{"id":"https://openalex.org/W2010378341","doi":"https://doi.org/10.1016/s0042-207x(01)00475-4","title":"Influence of high power densities on the composition of pulsed magnetron plasmas","display_name":"Influence of high power densities on the composition of pulsed magnetron plasmas","publication_year":2002,"publication_date":"2002-04-01","ids":{"openalex":"https://openalex.org/W2010378341","doi":"https://doi.org/10.1016/s0042-207x(01)00475-4","mag":"2010378341"},"language":"en","primary_location":{"id":"doi:10.1016/s0042-207x(01)00475-4","doi":"https://doi.org/10.1016/s0042-207x(01)00475-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0042-207x(01)00475-4","pdf_url":null,"source":{"id":"https://openalex.org/S86481247","display_name":"Vacuum","issn_l":"0042-207X","issn":["0042-207X","1879-2715"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Vacuum","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5005636385","display_name":"Arutiun Papken Ehiasarian","orcid":"https://orcid.org/0000-0001-6080-3946","observed_orcids":["https://orcid.org/0000-0001-6080-3946"]},"institutions":[{"id":"https://openalex.org/I71422933","display_name":"Sheffield Hallam University","ror":"https://ror.org/019wt1929","country_code":"GB","type":"education","lineage":["https://openalex.org/I71422933"]}],"countries":["GB"],"is_corresponding":true,"raw_author_name":"A.P. Ehiasarian","raw_affiliation_strings":["Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK","institution_ids":["https://openalex.org/I71422933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110171405","display_name":"Roger New","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I71422933","display_name":"Sheffield Hallam University","ror":"https://ror.org/019wt1929","country_code":"GB","type":"education","lineage":["https://openalex.org/I71422933"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"R. New","raw_affiliation_strings":["Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK","institution_ids":["https://openalex.org/I71422933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110329521","display_name":"W.\u2010D. M\u00fcnz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I71422933","display_name":"Sheffield Hallam University","ror":"https://ror.org/019wt1929","country_code":"GB","type":"education","lineage":["https://openalex.org/I71422933"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"W.-D. M\u00fcnz","raw_affiliation_strings":["Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK","institution_ids":["https://openalex.org/I71422933"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086073947","display_name":"Lars Hultman","orcid":"https://orcid.org/0000-0002-2837-3656","observed_orcids":["https://orcid.org/0000-0002-2837-3656"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"L. Hultman","raw_affiliation_strings":["Thin Film Physics Division, Department of Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Physics Division, Department of Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034910199","display_name":"Ulf Helmersson","orcid":"https://orcid.org/0000-0002-1744-7322","observed_orcids":["https://orcid.org/0000-0002-1744-7322"]},"institutions":[{"id":"https://openalex.org/I102134673","display_name":"Link\u00f6ping University","ror":"https://ror.org/05ynxx418","country_code":"SE","type":"education","lineage":["https://openalex.org/I102134673"]}],"countries":["SE"],"is_corresponding":false,"raw_author_name":"U. Helmersson","raw_affiliation_strings":["Thin Film Physics Division, Department of Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Thin Film Physics Division, Department of Physics, Link\u00f6ping University, SE-581 83 Link\u00f6ping, Sweden","institution_ids":["https://openalex.org/I102134673"]}]},{"author_position":"last","author":{"id":null,"display_name":"V. Kouznetsov","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"V. Kouznetsov","raw_affiliation_strings":["Chemfilt R&D AB, Kumla G\u00e5rdsv\u00e4gen 28, SE-145 63 Norsborg, Sweden"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chemfilt R&D AB, Kumla G\u00e5rdsv\u00e4gen 28, SE-145 63 Norsborg, Sweden","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5005636385"],"corresponding_institution_ids":["https://openalex.org/I71422933"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":8.7798,"has_fulltext":false,"cited_by_count":319,"citation_normalized_percentile":{"value":0.98031672,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":98,"max":100},"biblio":{"volume":"65","issue":"2","first_page":"147","last_page":"154"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9140999913215637,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9140999913215637,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.05719999969005585,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.01730000041425228,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/pulsed-magnetron-sputtering","display_name":"pulsed