{"id":"https://openalex.org/W2010264394","doi":"https://doi.org/10.1117/12.435732","title":"Impact of acid/quencher behavior on lithography performance","display_name":"Impact of acid/quencher behavior on lithography performance","publication_year":2001,"publication_date":"2001-09-14","ids":{"openalex":"https://openalex.org/W2010264394","doi":"https://doi.org/10.1117/12.435732","mag":"2010264394"},"language":"en","primary_location":{"id":"doi:10.1117/12.435732","doi":"https://doi.org/10.1117/12.435732","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.435732","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5051034795","display_name":"Hiroshi Fukuda","orcid":"https://orcid.org/0000-0002-8859-8937","observed_orcids":["https://orcid.org/0000-0002-8859-8937"]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Fukuda","raw_affiliation_strings":["Hitachi Ltd./Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi Ltd./Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000327977","display_name":"Keiko T. Hattori","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Keiko T. Hattori","raw_affiliation_strings":["Hitachi Ltd./Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi Ltd./Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113879874","display_name":"Takuya Hagiwara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takuya Hagiwara","raw_affiliation_strings":["Hitachi Ltd./Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi Ltd./Japan","institution_ids":["https://openalex.org/I65143321"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I65143321"],"apc_list":null,"apc_paid":null,"fwci":2.5955,"has_fulltext":false,"cited_by_count":28,"citation_normalized_percentile":{"value":0.88800732,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"4346","issue":null,"first_page":"319","last_page":"319"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/chemically-amplified-resists","display_name":"chemically amplified resists","score":0.7559999823570251},{"id":"https://openalex.org/keywords/proximity-effect","display_name":"proximity effect","score":0.7960000038146973},{"id":"https://openalex.org/keywords/acid-diffusion","display_name":"acid diffusion","score":0.39899998903274536}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7122640609741211},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.522215723991394},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.46407344937324524},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3852023482322693},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2946205139160156},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.28670549392700195},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.21682628989219666},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.435732","doi":"https://doi.org/10.1117/12.435732","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.435732","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2078158236","https://openalex.org/W2048761466","https://openalex.org/W2085140120","https://openalex.org/W2089150491","https://openalex.org/W2034086581","https://openalex.org/W2004509975","https://openalex.org/W2080441938","https://openalex.org/W1976552925","https://openalex.org/W2028342082","https://openalex.org/W2234248628"],"abstract_inverted_index":{"To":[0],"describe":[1],"complex":[2],"acid/quencher":[3],"interaction":[4],"and":[5,62],"their":[6],"mutual":[7,18],"diffusion":[8,49],"in":[9],"imaging":[10],"with":[11],"chemically":[12],"amplified":[13],"resist":[14,26],"films,":[15],"our":[16],"acid-quencher":[17],"diffusion/quenching":[19],"model":[20,45],"is":[21],"implemented":[22],"to":[23],"the":[24],"fast":[25],"image":[27],"simulator.":[28],"Accuracy":[29],"better":[30],"than":[31],"10-nm":[32],"was":[33],"obtained":[34],"over":[35],"wide":[36],"varieties":[37],"of":[38,50,56],"0.13-":[39],"node":[40],"metal-level":[41],"pattern":[42],"features.":[43],"The":[44],"also":[46],"suggested":[47],"that":[48,55],"quencher,":[51],"as":[52,54],"well":[53],"acid,":[57],"significantly":[58],"degrades":[59],"proximity":[60],"effects":[61],"MEF.":[63]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":5},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":3},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}