{"id":"https://openalex.org/W2010542496","doi":"https://doi.org/10.1088/1757-899x/45/1/012011","title":"Effect of annealing on structural properties of SiOx films obtained by HWCVD technique","display_name":"Effect of annealing on structural properties of SiOx films obtained by HWCVD technique","publication_year":2013,"publication_date":"2013-06-07","ids":{"openalex":"https://openalex.org/W2010542496","doi":"https://doi.org/10.1088/1757-899x/45/1/012011","mag":"2010542496"},"language":"en","primary_location":{"id":"doi:10.1088/1757-899x/45/1/012011","doi":"https://doi.org/10.1088/1757-899x/45/1/012011","is_oa":true,"landing_page_url":"https://doi.org/10.1088/1757-899x/45/1/012011","pdf_url":"https://iopscience.iop.org/article/10.1088/1757-899X/45/1/012011/pdf","source":{"id":"https://openalex.org/S4210189194","display_name":"IOP Conference Series Materials Science and Engineering","issn_l":"1757-8981","issn":["1757-8981","1757-899X"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":["jufo-1"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IOP Conference Series: Materials Science and Engineering","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W2010542496"],"child_works_count":0,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://iopscience.iop.org/article/10.1088/1757-899X/45/1/012011/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5024879099","display_name":"Antonio Coyopol","orcid":"https://orcid.org/0000-0001-5498-5640","observed_orcids":["https://orcid.org/0000-0001-5498-5640"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"A Coyopol","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112861768","display_name":"T. D\u00edaz","orcid":"https://orcid.org/0009-0005-3943-9066","observed_orcids":["https://orcid.org/0009-0005-3943-9066"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"T D\u00edaz","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"middle","author":{"id":null,"display_name":"G Garc\u00eda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"G Garc\u00eda","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","Ingenier\u00eda electr\u00f3nica (SNI 2)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":"Ingenier\u00eda electr\u00f3nica (SNI 2)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033351914","display_name":"Roberto L\u00f3pez","orcid":"https://orcid.org/0000-0001-8341-3684","observed_orcids":["https://orcid.org/0000-0001-8341-3684"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"R L\u00f3pez","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101476439","display_name":"Hector Ju\u00e1rez","orcid":"https://orcid.org/0000-0001-8058-4189","observed_orcids":["https://orcid.org/0000-0001-8058-4189"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"H Ju\u00e1rez","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039666421","display_name":"Enrique Rosendo","orcid":"https://orcid.org/0000-0003-3453-2753","observed_orcids":["https://orcid.org/0000-0003-3453-2753"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"E Rosendo","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073623018","display_name":"M. Pacio","orcid":"https://orcid.org/0000-0002-4053-9962","observed_orcids":["https://orcid.org/0000-0002-4053-9962"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"M Pacio","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5072506616","display_name":"Germ\u00e1n Escalante","orcid":"https://orcid.org/0000-0002-5900-4570","observed_orcids":["https://orcid.org/0000-0002-5900-4570"]},"institutions":[{"id":"https://openalex.org/I721619","display_name":"Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","ror":"https://ror.org/03p2z7827","country_code":"MX","type":"education","lineage":["https://openalex.org/I721619"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"G Escalante","raw_affiliation_strings":["CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico",", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CIDS-ICUAP, BUAP, Ciudad Universitaria, Ed. 103 D, Col. San Manuel, C.P. 72570, Puebla, M\u00e9xico","institution_ids":["https://openalex.org/I721619"]},{"raw_affiliation_string":", Benem\u00e9rita Universidad Aut\u00f3noma de Puebla","institution_ids":["https://openalex.org/I721619"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I721619"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":1,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"45","issue":null,"first_page":"012011","last_page":"012011"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11169","display_name":"Silicon Nanostructures and Photoluminescence","score":0.9848999977111816,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11169","display_name":"Silicon Nanostructures and Photoluminescence","score":0.9848999977111816,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.0020000000949949026,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.0019000000320374966,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/siox","display_name":"silicon oxide","score":0.7900000214576721},{"id":"https://openalex.org/keywords/hot-filament-chemical-vapor-deposition","display_name":"hot filament chemical vapor deposition","score":0.9480000138282776},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.8190000057220459},{"id":"https://openalex.org/keywords/annealing-atmosphere","display_name":"annealing atmosphere","score":0.7889999747276306},{"id":"https://openalex.org/keywords/nitrogen-annealing","display_name":"nitrogen annealing","score":0.7250000238418579},{"id":"https://openalex.org/keywords/silicon-nanocrystals","display_name":"silicon nanocrystals","score":0.9779999852180481},{"id":"https://openalex.org/keywords/crystalline-volume-fraction","display_name":"crystalline fraction","score":0.8830000162124634},{"id":"https://openalex.org/keywords/interface-defects","display_name":"interface defects","score":0.7749999761581421},{"id":"https://openalex.org/keywords/photoluminescence","display_name":"photoluminescence","score":0.984000027179718},{"id":"https://openalex.org/keywords/structural-properties","display_name":"structural