{"id":"https://openalex.org/W2010517217","doi":"https://doi.org/10.1002/pssc.200982693","title":"Investigation of structural properties of high\u2010rate deposited SiNx films prepared at low temperatures (100\u2013300 \u00b0C) by atmospheric\u2010pressure plasma CVD","display_name":"Investigation of structural properties of high\u2010rate deposited SiNx films prepared at low temperatures (100\u2013300 \u00b0C) by atmospheric\u2010pressure plasma CVD","publication_year":2010,"publication_date":"2010-01-15","ids":{"openalex":"https://openalex.org/W2010517217","doi":"https://doi.org/10.1002/pssc.200982693","mag":"2010517217"},"language":"en","primary_location":{"id":"doi:10.1002/pssc.200982693","doi":"https://doi.org/10.1002/pssc.200982693","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pssc.200982693","pdf_url":null,"source":{"id":"https://openalex.org/S4210174949","display_name":"Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics","issn_l":"1610-1634","issn":["1610-1634","1610-1642","1862-6351"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-40"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"physica status solidi c","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5091673056","display_name":"Yuji Yamaguchi","orcid":"https://orcid.org/0000-0003-4338-2662","observed_orcids":["https://orcid.org/0000-0003-4338-2662"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Yamaguchi","raw_affiliation_strings":["Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2\u20101, Yamada\u2010oka, Suita City, Osaka 565\u20100871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2\u20101, Yamada\u2010oka, Suita City, Osaka 565\u20100871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113824710","display_name":"Kuniaki Nakamura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Nakamura","raw_affiliation_strings":["Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088173317","display_name":"Hiromasa Ohmi","orcid":"https://orcid.org/0000-0001-6827-6052","observed_orcids":["https://orcid.org/0000-0001-6827-6052"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Ohmi","raw_affiliation_strings":["Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058996204","display_name":"Hiroaki Kakiuchi","orcid":"https://orcid.org/0000-0003-4504-7219","observed_orcids":["https://orcid.org/0000-0003-4504-7219"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Kakiuchi","raw_affiliation_strings":["Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113726896","display_name":"Kiyoshi Yasutake","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Yasutake","raw_affiliation_strings":["Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita City, Osaka 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I98285908"],"apc_list":null,"apc_paid":null,"fwci":0.4897,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.6835963,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"7","issue":"3-4","first_page":"824","last_page":"827"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.36890000104904175,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.36890000104904175,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.186599999666214,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.16699999570846558,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-nitride-films","display_name":"silicon nitride thin films","score":0.9300000071525574},{"id":"https://openalex.org/keywords/low-temperature-deposition","display_name":"low-temperature deposition","score":0.9340000152587891},{"id":"https://openalex.org/keywords/high-rate-deposition","display_name":"high deposition rate","score":0.9829999804496765},{"id":"https://openalex.org/keywords/hydrogen-concentration","display_name":"hydrogen concentration","score":0.7549999952316284},{"id":"https://openalex.org/keywords/film-structural-properties","display_name":"film structural properties","score":0.5519999861717224},{"id":"https://openalex.org/keywords/refractive-index","display_name":"refractive index","score":0.9940000176429749},{"id":"https://openalex.org/keywords/substrate-temperature","display_name":"substrate temperature","score":0.6230000257492065}],"concepts":[{"id":"https://openalex.org/C200239111","wikidata":"https://www.wikidata.org/wiki/Q81809","display_name":"Atmospheric pressure","level":2,"score":0.6482328176498413},{"id":"https://openalex.org/C85344455","wikidata":"https://www.wikidata.org/wiki/Q757518","display_name":"Atmospheric-pressure