magnetron sputtering","score":0.9440000057220459},{"id":"https://openalex.org/keywords/high-power-density","display_name":"high power density","score":0.8299999833106995},{"id":"https://openalex.org/keywords/self-sputtering","display_name":"self-sputtering","score":0.8809999823570251},{"id":"https://openalex.org/keywords/titanium-cathode","display_name":"titanium cathode","score":0.9990000128746033},{"id":"https://openalex.org/keywords/plasma-composition","display_name":"plasma composition","score":0.5299999713897705},{"id":"https://openalex.org/keywords/optical-emission-spectroscopy","display_name":"optical emission spectroscopy","score":0.8019999861717224},{"id":"https://openalex.org/keywords/glow-to-arc-transition","display_name":"glow-to-arc transition","score":0.8199999928474426},{"id":"https://openalex.org/keywords/deposition-rate","display_name":"deposition rate","score":0.41499999165534973}],"concepts":[{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.695880651473999},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.6905549764633179},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.6555378437042236},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.6188206672668457},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5421238541603088},{"id":"https://openalex.org/C2781083372","wikidata":"https://www.wikidata.org/wiki/Q7259687","display_name":"Pulsed DC","level":5,"score":0.531367301940918},{"id":"https://openalex.org/C49110097","wikidata":"https://www.wikidata.org/wiki/Q175233","display_name":"Cathode","level":2,"score":0.5260816812515259},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.5247364640235901},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.5138976573944092},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.5001153945922852},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.472110390663147},{"id":"https://openalex.org/C21881925","wikidata":"https://www.wikidata.org/wiki/Q3503313","display_name":"Power density","level":3,"score":0.4130488932132721},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.3585958480834961},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.16130051016807556},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.12292453646659851},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.07142877578735352},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.06891128420829773},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/s0042-207x(01)00475-4","doi":"https://doi.org/10.1016/s0042-207x(01)00475-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0042-207x(01)00475-4","pdf_url":null,"source":{"id":"https://openalex.org/S86481247","display_name":"Vacuum","issn_l":"0042-207X","issn":["0042-207X","1879-2715"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Vacuum","raw_type":"journal-article"},{"id":"pmh:oai:shura.shu.ac.uk:581","doi":null,"is_oa":false,"landing_page_url":"http://shura.shu.ac.uk/581/","pdf_url":null,"source":{"id":"https://openalex.org/S4306401600","display_name":"SHURA (Sheffield Hallam University Research Archive) (Sheffield Hallam University)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I71422933","host_organization_name":"Sheffield Hallam University","host_organization_lineage":["https://openalex.org/I71422933"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320334627","display_name":"Engineering and Physical Sciences Research Council","ror":"https://ror.org/0439y7842"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1590629927","https://openalex.org/W1644917503","https://openalex.org/W1678669050","https://openalex.org/W1963495660","https://openalex.org/W1975328259","https://openalex.org/W2004982340","https://openalex.org/W2037521233","https://openalex.org/W2051944828","https://openalex.org/W2052948173","https://openalex.org/W2060004838","https://openalex.org/W2083590781","https://openalex.org/W2495830536"],"related_works":["https://openalex.org/W2004982340","https://openalex.org/W2057693531","https://openalex.org/W2051944828","https://openalex.org/W2002109264","https://openalex.org/W2155953074","https://openalex.org/W88137971","https://openalex.org/W2038552558","https://openalex.org/W3196699482","https://openalex.org/W2065590950","https://openalex.org/W4400608852"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":9},{"year":2025,"cited_by_count":13},{"year":2024,"cited_by_count":6},{"year":2023,"cited_by_count":13},{"year":2022,"cited_by_count":15},{"year":2021,"cited_by_count":8},{"year":2020,"cited_by_count":12},{"year":2019,"cited_by_count":9},{"year":2018,"cited_by_count":11},{"year":2017,"cited_by_count":11},{"year":2016,"cited_by_count":24},{"year":2015,"cited_by_count":8},{"year":2014,"cited_by_count":17},{"year":2013,"cited_by_count":16},{"year":2012,"cited_by_count":19}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}