{"id":"https://openalex.org/W2010043636","doi":"https://doi.org/10.1117/12.598838","title":"DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip","display_name":"DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip","publication_year":2005,"publication_date":"2005-05-05","ids":{"openalex":"https://openalex.org/W2010043636","doi":"https://doi.org/10.1117/12.598838","mag":"2010043636"},"language":"en","primary_location":{"id":"doi:10.1117/12.598838","doi":"https://doi.org/10.1117/12.598838","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.598838","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109967919","display_name":"Chun-Chi Yu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210161555","display_name":"United Microelectronics (Taiwan)","ror":"https://ror.org/0580qje17","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Chun-Chi Yu","raw_affiliation_strings":["UMC (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UMC (Taiwan)","institution_ids":["https://openalex.org/I4210161555"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041928716","display_name":"Ming-Feng Shieh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210161555","display_name":"United Microelectronics (Taiwan)","ror":"https://ror.org/0580qje17","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Ming-Feng Shieh","raw_affiliation_strings":["UMC (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UMC (Taiwan)","institution_ids":["https://openalex.org/I4210161555"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000152472","display_name":"Erick Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210161555","display_name":"United Microelectronics (Taiwan)","ror":"https://ror.org/0580qje17","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Erick Liu","raw_affiliation_strings":["UMC (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UMC (Taiwan)","institution_ids":["https://openalex.org/I4210161555"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111780822","display_name":"Benjamin Szu-Min Lin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210161555","display_name":"United Microelectronics (Taiwan)","ror":"https://ror.org/0580qje17","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Benjamin Lin","raw_affiliation_strings":["UMC (Taiwan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UMC (Taiwan)","institution_ids":["https://openalex.org/I4210161555"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059500986","display_name":"Henry Lin","orcid":"https://orcid.org/0000-0002-3912-6490","observed_orcids":["https://orcid.org/0000-0002-3912-6490"]},"institutions":[{"id":"https://openalex.org/I4210088951","display_name":"Synopsys (United States)","ror":"https://ror.org/013by2m91","country_code":"US","type":"company","lineage":["https://openalex.org/I4210088951"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Henry Lin","raw_affiliation_strings":["Synopsys Inc, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Synopsys Inc, United States","institution_ids":["https://openalex.org/I4210088951"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030712916","display_name":"Manoj Chacko","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210088951","display_name":"Synopsys (United States)","ror":"https://ror.org/013by2m91","country_code":"US","type":"company","lineage":["https://openalex.org/I4210088951"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Manoj Chacko","raw_affiliation_strings":["Synopsys Inc, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Synopsys Inc, United States","institution_ids":["https://openalex.org/I4210088951"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100606922","display_name":"Xiaoyang Li","orcid":"https://orcid.org/0000-0002-4046-2934","observed_orcids":["https://orcid.org/0000-0002-4046-2934","https://orcid.org/0000-0002-6584-6926"]},"institutions":[{"id":"https://openalex.org/I4210088951","display_name":"Synopsys (United States)","ror":"https://ror.org/013by2m91","country_code":"US","type":"company","lineage":["https://openalex.org/I4210088951"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xiaoyang Li","raw_affiliation_strings":["Synopsys Inc, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Synopsys Inc, United States","institution_ids":["https://openalex.org/I4210088951"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060645078","display_name":"Wen-Kang Lei","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210088951","display_name":"Synopsys (United States)","ror":"https://ror.org/013by2m91","country_code":"US","type":"company","lineage":["https://openalex.org/I4210088951"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Wen-Kang Lei","raw_affiliation_strings":["Synopsys Inc, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Synopsys Inc, United States","institution_ids":["https://openalex.org/I4210088951"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Jonathan Ho","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I32923980","display_name":"Xilinx (United States)","ror":"https://ror.org/01rb7bk56","country_code":"US","type":"company","lineage":["https://openalex.org/I32923980"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jonathan Ho","raw_affiliation_strings":["Xilinx, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Xilinx, Inc. (United States)","institution_ids":["https://openalex.org/I32923980"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111714809","display_name":"Xin Wu","orcid":"https://orcid.org/0009-0000-1056-1918","observed_orcids":["https://orcid.org/0009-0000-1056-1918"]},"institutions":[{"id":"https://openalex.org/I32923980","display_name":"Xilinx (United States)","ror":"https://ror.org/01rb7bk56","country_code":"US","type":"company","lineage":["https://openalex.org/I32923980"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xin Wu","raw_affiliation_strings":["Xilinx, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Xilinx, Inc. (United