{"id":"https://openalex.org/W2010544036","doi":"https://doi.org/10.1143/jjap.32.6178","title":"Digital Etching Using KrF Excimer Laser: Approach to Atomic-Order-Controlled Etching by Photo Induced Reaction","display_name":"Digital Etching Using KrF Excimer Laser: Approach to Atomic-Order-Controlled Etching by Photo Induced Reaction","publication_year":1993,"publication_date":"1993-12-01","ids":{"openalex":"https://openalex.org/W2010544036","doi":"https://doi.org/10.1143/jjap.32.6178","mag":"2010544036"},"language":"en","primary_location":{"id":"doi:10.1143/jjap.32.6178","doi":"https://doi.org/10.1143/jjap.32.6178","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.32.6178","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.32.6178/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.1143/JJAP.32.6178/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5080542319","display_name":"Masashi Ishii","orcid":"https://orcid.org/0000-0003-0357-2832","observed_orcids":["https://orcid.org/0000-0003-0357-2832","https://orcid.org/0000-0002-7721-9735"]},"institutions":[{"id":"https://openalex.org/I4210110652","display_name":"RIKEN","ror":"https://ror.org/01sjwvz98","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210110652"]},{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masashi Ishii","raw_affiliation_strings":["Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560","The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560","institution_ids":["https://openalex.org/I98285908"]},{"raw_affiliation_string":"The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01","institution_ids":["https://openalex.org/I4210110652"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113541735","display_name":"Takashi Meguro","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210110652","display_name":"RIKEN","ror":"https://ror.org/01sjwvz98","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210110652"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takashi Meguro","raw_affiliation_strings":["The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01","institution_ids":["https://openalex.org/I4210110652"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049910773","display_name":"Kenji Gamo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kenji Gamo","raw_affiliation_strings":["Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110101233","display_name":"Takuo Sugano","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210110652","display_name":"RIKEN","ror":"https://ror.org/01sjwvz98","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210110652"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takuo Sugano","raw_affiliation_strings":["The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01","institution_ids":["https://openalex.org/I4210110652"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100831980","display_name":"Yoshinobu Aoyagi","orcid":"https://orcid.org/0009-0000-2732-6498","observed_orcids":["https://orcid.org/0009-0000-2732-6498"]},"institutions":[{"id":"https://openalex.org/I4210110652","display_name":"RIKEN","ror":"https://ror.org/01sjwvz98","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210110652"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshinobu Aoyagi","raw_affiliation_strings":["The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Institute of Physical and Chemical Research (RIKEN), Hirosawa, Wako, Saitama 351-01","institution_ids":["https://openalex.org/I4210110652"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":3.6465,"has_fulltext":true,"cited_by_count":33,"citation_normalized_percentile":{"value":0.92296641,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":99},"biblio":{"volume":"32","issue":"12S","first_page":"6178","last_page":"6178"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.6176999807357788,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.6176999807357788,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.17069999873638153,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.11550000309944153,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/digital-etching","display_name":"digital etching","score":0.9330000281333923},{"id":"https://openalex.org/keywords/krf-laser","display_name":"KrF excimer laser","score":0.9919999837875366},{"id":"https://openalex.org/keywords/248-nm-laser","display_name":"248 nm laser","score":0.8399999737739563},{"id":"https://openalex.org/keywords/gallium-arsenide","display_name":"GaAs","score":0.6779999732971191},{"id":"https://openalex.org/keywords/chlorine-gas","display_name":"chlorine gas","score":0.46799999475479126},{"id":"https://openalex.org/keywords/self-limiting-etching","display_name":"self-limiting etching","score":0.9279999732971191},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.7400000095367432},{"id":"https://openalex.org/keywords/threshold-fluence","display_name":"threshold