"source":{"id":"https://openalex.org/S4210172555","display_name":"Journal of International Crisis and Risk Communication Research","issn_l":"2576-0017","issn":["2576-0017","2576-0025"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","vabb-shw"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Scopus Export 2000s","raw_type":"text"}],"best_oa_location":{"id":"pmh:oai:stars.library.ucf.edu:facultybib2000-6277","doi":null,"is_oa":true,"landing_page_url":"https://stars.library.ucf.edu/facultybib2000/5278","pdf_url":null,"source":{"id":"https://openalex.org/S4210172555","display_name":"Journal of International Crisis and Risk Communication Research","issn_l":"2576-0017","issn":["2576-0017","2576-0025"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","vabb-shw"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Faculty Bibliography 2000s","raw_type":"text"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320337345","display_name":"Office of Naval Research","ror":"https://ror.org/00rk2pe57"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":30,"referenced_works":["https://openalex.org/W238825432","https://openalex.org/W575261407","https://openalex.org/W627381204","https://openalex.org/W1491729137","https://openalex.org/W1505208174","https://openalex.org/W1634536136","https://openalex.org/W1963637542","https://openalex.org/W1969658303","https://openalex.org/W1970497162","https://openalex.org/W1970592316","https://openalex.org/W1981708912","https://openalex.org/W1995591427","https://openalex.org/W2000386892","https://openalex.org/W2002349312","https://openalex.org/W2004393394","https://openalex.org/W2007341411","https://openalex.org/W2021497568","https://openalex.org/W2035849704","https://openalex.org/W2036240998","https://openalex.org/W2054031705","https://openalex.org/W2067415388","https://openalex.org/W2077934281","https://openalex.org/W2080348122","https://openalex.org/W2087846679","https://openalex.org/W2100529647","https://openalex.org/W2118345567","https://openalex.org/W2120047641","https://openalex.org/W2122972324","https://openalex.org/W2148147996","https://openalex.org/W2318966720"],"related_works":["https://openalex.org/W4253588028","https://openalex.org/W7005267261","https://openalex.org/W2183614630","https://openalex.org/W2058357946","https://openalex.org/W2319970964","https://openalex.org/W2913497552","https://openalex.org/W2359702253","https://openalex.org/W1482181330","https://openalex.org/W1970924745","https://openalex.org/W2181343508"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}