{"id":"https://openalex.org/W2009592274","doi":"https://doi.org/10.1117/12.896883","title":"MSB for ILT masks","display_name":"MSB for ILT masks","publication_year":2011,"publication_date":"2011-02-02","ids":{"openalex":"https://openalex.org/W2009592274","doi":"https://doi.org/10.1117/12.896883","mag":"2009592274"},"language":"de","primary_location":{"id":"doi:10.1117/12.896883","doi":"https://doi.org/10.1117/12.896883","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.896883","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5060858315","display_name":"Juergen Gramss","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Juergen Gramss","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030503320","display_name":"Ulf Weidenmueller","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Ulf Weidenmueller","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033078323","display_name":"Arnd Stoeckel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Arnd Stoeckel","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051785604","display_name":"Renate Jaritz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Renate Jaritz","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081262239","display_name":"Hans-Joachim Doering","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Hans-Joachim Doering","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5048654849","display_name":"Monika Boettcher","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Monika Boettcher","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210126143"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.09553587,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"7985","issue":null,"first_page":"798504","last_page":"798504"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/inverse-lithography","display_name":"inverse lithography technology","score":0.9279999732971191},{"id":"https://openalex.org/keywords/22-nm-node","display_name":"22 nm technology node","score":0.9160000085830688},{"id":"https://openalex.org/keywords/exposure-simulation","display_name":"exposure simulation","score":0.4970000088214874},{"id":"https://openalex.org/keywords/fracturing","display_name":"fracturing","score":0.7229999899864197},{"id":"https://openalex.org/keywords/electron-optical-column","display_name":"electron optical column","score":0.6710000038146973},{"id":"https://openalex.org/keywords/xy-stage","display_name":"XY stage","score":0.48100000619888306}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.8223697543144226},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6683211326599121},{"id":"https://openalex.org/C62611344","wikidata":"https://www.wikidata.org/wiki/Q1062658","display_name":"Node (physics)","level":2,"score":0.5938480496406555},{"id":"https://openalex.org/C157764524","wikidata":"https://www.wikidata.org/wiki/Q1383412","display_name":"Throughput","level":3,"score":0.47488659620285034},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.46730566024780273},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.429363489151001},{"id":"https://openalex.org/C177264268","wikidata":"https://www.wikidata.org/wiki/Q1514741","display_name":"Set (abstract data type)","level":2,"score":0.41949349641799927},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.40555474162101746},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.1899299919605255},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.17453154921531677},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.16248437762260437},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11087137460708618},{"id":"https://openalex.org/C555944384","wikidata":"https://www.wikidata.org/wiki/Q249","display_name":"Wireless","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.896883","doi":"https://doi.org/10.1117/12.896883","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.896883","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2030916872","https://openalex.org/W2091275358","https://openalex.org/W1972468615","https://openalex.org/W2034814639","https://openalex.org/W2038180974","https://openalex.org/W2045691181","https://openalex.org/W2085567368","https://openalex.org/W1969331122","https://openalex.org/W2042748824","https://openalex.org/W2126624870"],"abstract_inverted_index":{"Multi":[0],"Shaped":[1],"Beam":[2],"(MSB)":[3],"throughput":[4],"simulation":[5],"results":[6,43,116],"have":[7],"already":[8],"been":[9,31,106],"published":[10],"in":[11,33],"the":[12,27,59,92,125,150],"past.":[13],"An":[14],"IC":[15],"mask":[16,102],"set":[17],"of":[18,26,44,94,117],"a":[19,145],"32nm":[20],"node":[21],"logic":[22],"device":[23],"was":[24,73],"one":[25],"applications":[28],"that":[29],"had":[30],"analyzed":[32],"more":[34],"detail.":[35],"In":[36],"this":[37],"paper":[38],"we":[39,67,132],"want":[40],"to":[41],"highlight":[42],"shot":[45,99],"count":[46,100],"and":[47,79,101,110,122,149],"write":[48,103],"time":[49,104],"evaluations":[50],"done":[51],"for":[52,69,134],"Inverse":[53],"Lithography":[54],"Technology":[55],"(ILT)":[56],"masks":[57],"targeting":[58],"22nm":[60],"technology":[61],"node.":[62],"The":[63,128],"test":[64],"pattern":[65,118],"data":[66,152],"used":[68,133],"these":[70],"practice-oriented":[71],"analyses":[72],"designed":[74],"by":[75,81],"DNP":[76],"/":[77,85],"Japan":[78],"created":[80],"Luminescent":[82],"Technologies,":[83],"Inc.":[84],"USA.":[86],"To":[87],"achieve":[88],"reliable":[89],"evaluation":[90],"results,":[91],"influence":[93],"different":[95],"MSB":[96,129,151],"configurations":[97],"on":[98],"has":[105],"taken":[107],"into":[108],"account":[109],"will":[111],"be":[112],"discussed":[113],"here.":[114],"Exposure":[115],"details":[119],"are":[120],"presented":[121],"compared":[123],"with":[124],"fracturing":[126],"result.":[127],"engineering":[130],"tool":[131],"our":[135],"investigations":[136],"covers":[137],"such":[138],"major":[139],"components":[140],"like":[141],"an":[142],"electron-optical":[143],"column,":[144],"precision":[146],"x/y":[147],"stage":[148],"path.":[153]},"counts_by_year":[],"updated_date":"2026-07-30T17:31:21.811387","created_date":"2016-06-24T00:00:00"}