{"id":"https://openalex.org/W2010301994","doi":"https://doi.org/10.1117/12.2046254","title":"Manufacturability improvements in EUV resist processing toward NXE:3300 processing","display_name":"Manufacturability improvements in EUV resist processing toward NXE:3300 processing","publication_year":2014,"publication_date":"2014-03-27","ids":{"openalex":"https://openalex.org/W2010301994","doi":"https://doi.org/10.1117/12.2046254","mag":"2010301994"},"language":"en","primary_location":{"id":"doi:10.1117/12.2046254","doi":"https://doi.org/10.1117/12.2046254","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046254","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5012392064","display_name":"Yuhei Kuwahara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yuhei Kuwahara","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109204149","display_name":"Koichi Matsunaga","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Koichi Matsunaga","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007575429","display_name":"Takeshi Shimoaoki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeshi Shimoaoki","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080778643","display_name":"Shinichiro Kawakami","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinichiro Kawakami","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039538018","display_name":"Kathleen Nafus","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kathleen Nafus","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083825087","display_name":"Philippe Foubert","orcid":"https://orcid.org/0000-0002-2161-0436","observed_orcids":["https://orcid.org/0000-0002-2161-0436"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Philippe Foubert","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110035731","display_name":"Anne Marie Goethals","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Anne-Marie Goethals","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5075010640","display_name":"Satoru Shimura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405273698","display_name":"Tokyo Electron Kyushu Ltd (Japan)","ror":"https://ror.org/00a611q12","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Satoru Shimura","raw_affiliation_strings":["Tokyo Electron Kyushu Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Electron Kyushu Ltd. (Japan)","institution_ids":["https://openalex.org/I4405273698"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.2033,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.71617702,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"9051","issue":null,"first_page":"905108","last_page":"905108"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.8980000019073486},{"id":"https://openalex.org/keywords/manufacturability","display_name":"manufacturability","score":0.8059999942779541},{"id":"https://openalex.org/keywords/defect-reduction","display_name":"defect reduction","score":0.621999979019165},{"id":"https://openalex.org/keywords/defectivity","display_name":"defectivity","score":0.5720000267028809},{"id":"https://openalex.org/keywords/contact-holes","display_name":"contact holes","score":0.6660000085830688},{"id":"https://openalex.org/keywords/line-and-space-patterns","display_name":"line/space patterning","score":0.7459999918937683},{"id":"https://openalex.org/keywords/asml","display_name":"ASML","score":0.44600000977516174},{"id":"https://openalex.org/keywords/imec","display_name":"IMEC","score":0.7889999747276306}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9829206466674805},{"id":"https://openalex.org/C62064638","wikidata":"https://www.wikidata.org/wiki/Q553878","display_name":"Design for manufacturability","level":2,"score":0.90250563621521},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.8104666471481323},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7856910228729248},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.7175601124763489},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6134048104286194},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.513105034828186},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.5090174674987793},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4403592646121979},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.43564873933792114},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.43040403723716736},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4224066734313965},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.32894736528396606},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.27705103158950806},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.15146619081497192},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1413293182849884},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.12128669023513794},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2046254","doi":"https://doi.org/10.1117/12.2046254","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046254","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.5378999710083008}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W2018539320","https://openalex.org/W2075387672"],"related_works":["https://openalex.org/W2006500427","https://openalex.org/W2321868307","https://openalex.org/W2078955910","https://openalex.org/W2603606266","https://openalex.org/W2020276143","https://openalex.org/W2323364424","https://openalex.org/W2790844187","https://openalex.org/W2075387672","https://openalex.org/W2767002202","https://openalex.org/W1998504152"],"abstract_inverted_index":{"As":[0],"the":[1,28,52,56,76,89,108,118],"design":[2],"rule":[3],"of":[4,59,75,88],"semiconductor":[5],"process":[6,19],"gets":[7],"finer,":[8],"extreme":[9],"ultraviolet":[10],"lithography":[11,48],"(EUVL)":[12],"technology":[13],"is":[14,84],"aggressively":[15],"studied":[16],"as":[17],"a":[18,61],"for":[20,30,70,121],"22nm":[21],"half":[22,58],"pitch":[23],"and":[24,42,114,124],"beyond.":[25],"At":[26],"present,":[27],"studies":[29],"EUV":[31],"focus":[32],"on":[33,107],"manufacturability.":[34],"It":[35],"requires":[36],"fine":[37],"resolution,":[38],"uniform,":[39],"smooth":[40],"patterns":[41],"low":[43,101],"defectivity,":[44],"not":[45],"only":[46],"after":[47,51],"but":[49],"also":[50],"etch":[53],"process.":[54],"In":[55],"first":[57],"2013,":[60],"CLEAN":[62],"TRACKTM":[63],"LITHIUS":[64],"ProTMZ-EUV":[65],"was":[66],"installed":[67],"at":[68,127],"imec":[69],"POR":[71,120],"development":[72],"in":[73],"preparation":[74],"ASML":[77],"NXE:3300.":[78],"This":[79,94,104],"next":[80],"generation":[81],"coating/developing":[82],"system":[83],"equipped":[85],"with":[86,96],"state":[87],"art":[90],"defect":[91,102],"reduction":[92],"technology.":[93],"tool":[95],"advanced":[97],"functions":[98],"can":[99],"achieve":[100],"levels.":[103],"paper":[105],"reports":[106],"progress":[109],"towards":[110,117],"manufacturing":[111],"defectivity":[112],"levels":[113],"latest":[115],"optimizations":[116],"NXE:3300":[119],"both":[122],"lines/spaces":[123],"contact":[125],"holes":[126],"imec.":[128]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":2}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}