States)","institution_ids":["https://openalex.org/I32923980"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.5628,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.62210898,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"5756","issue":null,"first_page":"262","last_page":"262"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9824000000953674,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9824000000953674,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.009499999694526196,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","score":0.0024999999441206455,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/design-for-manufacturing","display_name":"design for manufacturing","score":0.8069999814033508},{"id":"https://openalex.org/keywords/alternating-phase-shifting-masks","display_name":"alternating phase-shifting masks","score":0.7929999828338623},{"id":"https://openalex.org/keywords/resolution-enhancement-techniques","display_name":"resolution enhancement techniques","score":0.7879999876022339},{"id":"https://openalex.org/keywords/phase-shifting-masks","display_name":"phase-shifting masks","score":0.6039999723434448},{"id":"https://openalex.org/keywords/mask-synthesis","display_name":"mask synthesis","score":0.6399999856948853},{"id":"https://openalex.org/keywords/phase-topology","display_name":"phase topology","score":0.6330000162124634},{"id":"https://openalex.org/keywords/eda-tools","display_name":"EDA tools","score":0.5759999752044678},{"id":"https://openalex.org/keywords/critical-dimension-control","display_name":"critical dimension control","score":0.6000000238418579},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.6809999942779541},{"id":"https://openalex.org/keywords/sub-resolution-assist-features","display_name":"sub-resolution assist features","score":0.9440000057220459}],"concepts":[{"id":"https://openalex.org/C62064638","wikidata":"https://www.wikidata.org/wiki/Q553878","display_name":"Design for manufacturability","level":2,"score":0.928656816482544},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.697521984577179},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.524692952632904},{"id":"https://openalex.org/C42935608","wikidata":"https://www.wikidata.org/wiki/Q190411","display_name":"Field-programmable gate array","level":2,"score":0.45395582914352417},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.45057588815689087},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.3955283761024475},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.33118629455566406},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.15360695123672485},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.11189678311347961},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.09847262501716614}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.598838","doi":"https://doi.org/10.1117/12.598838","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.598838","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1988548799","https://openalex.org/W2150305311","https://openalex.org/W7096198102","https://openalex.org/W4255629363","https://openalex.org/W1987558867","https://openalex.org/W1985033513","https://openalex.org/W2005005390","https://openalex.org/W2088294739","https://openalex.org/W2355128254","https://openalex.org/W2091005667"],"abstract_inverted_index":{"At":[0],"the":[1,27,48,54,59,85,118,126,152,157,178,194,204,221,226],"sub":[2],"90nm":[3],"nodes,":[4],"resolution":[5],"enhancement":[6],"techniques":[7],"(RETs)":[8],"such":[9],"as":[10],"optical":[11],"proximity":[12],"correction":[13],"(OPC),":[14],"phase-shifting":[15],"masks":[16],"(PSM),":[17],"sub-resolution":[18],"assist":[19],"features":[20],"(SRAF)":[21],"have":[22,44,50],"become":[23],"essential":[24],"steps":[25],"in":[26,117,145,151,183,229],"post-physical":[28],"verification":[29],"'Mask":[30],"Synthesis'":[31],"process":[32,143,172],"and":[33,47,56,67,89,99,113,120,174,207,211,223],"a":[34,93,140,160,170],"key":[35],"component":[36],"of":[37,58,62,80,106,163,193],"design":[38,164],"for":[39,125,139,169],"manufacturing":[40,87],"(DFM).":[41],"Several":[42],"studies":[43],"been":[45,51,123],"conducted":[46],"results":[49,228],"published":[52],"on":[53,64,203],"implication":[55],"application":[57],"different":[60],"types":[61],"RETs":[63],"mask":[65,86],"printability":[66],"costs.":[68],"More":[69],"specifically,":[70],"double-exposure-based,":[71],"dark-field,":[72],"alternating":[73],"PSM":[74],"(Alt-PSM)":[75],"technology":[76,127],"has":[77,122],"received":[78],"lot":[79],"attention":[81],"with":[82,129],"respect":[83],"to":[84,166,197,216],"challenges":[88,196],"its":[90,97,167,201],"implementation":[91],"into":[92],"production":[94,142],"flow,":[95,206],"despite":[96],"yield":[98],"critical":[100],"dimension":[101],"(CD)":[102],"control":[103],"superiority.":[104],"Implementation":[105],"Alt-PSM":[107,182],"generally":[108],"requires":[109],"phase":[110,115,218],"compliance":[111],"rules":[112,131,165],"proper":[114],"topology":[116],"layout":[119],"this":[121,134,146],"successful":[124],"node":[128],"these":[130],"implemented.":[132],"However,":[133],"may":[135],"not":[136,176],"be":[137],"true":[138],"matured,":[141],"technology,":[144,173],"case":[147],"90":[148],"nm.":[149],"Especially,":[150],"foundry-fabless":[153],"business":[154],"model":[155],"where":[156,175],"foundry":[158,179],"provides":[159],"standard":[161],"set":[162],"customers":[168,180],"given":[171],"all":[177],"require":[181],"their":[184],"tapeout":[185,205,220],"flow.":[186],"What":[187],"follows":[188],"is":[189],"an":[190],"in-depth":[191],"review":[192],"DFM":[195],"each":[198],"partner":[199],"faced,":[200],"effect":[202],"how":[208],"design,":[209],"manufacturing,":[210],"EDA":[212],"teams":[213],"worked":[214],"together":[215],"resolve":[217],"conflicts,":[219],"chip,":[222],"finally":[224],"verify":[225],"silicon":[227],"production.":[230]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}