fluence","score":0.9049999713897705}],"concepts":[{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.9173986911773682},{"id":"https://openalex.org/C2780477314","wikidata":"https://www.wikidata.org/wiki/Q241056","display_name":"Excimer laser","level":3,"score":0.763425886631012},{"id":"https://openalex.org/C22078206","wikidata":"https://www.wikidata.org/wiki/Q1418023","display_name":"Fluence","level":3,"score":0.6775906682014465},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.634374737739563},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.6198960542678833},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6084011793136597},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.5105470418930054},{"id":"https://openalex.org/C33220542","wikidata":"https://www.wikidata.org/wiki/Q6086567","display_name":"Isotropic etching","level":4,"score":0.4767112135887146},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4595540761947632},{"id":"https://openalex.org/C74561354","wikidata":"https://www.wikidata.org/wiki/Q901723","display_name":"Excimer","level":3,"score":0.4275582432746887},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3806382119655609},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3579091429710388},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3058985471725464},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2793511748313904},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.14221349358558655},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1143/jjap.32.6178","doi":"https://doi.org/10.1143/jjap.32.6178","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.32.6178","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.32.6178/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},{"id":"pmh:oai:irdb.nii.ac.jp:00897:0003873797","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100461118","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Jpn.J.Appl.Phys.","raw_type":"journal article"},{"id":"pmh:oai:t2r2.star.titech.ac.jp:00064847","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100461118","pdf_url":null,"source":{"id":"https://openalex.org/S4377196385","display_name":"Tokyo Tech Research Repository (Tokyo Institute of Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I114531698","host_organization_name":"Tokyo Institute of Technology","host_organization_lineage":["https://openalex.org/I114531698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Journal Article"}],"best_oa_location":{"id":"doi:10.1143/jjap.32.6178","doi":"https://doi.org/10.1143/jjap.32.6178","is_oa":true,"landing_page_url":"https://doi.org/10.1143/jjap.32.6178","pdf_url":"https://iopscience.iop.org/article/10.1143/JJAP.32.6178/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321588","display_name":"Concordia University","ror":"https://ror.org/0420zvk78"},{"id":"https://openalex.org/F4320334593","display_name":"Natural Sciences and Engineering Research Council of Canada","ror":"https://ror.org/01h531d29"}],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2010544036.pdf","grobid_xml":"https://content.openalex.org/works/W2010544036.grobid-xml"},"referenced_works_count":8,"referenced_works":["https://openalex.org/W2008336548","https://openalex.org/W2015994651","https://openalex.org/W2019804329","https://openalex.org/W2024127060","https://openalex.org/W2055702928","https://openalex.org/W2063286727","https://openalex.org/W2065166869","https://openalex.org/W2155041181"],"related_works":["https://openalex.org/W2044504175","https://openalex.org/W2073110220","https://openalex.org/W2048389734","https://openalex.org/W2069387492","https://openalex.org/W2063286727","https://openalex.org/W2073417101","https://openalex.org/W2008336548","https://openalex.org/W2064318732","https://openalex.org/W1998593491","https://openalex.org/W1978043700"],"abstract_inverted_index":{"Cl2-based":[0],"digital":[1,79],"etching":[2,19,25,52,59,80,84],"of":[3,26,67,78],"GaAs":[4],"has":[5],"been":[6],"studied":[7],"using":[8],"a":[9,17],"248":[10],"nm":[11],"KrF":[12],"excimer":[13],"laser,":[14],"which":[15,32],"allowed":[16],"self-limited":[18],"reaction.":[20],"A":[21],"threshold":[22],"fluence":[23],"for":[24],"13":[27],"mJ/cm2":[28],"was":[29],"found,":[30],"above":[31],"the":[33,58,65,76],"etch":[34],"rate":[35],"abruptly":[36],"increases":[37],"and":[38,82],"finally":[39],"saturates":[40],"at":[41],"around":[42],"0.2":[43],"nm/cycle":[44],"from":[45],"20":[46],"to":[47,61,75],"33":[48],"mJ/cm2.":[49],"The":[50,70],"self-limiting":[51],"characteristics":[53],"can":[54],"be":[55,62],"explained":[56],"assuming":[57],"reaction":[60],"limited":[63],"by":[64],"amount":[66],"adsorbed":[68],"Cl2.":[69],"etched":[71],"depth":[72],"is":[73,85],"proportional":[74],"number":[77],"cycles,":[81],"atomic-order-controlled":[83],"achieved.":[86]},"counts_by_year":[{"year":2023,"cited_by_count":4},{"year":2021,"cited_by_count":3},{"year":2020,"cited_by_count":1},{"year":2017,"cited_by_count":6},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":3}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}