{"id":"https://openalex.org/W2008577655","doi":"https://doi.org/10.1063/1.1829787","title":"Interstitial charge states in boron-implanted silicon","display_name":"Interstitial charge states in boron-implanted silicon","publication_year":2005,"publication_date":"2005-03-10","ids":{"openalex":"https://openalex.org/W2008577655","doi":"https://doi.org/10.1063/1.1829787","mag":"2008577655"},"language":"en","primary_location":{"id":"doi:10.1063/1.1829787","doi":"https://doi.org/10.1063/1.1829787","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.1829787","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5110541572","display_name":"M. Y. L. Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Y. L. Jung","raw_affiliation_strings":["University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111773141","display_name":"Charlotte T. M. Kwok","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Charlotte T. M. Kwok","raw_affiliation_strings":["University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083684552","display_name":"Richard D. Braatz","orcid":"https://orcid.org/0000-0003-4304-3484","observed_orcids":["https://orcid.org/0000-0003-4304-3484"]},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Richard D. Braatz","raw_affiliation_strings":["University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801","institution_ids":["https://openalex.org/I157725225"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5022760420","display_name":"E. G. Seebauer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157725225","display_name":"University of Illinois Urbana-Champaign","ror":"https://ror.org/047426m28","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. G. Seebauer","raw_affiliation_strings":["University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Illinois Department of Chemical Engineering, , Urbana, Illinois 61801","institution_ids":["https://openalex.org/I157725225"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I157725225"],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":null,"fwci":3.071,"has_fulltext":false,"cited_by_count":28,"citation_normalized_percentile":{"value":0.91370107,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"97","issue":"6","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.4661000072956085,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.4661000072956085,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.4108999967575073,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.07840000092983246,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/transient-enhanced-diffusion","display_name":"transient enhanced diffusion","score":0.8489999771118164},{"id":"https://openalex.org/keywords/boron-implantation","display_name":"boron implantation","score":0.8820000290870667},{"id":"https://openalex.org/keywords/silicon-interstitials","display_name":"silicon interstitials","score":0.7760000228881836},{"id":"https://openalex.org/keywords/charge-state","display_name":"charge states","score":0.7059999704360962},{"id":"https://openalex.org/keywords/degree-of-ionization","display_name":"degree of ionization","score":0.871999979019165},{"id":"https://openalex.org/keywords/boron-interstitials","display_name":"interstitial boron","score":0.5879999995231628},{"id":"https://openalex.org/keywords/kinetic-parameters","display_name":"kinetic parameters","score":0.49300000071525574},{"id":"https://openalex.org/keywords/systems-methods","display_name":"systems methods","score":0.3109999895095825}],"concepts":[{"id":"https://openalex.org/C501308230","wikidata":"https://www.wikidata.org/wiki/Q618","display_name":"Boron","level":2,"score":0.8402373790740967},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.8109055757522583},{"id":"https://openalex.org/C198291218","wikidata":"https://www.wikidata.org/wiki/Q190382","display_name":"Ionization","level":3,"score":0.6060165166854858},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5998901128768921},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.5568625330924988},{"id":"https://openalex.org/C168900304","wikidata":"https://www.wikidata.org/wiki/Q171407","display_name":"Valence (chemistry)","level":2,"score":0.49091988801956177},{"id":"https://openalex.org/C188082385","wikidata":"https://www.wikidata.org/wiki/Q73792","display_name":"Charge (physics)","level":2,"score":0.4895504415035248},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.4527464509010315},{"id":"https://openalex.org/C138775182","wikidata":"https://www.wikidata.org/wiki/Q909960","display_name":"Effective nuclear charge","level":3,"score":0.4189330041408539},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.2892038822174072},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.24224397540092468},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2044084370136261},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.16619116067886353},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15457779169082642},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.11671069264411926},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.07193747162818909},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.1829787","doi":"https://doi.org/10.1063/1.1829787","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.1829787","pdf_url":null,"source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":31,"referenced_works":["https://openalex.org/W654908678","https://openalex.org/W1576464698","https://openalex.org/W1965382511","https://openalex.org/W1968299740","https://openalex.org/W1973788150","https://openalex.org/W1981545888","https://openalex.org/W1984269053","https://openalex.org/W1994859905","https://openalex.org/W1999162961","https://openalex.org/W2003264231","https://openalex.org/W2014004337","https://openalex.org/W2017168520","https://openalex.org/W2018259583","https://openalex.org/W2025241552","https://openalex.org/W2028139109","https://openalex.org/W2028945315","https://openalex.org/W2039746515","https://openalex.org/W2051883004","https://openalex.org/W2052096202","https://openalex.org/W2064698951","https://openalex.org/W2077994487","https://openalex.org/W2087906819","https://openalex.org/W2088119564","https://openalex.org/W2105898907","https://openalex.org/W2108555320","https://openalex.org/W2122990916","https://openalex.org/W2167602060","https://openalex.org/W2168135040","https://openalex.org/W2169663518","https://openalex.org/W2217934073","https://openalex.org/W3195059881"],"related_works":["https://openalex.org/W2054746576","https://openalex.org/W2067491556","https://openalex.org/W2041827830","https://openalex.org/W2000281775","https://openalex.org/W2048908277","https://openalex.org/W2021131090","https://openalex.org/W1981545888","https://openalex.org/W2014004337","https://openalex.org/W2328057221","https://openalex.org/W2137837405"],"abstract_inverted_index":{"It":[0],"is":[1],"becoming":[2],"increasingly":[3],"clear":[4],"that":[5,77,97],"simulation":[6],"models":[7],"of":[8,41,51,74],"transient":[9],"enhanced":[10],"diffusion":[11],"(TED)":[12],"in":[13,22,38],"silicon":[14,55],"need":[15],"to":[16,24,66],"incorporate":[17],"interstitial":[18,56],"charging":[19],"effects":[20],"accurately":[21,71],"order":[23],"adequately":[25],"reproduce":[26],"experimental":[27],"data":[28],"near":[29,33],"the":[30,34,39,44,129],"surface":[31],"and":[32,48,54,105,114,122,126],"underlying":[35],"junction.":[36],"However,":[37],"case":[40],"boron":[42,53],"TED,":[43],"relevant":[45,101],"charge":[46,102],"states":[47,109],"ionization":[49,118],"levels":[50,119],"both":[52],"atoms":[57],"are":[58,112,124],"known":[59],"only":[60],"imperfectly.":[61],"The":[62,94,107,116],"present":[63],"work":[64],"attempts":[65],"describe":[67],"this":[68],"behavior":[69],"more":[70],"via":[72],"simulations":[73],"implanted":[75],"profiles":[76],"employ":[78],"a":[79],"model":[80],"whose":[81],"kinetic":[82],"parameters":[83],"have":[84],"been":[85],"determined":[86],"with":[87],"considerable":[88],"confidence":[89],"by":[90],"rigorous":[91],"systems":[92],"methods.":[93],"results":[95],"suggest":[96],"B":[98,121],"has":[99],"two":[100],"states:":[103],"(+)":[104],"(\u2212).":[106],"corresponding":[108],"for":[110,120],"Si":[111,123],"(++)":[113],"(0).":[115],"effective":[117],"0.33\u00b10.05":[125],"0.12\u00b10.05eV":[127],"above":[128],"valence":[130],"band":[131],"maximum,":[132],"respectively.":[133]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2022,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1}],"updated_date":"2026-05-21T06:26:12.895304","created_date":"2016-06-24T00:00:00"}