plasma","level":3,"score":0.5850337743759155},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5767601132392883},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5545361638069153},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.44741737842559814},{"id":"https://openalex.org/C2984729377","wikidata":"https://www.wikidata.org/wiki/Q5757669","display_name":"High pressure","level":2,"score":0.44230595231056213},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3524714410305023},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.25948357582092285},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.20550477504730225},{"id":"https://openalex.org/C107872376","wikidata":"https://www.wikidata.org/wiki/Q321355","display_name":"Environmental chemistry","level":1,"score":0.1387442946434021},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.11196202039718628},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1087079644203186},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.07295900583267212},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/pssc.200982693","doi":"https://doi.org/10.1002/pssc.200982693","is_oa":false,"landing_page_url":"https://doi.org/10.1002/pssc.200982693","pdf_url":null,"source":{"id":"https://openalex.org/S4210174949","display_name":"Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics","issn_l":"1610-1634","issn":["1610-1634","1610-1642","1862-6351"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-40"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"physica status solidi c","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320334764","display_name":"Japan Society for the Promotion of Science","ror":"https://ror.org/00hhkn466"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2313227099","https://openalex.org/W2323807438","https://openalex.org/W2160086332","https://openalex.org/W3176081153","https://openalex.org/W1987117805","https://openalex.org/W1990377222","https://openalex.org/W2000874441","https://openalex.org/W2334755791","https://openalex.org/W2186699165","https://openalex.org/W2376894317"],"abstract_inverted_index":{"Abstract":[0],"We":[1],"have":[2],"investigated":[3],"the":[4,58,71,81,132,145,150,167],"structural":[5],"properties":[6],"of":[7,74,115,122,137,152,169],"silicon":[8],"nitride":[9],"(SiNx)":[10],"films":[11,46,180],"deposited":[12],"at":[13,126,184],"low":[14],"temperatures":[15,186],"(100\u2013300":[16],"\u00b0C":[17,130],"with":[18,166,181],"very":[19,33,133],"high":[20,134,182],"rates":[21,183],"(>50":[22],"nm/s)":[23],"in":[24,57,80,147],"atmospheric\u2010pressure":[25],"He/H2/SiH4/NH3":[26],"plasma":[27,59],"excited":[28],"by":[29,87,158],"a":[30,38,111,119],"150":[31],"MHz":[32],"high\u2010frequency":[34],"(VHF)":[35],"power":[36,161],"using":[37],"cylindrical":[39],"rotary":[40],"electrode.":[41],"For":[42],"this":[43],"purpose,":[44],"SiNx":[45,179],"are":[47],"prepared":[48],"on":[49],"Si(001)":[50],"wafers":[51],"varying":[52],"NH3/SiH4":[53,89],"ratio,":[54],"H2":[55,93,163],"concentration":[56,164],"and":[60,77,96,118],"substrate":[61],"temperature":[62],"(Tsub).":[63],"Infrared":[64],"absorption":[65],"spectroscopy":[66],"is":[67,84,124,142],"used":[68],"to":[69,176],"analyze":[70],"bonding":[72],"configurations":[73],"Si,":[75],"N":[76],"H":[78],"atoms":[79],"films.":[82],"It":[83],"shown":[85],"that":[86,144],"decreasing":[88],"ratio":[90],"or":[91],"increasing":[92,159],"concentration,":[94],"Si\u2013N":[95],"Si\u2013H":[97],"bond":[98,103],"densities":[99],"increase,":[100],"while":[101],"N\u2013H":[102],"density":[104],"decreases.":[105],"A":[106],"reasonably":[107],"good\u2010quality":[108],"film":[109,153],"showing":[110],"BHF":[112],"etching":[113],"rate":[114,136],"28":[116],"nm/min":[117],"refractive":[120],"index":[121],"1.81":[123],"obtained":[125],"Tsub":[127,148],"=":[128],"300":[129],"despite":[131],"deposition":[135,171],"166":[138],"nm/s.":[139],"However,":[140],"it":[141],"found":[143],"decrease":[146],"causes":[149],"deterioration":[151],"quality.":[154],"Further":[155],"surface":[156],"excitation":[157],"VHF":[160],"and/or":[162],"together":[165],"optimization":[168],"other":[170],"parameters":[172],"will":[173],"be":[174],"needed":[175],"form":[177],"high\u2010quality":[178],"lower":[185],"(Tsub":[187],"\u2264":[188],"100":[189],"\u00b0C).":[190],"(\u00a9":[191],"2010":[192],"WILEY\u2010VCH":[193],"Verlag":[194],"GmbH":[195],"&":[196],"Co.":[197],"KGaA,":[198],"Weinheim)":[199]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}