properties","score":0.7179999947547913}],"concepts":[{"id":"https://openalex.org/C161368742","wikidata":"https://www.wikidata.org/wiki/Q874906","display_name":"High-resolution transmission electron microscopy","level":3,"score":0.8863080739974976},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.8088113069534302},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.785485565662384},{"id":"https://openalex.org/C40003534","wikidata":"https://www.wikidata.org/wiki/Q862228","display_name":"Raman spectroscopy","level":2,"score":0.773047685623169},{"id":"https://openalex.org/C85080765","wikidata":"https://www.wikidata.org/wiki/Q614893","display_name":"Photoluminescence","level":2,"score":0.7510534524917603},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.5964310765266418},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5808260440826416},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5756674408912659},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.44389185309410095},{"id":"https://openalex.org/C175854130","wikidata":"https://www.wikidata.org/wiki/Q98276914","display_name":"Nanocrystal","level":2,"score":0.4136795401573181},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3445194959640503},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.331410676240921},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.16541674733161926},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.13261356949806213},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.12144112586975098},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11321628093719482},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1088/1757-899x/45/1/012011","doi":"https://doi.org/10.1088/1757-899x/45/1/012011","is_oa":true,"landing_page_url":"https://doi.org/10.1088/1757-899x/45/1/012011","pdf_url":"https://iopscience.iop.org/article/10.1088/1757-899X/45/1/012011/pdf","source":{"id":"https://openalex.org/S4210189194","display_name":"IOP Conference Series Materials Science and Engineering","issn_l":"1757-8981","issn":["1757-8981","1757-899X"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":["jufo-1"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IOP Conference Series: Materials Science and Engineering","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1088/1757-899x/45/1/012011","doi":"https://doi.org/10.1088/1757-899x/45/1/012011","is_oa":true,"landing_page_url":"https://doi.org/10.1088/1757-899x/45/1/012011","pdf_url":"https://iopscience.iop.org/article/10.1088/1757-899X/45/1/012011/pdf","source":{"id":"https://openalex.org/S4210189194","display_name":"IOP Conference Series Materials Science and Engineering","issn_l":"1757-8981","issn":["1757-8981","1757-899X"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":["jufo-1"],"host_organization":"https://openalex.org/P4310320083","host_organization_name":"IOP Publishing","host_organization_lineage":["https://openalex.org/P4310320083","https://openalex.org/P4310311669"],"host_organization_lineage_names":["IOP Publishing","Institute of Physics"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IOP Conference Series: Materials Science and Engineering","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2010542496.pdf","grobid_xml":"https://content.openalex.org/works/W2010542496.grobid-xml"},"referenced_works_count":11,"referenced_works":["https://openalex.org/W1965188134","https://openalex.org/W1974976790","https://openalex.org/W2004923709","https://openalex.org/W2007351318","https://openalex.org/W2011753336","https://openalex.org/W2057810151","https://openalex.org/W2076820872","https://openalex.org/W2085675380","https://openalex.org/W2120430140","https://openalex.org/W2163810635","https://openalex.org/W4241116411"],"related_works":["https://openalex.org/W2082101239","https://openalex.org/W2039225052","https://openalex.org/W2065042360","https://openalex.org/W4389332428","https://openalex.org/W2373780638","https://openalex.org/W2794853125","https://openalex.org/W322284674","https://openalex.org/W2221459841","https://openalex.org/W4404197380","https://openalex.org/W2091519116"],"abstract_inverted_index":{"SiO":[0,164],"x":[1,165],"films":[2,48,84,92],"were":[3],"deposited":[4,47,83],"in":[5,27,73,81,108,128,163],"the":[6,42,46,74,82,90,94,102,115,119,129],"temperature":[7],"range":[8],"of":[9,38,45,53,89,96,104,134],"800\u20131000":[10],"\u00b0C":[11,126],"by":[12,51],"hot":[13],"wire":[14],"chemical":[15],"vapor":[16],"deposition":[17],"(HWCVD)":[18],"technique.":[19],"Annealing":[20],"treatment":[21,117],"for":[22],"as-deposited":[23,110,120],"samples":[24,121],"was":[25,49,154],"performed":[26],"nitrogen":[28],"(N":[29],"2":[30],")":[31,80],"atmosphere":[32,40],"at":[33,122],"1100":[34,150],"\u00b0C.":[35],"The":[36],"effect":[37],"annealing":[39,116],"on":[41,118],"structural":[43],"properties":[44],"investigated":[50],"means":[52],"micro":[54],"Raman,":[55],"X-ray":[56],"diffraction":[57],"(XRD),":[58],"Photoluminescence":[59],"(PL)":[60],"and":[61,111,124,159],"high":[62],"resolution":[63],"electron":[64],"microscopy":[65],"(HRTEM)":[66],"measurements.":[67],"Micro-Raman":[68],"studies":[69],"revealed":[70],"an":[71],"increase":[72],"crystalline":[75],"volume":[76],"fraction":[77],"(X":[78],"c":[79],"after":[85],"annealing.":[86],"XRD":[87],"patterns":[88],"annealed":[91,112],"showed":[93],"formation":[95],"silicon":[97,105],"crystals.":[98],"HRTEM":[99],"images":[100],"confirmed":[101],"presence":[103],"nanocrystals":[106],"(Si-ncs)":[107],"both":[109,157],"films.":[113,166],"Furthermore,":[114],"900":[123],"1000":[125],"resulted":[127],"observation":[130],"a":[131,144],"large":[132],"number":[133],"Si-ncs":[135,158],"with":[136,156],"sizes":[137],"between":[138],"3\u201315":[139],"nm.":[140,151],"PL":[141],"measurement":[142],"shows":[143],"broad":[145],"emission":[146,153],"from":[147],"400":[148],"to":[149],"This":[152],"related":[155],"interfacial":[160],"defects":[161],"present":[162]},"counts_by_year":[{"year":2017,"cited_by_count":1}],"updated_date":"2026-10-03T13:16:28.481748","created_date":"2016-06-24T00:00:00"}