{"id":"https://openalex.org/W2011454504","doi":"https://doi.org/10.1116/1.1317843","title":"Tantalum Films Triode-Sputtered in Mixtures of Argon and Water Vapor","display_name":"Tantalum Films Triode-Sputtered in Mixtures of Argon and Water Vapor","publication_year":1972,"publication_date":"1972-03-01","ids":{"openalex":"https://openalex.org/W2011454504","doi":"https://doi.org/10.1116/1.1317843","mag":"2011454504"},"language":"en","primary_location":{"id":"doi:10.1116/1.1317843","doi":"https://doi.org/10.1116/1.1317843","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1317843","pdf_url":null,"source":{"id":"https://openalex.org/S52593085","display_name":"Journal of Vacuum Science and Technology","issn_l":"0022-5355","issn":["0022-5355","2331-1754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5016188405","display_name":"William D. Westwood","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I176714629","display_name":"Bell (Canada)","ror":"https://ror.org/00xdg8m59","country_code":"CA","type":"company","lineage":["https://openalex.org/I176714629"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"W. D. Westwood","raw_affiliation_strings":["Bell-Northern Research, Ottawa, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell-Northern Research, Ottawa, Canada","institution_ids":["https://openalex.org/I176714629"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060132214","display_name":"David J. Willmott","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I176714629","display_name":"Bell (Canada)","ror":"https://ror.org/00xdg8m59","country_code":"CA","type":"company","lineage":["https://openalex.org/I176714629"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"D. J. Willmott","raw_affiliation_strings":["Bell-Northern Research, Ottawa, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell-Northern Research, Ottawa, Canada","institution_ids":["https://openalex.org/I176714629"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5090661566","display_name":"P. S. Wilcox","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I176714629","display_name":"Bell (Canada)","ror":"https://ror.org/00xdg8m59","country_code":"CA","type":"company","lineage":["https://openalex.org/I176714629"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"P. S. Wilcox","raw_affiliation_strings":["Bell-Northern Research, Ottawa, Canada"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell-Northern Research, Ottawa, Canada","institution_ids":["https://openalex.org/I176714629"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I176714629"],"apc_list":null,"apc_paid":null,"fwci":5.8731,"has_fulltext":false,"cited_by_count":10,"citation_normalized_percentile":{"value":0.95395458,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"9","issue":"2","first_page":"987","last_page":"990"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.31690001487731934,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.31690001487731934,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.21359999477863312,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.21150000393390656,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/tantalum-thin-films","display_name":"tantalum thin films","score":0.8999999761581421},{"id":"https://openalex.org/keywords/triode-sputtering","display_name":"triode sputtering","score":0.949999988079071},{"id":"https://openalex.org/keywords/water-vapor-dissociation","display_name":"water vapor dissociation","score":0.9169999957084656},{"id":"https://openalex.org/keywords/oxygen-incorporation","display_name":"oxygen incorporation","score":0.7879999876022339},{"id":"https://openalex.org/keywords/oxygen-doping","display_name":"oxygen doping","score":0.5789999961853027},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.9509999752044678},{"id":"https://openalex.org/keywords/outgassing","display_name":"outgassing","score":0.8220000267028809}],"concepts":[{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.8088380098342896},{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.7094232439994812},{"id":"https://openalex.org/C147534773","wikidata":"https://www.wikidata.org/wiki/Q190120","display_name":"Water vapor","level":2,"score":0.6700403094291687},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6284822225570679},{"id":"https://openalex.org/C30646810","wikidata":"https://www.wikidata.org/wiki/Q185648","display_name":"Torr","level":2,"score":0.5567799210548401},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.5504027605056763},{"id":"https://openalex.org/C514619126","wikidata":"https://www.wikidata.org/wiki/Q1123","display_name":"Tantalum","level":2,"score":0.5443496108055115},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.5248774886131287},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5159414410591125},{"id":"https://openalex.org/C123544296","wikidata":"https://www.wikidata.org/wiki/Q176129","display_name":"Triode","level":4,"score":0.47034409642219543},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.42175090312957764},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.41295111179351807},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.39216452836990356},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.34674733877182007},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.15572571754455566},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.10670512914657593},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0971871018409729},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.1317843","doi":"https://doi.org/10.1116/1.1317843","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.1317843","pdf_url":null,"source":{"id":"https://openalex.org/S52593085","display_name":"Journal of Vacuum Science and Technology","issn_l":"0022-5355","issn":["0022-5355","2331-1754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science and Technology","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2083469357","https://openalex.org/W1970443636","https://openalex.org/W2091559914","https://openalex.org/W3185282193","https://openalex.org/W4240956540","https://openalex.org/W2083165081","https://openalex.org/W2004468477","https://openalex.org/W2079354039","https://openalex.org/W2586068435","https://openalex.org/W2003701768"],"abstract_inverted_index":{"Tantalum":[0],"films":[1,84,115],"have":[2],"been":[3],"deposited":[4],"in":[5,39,67,113,116,142,183],"a":[6,12,34],"triode":[7],"sputtering":[8,185],"system":[9],"operating":[10,32],"at":[11],"total":[13],"pressure":[14],"of":[15,29,82,99,103,174],"5\u00d710\u22124":[16],"Torr":[17],"that":[18,61,108,169],"was":[19,42,85],"maintained":[20],"by":[21],"continuously":[22],"adding":[23],"an":[24],"argon-water":[25],"vapor":[26,64,122,176],"mixture.":[27],"Because":[28],"the":[30,40,62,68,71,77,83,88,96,104,109,114,117,158,163],"low":[31,171],"pressure,":[33],"mass":[35,50,58],"spectrometer":[36],"mounted":[37],"directly":[38],"chamber":[41],"used,":[43],"without":[44],"any":[45],"differential":[46],"pumping,":[47],"to":[48,132,146,157,162,180],"monitor":[49],"spectra":[51,59],"before,":[52],"during,":[53],"and":[54,70,91,123,152],"after":[55],"sputtering.":[56],"The":[57,79,126,139],"show":[60,107,168],"water":[63,100,121,175],"is":[65,74,111,128,155],"dissociated":[66],"discharge,":[69],"resultant":[72],"oxygen":[73,80,110,124,137],"gettered":[75],"into":[76],"film.":[78],"content":[81],"determined":[86],"from":[87,130,144,160],"anodization":[89],"efficiency,":[90],"it":[92],"increased":[93,129],"linearly":[94],"with":[95,135],"inlet":[97],"rate":[98],"vapor.":[101],"Measurements":[102],"electrical":[105],"properties":[106],"incorporated":[112],"same":[118],"way":[119],"for":[120],"doping.":[125],"resistivity":[127,143],"50":[131,145],"1014\u03bc\u03a9":[133],"cm":[134,149],"increasing":[136],"content.":[138],"rapid":[140],"increase":[141],"200":[147],"\u03bc\u03a9":[148],"between":[150],"4":[151],"11":[153],"at.%":[154],"due":[156],"change":[159],"bcc":[161],"\u03b2-Ta":[164,182],"structure.":[165],"These":[166],"results":[167],"very":[170],"outgassing":[172],"rates":[173],"may":[177],"be":[178],"sufficient":[179],"produce":[181],"many":[184],"systems.":[186]},"counts_by_year":[{"year":2018,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}