{"id":"https://openalex.org/W2011127281","doi":"https://doi.org/10.1016/j.apsusc.2009.05.156","title":"Modification by H-termination in growth process of titanium silicide on Si(001)-2\u00d71 observed with scanning tunneling microscopy","display_name":"Modification by H-termination in growth process of titanium silicide on Si(001)-2\u00d71 observed with scanning tunneling microscopy","publication_year":2009,"publication_date":"2009-06-10","ids":{"openalex":"https://openalex.org/W2011127281","doi":"https://doi.org/10.1016/j.apsusc.2009.05.156","mag":"2011127281"},"language":"en","primary_location":{"id":"doi:10.1016/j.apsusc.2009.05.156","doi":"https://doi.org/10.1016/j.apsusc.2009.05.156","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2009.05.156","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"T. Aoki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"T. Aoki","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060499367","display_name":"Ken\u2010ichi Shudo","orcid":"https://orcid.org/0000-0001-9027-0247","observed_orcids":["https://orcid.org/0000-0001-9027-0247"]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Shudo","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045505635","display_name":"Koki Sato","orcid":"https://orcid.org/0000-0003-1702-5194","observed_orcids":["https://orcid.org/0000-0003-1702-5194"]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Sato","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016597678","display_name":"S. Ohno","orcid":"https://orcid.org/0000-0002-4826-8706","observed_orcids":["https://orcid.org/0000-0002-4826-8706"]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Ohno","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":null,"display_name":"H. Nishioka","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Nishioka","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109194534","display_name":"Takanori Iida","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Iida","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077923459","display_name":"Masamitsu TORAMARU","orcid":"https://orcid.org/0009-0008-0557-0930","observed_orcids":["https://orcid.org/0009-0008-0557-0930"]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Toramaru","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5066058375","display_name":"Masatoshi Tanaka","orcid":"https://orcid.org/0000-0001-8252-0971","observed_orcids":["https://orcid.org/0000-0001-8252-0971"]},"institutions":[{"id":"https://openalex.org/I180203408","display_name":"Yokohama National University","ror":"https://ror.org/03zyp6p76","country_code":"JP","type":"education","lineage":["https://openalex.org/I180203408"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Tanaka","raw_affiliation_strings":["Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering, Yokohama National University, Tokiwadai 79-5, Hodogaya-ku, Yokohama 240-8501, Japan","institution_ids":["https://openalex.org/I180203408"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I180203408"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":0.5398,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.59425235,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"256","issue":"4","first_page":"1191","last_page":"1195"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9434000253677368,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9434000253677368,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.05310000106692314,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/titanium-silicide","display_name":"titanium silicide","score":0.9959999918937683},{"id":"https://openalex.org/keywords/tisi2","display_name":"TiSi2","score":0.8050000071525574},{"id":"https://openalex.org/keywords/si-100-21-surface","display_name":"Si(100)-2\u00d71 surface","score":0.902999997138977},{"id":"https://openalex.org/keywords/hydrogen-termination","display_name":"hydrogen termination","score":0.859000027179718},{"id":"https://openalex.org/keywords/thin-film-growth","display_name":"thin film growth","score":0.6380000114440918},{"id":"https://openalex.org/keywords/atomic-scale-surface-modification","display_name":"atomic-scale surface modification","score":0.5659999847412109}],"concepts":[{"id":"https://openalex.org/C6518042","wikidata":"https://www.wikidata.org/wiki/Q175646","display_name":"Scanning tunneling microscope","level":2,"score":0.7993011474609375},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5976225733757019},{"id":"https://openalex.org/C2780901251","wikidata":"https://www.wikidata.org/wiki/Q426473","display_name":"Silicide","level":3,"score":0.5708988904953003},{"id":"https://openalex.org/C506065880","wikidata":"https://www.wikidata.org/wiki/Q716","display_name":"Titanium","level":2,"score":0.5647460222244263},{"id":"https://openalex.org/C147080431","wikidata":"https://www.wikidata.org/wiki/Q1074953","display_name":"Microscopy","level":2,"score":0.42204469442367554},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.38836202025413513},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3357265591621399},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3279685974121094},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.2839880585670471},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.16565757989883423},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09184962511062622}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.apsusc.2009.05.156","doi":"https://doi.org/10.1016/j.apsusc.2009.05.156","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2009.05.156","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":28,"referenced_works":["https://openalex.org/W1597989216","https://openalex.org/W1614356205","https://openalex.org/W1965464486","https://openalex.org/W1966095165","https://openalex.org/W1969529646","https://openalex.org/W1974428860","https://openalex.org/W1978378533","https://openalex.org/W2001438553","https://openalex.org/W2003923473","https://openalex.org/W2004644166","https://openalex.org/W2005760302","https://openalex.org/W2007097955","https://openalex.org/W2009287926","https://openalex.org/W2012725604","https://openalex.org/W2015957531","https://openalex.org/W2017560666","https://openalex.org/W2025047423","https://openalex.org/W2028956342","https://openalex.org/W2034578238","https://openalex.org/W2034896817","https://openalex.org/W2045831612","https://openalex.org/W2054222365","https://openalex.org/W2056118108","https://openalex.org/W2059991793","https://openalex.org/W2067112372","https://openalex.org/W2070224684","https://openalex.org/W2088088279","https://openalex.org/W2111885804"],"related_works":["https://openalex.org/W2003923473","https://openalex.org/W2144929362","https://openalex.org/W2056118108","https://openalex.org/W2047616018","https://openalex.org/W1980747909","https://openalex.org/W2131526601","https://openalex.org/W1995903947","https://openalex.org/W1983358019","https://openalex.org/W2057285171","https://openalex.org/W2071826146"],"abstract_inverted_index":null,"counts_by_year":[{"year":2023,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}