{"id":"https://openalex.org/W2007768435","doi":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","title":"Comparison of Propagation and Nucleation of Basal Plane Dislocations in 4H-SiC(000-1) and (0001) Epitaxy","display_name":"Comparison of Propagation and Nucleation of Basal Plane Dislocations in 4H-SiC(000-1) and (0001) Epitaxy","publication_year":2006,"publication_date":"2006-10-15","ids":{"openalex":"https://openalex.org/W2007768435","doi":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","mag":"2007768435"},"language":"en","primary_location":{"id":"doi:10.4028/www.scientific.net/msf.527-529.231","doi":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","pdf_url":null,"source":{"id":"https://openalex.org/S87940674","display_name":"Materials science forum","issn_l":"0255-5476","issn":["0255-5476","1662-9752","1662-9760"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","poland-20"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science Forum","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"hybrid","oa_url":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5001749718","display_name":"Hidekazu Tsuchida","orcid":"https://orcid.org/0009-0009-9753-9929","observed_orcids":["https://orcid.org/0009-0009-9753-9929"]},"institutions":[{"id":"https://openalex.org/I130416959","display_name":"Central Research Institute of Electric Power Industry","ror":"https://ror.org/041jswc25","country_code":"JP","type":"nonprofit","lineage":["https://openalex.org/I130416959"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hidekazu Tsuchida","raw_affiliation_strings":["Central Research Institute of Electric Power Industry (CRIEPI)","Central Research Institute of Electric Power Industry (CRIEPI)#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)","institution_ids":["https://openalex.org/I130416959"]},{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)#TAB#","institution_ids":["https://openalex.org/I130416959"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108676593","display_name":"Isaho Kamata","orcid":"https://orcid.org/0000-0003-1756-1691","observed_orcids":["https://orcid.org/0000-0003-1756-1691"]},"institutions":[{"id":"https://openalex.org/I130416959","display_name":"Central Research Institute of Electric Power Industry","ror":"https://ror.org/041jswc25","country_code":"JP","type":"nonprofit","lineage":["https://openalex.org/I130416959"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Isaho Kamata","raw_affiliation_strings":["Central Research Institute of Electric Power Industry (CRIEPI)","Central Research Institute of Electric Power Industry (CRIEPI)#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)","institution_ids":["https://openalex.org/I130416959"]},{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)#TAB#","institution_ids":["https://openalex.org/I130416959"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062690374","display_name":"Toshiyuki Miyanagi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130416959","display_name":"Central Research Institute of Electric Power Industry","ror":"https://ror.org/041jswc25","country_code":"JP","type":"nonprofit","lineage":["https://openalex.org/I130416959"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Toshiyuki Miyanagi","raw_affiliation_strings":["Central Research Institute of Electric Power Industry (CRIEPI)","Central Research Institute of Electric Power Industry (CRIEPI)#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)","institution_ids":["https://openalex.org/I130416959"]},{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)#TAB#","institution_ids":["https://openalex.org/I130416959"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086547126","display_name":"Tomonori Nakamura","orcid":"https://orcid.org/0000-0002-7702-8760","observed_orcids":["https://orcid.org/0000-0002-7702-8760"]},"institutions":[{"id":"https://openalex.org/I130416959","display_name":"Central Research Institute of Electric Power Industry","ror":"https://ror.org/041jswc25","country_code":"JP","type":"nonprofit","lineage":["https://openalex.org/I130416959"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tomonori Nakamura","raw_affiliation_strings":["Central Research Institute of Electric Power Industry"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Institute of Electric Power Industry","institution_ids":["https://openalex.org/I130416959"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050313091","display_name":"Koji Nakayama","orcid":"https://orcid.org/0000-0003-3559-9554","observed_orcids":["https://orcid.org/0000-0003-3559-9554","https://orcid.org/0009-0000-0203-4632"]},"institutions":[{"id":"https://openalex.org/I2800996768","display_name":"Kansai Electric Power (Japan)","ror":"https://ror.org/03xrg8731","country_code":"JP","type":"company","lineage":["https://openalex.org/I2800996768"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Koji Nakayama","raw_affiliation_strings":["Kansai Electric Power Co., Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kansai Electric Power Co., Inc","institution_ids":["https://openalex.org/I2800996768"]}]},{"author_position":"middle","author":{"id":null,"display_name":"R. Ishii","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I130416959","display_name":"Central Research Institute of Electric Power Industry","ror":"https://ror.org/041jswc25","country_code":"JP","type":"nonprofit","lineage":["https://openalex.org/I130416959"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"R. Ishii","raw_affiliation_strings":["Central Research Institute of Electric Power Industry (CRIEPI)","Central Research Institute of Electric Power Industry (CRIEPI)#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)","institution_ids":["https://openalex.org/I130416959"]},{"raw_affiliation_string":"Central Research Institute of Electric Power Industry (CRIEPI)#TAB#","institution_ids":["https://openalex.org/I130416959"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113948884","display_name":"Yoshitaka Sugawara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2800996768","display_name":"Kansai Electric Power (Japan)","ror":"https://ror.org/03xrg8731","country_code":"JP","type":"company","lineage":["https://openalex.org/I2800996768"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshitaka Sugawara","raw_affiliation_strings":["Kansai Electric Power Co., Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kansai Electric Power Co., Inc","institution_ids":["https://openalex.org/I2800996768"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.3281,"has_fulltext":false,"cited_by_count":11,"citation_normalized_percentile":{"value":0.63987051,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":96},"biblio":{"volume":"527-529","issue":null,"first_page":"231","last_page":"234"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/basal-plane-dislocations","display_name":"basal plane dislocations","score":0.972000002861023},{"id":"https://openalex.org/keywords/4h-sic","display_name":"4H-SiC","score":0.9879999756813049},{"id":"https://openalex.org/keywords/dislocation-propagation","display_name":"dislocation propagation","score":0.7789999842643738},{"id":"https://openalex.org/keywords/dislocation-nucleation","display_name":"dislocation nucleation","score":0.9919999837875366},{"id":"https://openalex.org/keywords/epitaxial-growth","display_name":"epitaxial growth","score":0.7250000238418579},{"id":"https://openalex.org/keywords/c-si-ratio","display_name":"C/Si ratio","score":0.8659999966621399}],"concepts":[{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.9278905391693115},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8535059690475464},{"id":"https://openalex.org/C61048295","wikidata":"https://www.wikidata.org/wiki/Q909022","display_name":"Nucleation","level":2,"score":0.844393253326416},{"id":"https://openalex.org/C2994038127","wikidata":"https://www.wikidata.org/wiki/Q895901","display_name":"Basal plane","level":2,"score":0.7295047044754028},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.6173141598701477},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5619187355041504},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.5534722805023193},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.4812897741794586},{"id":"https://openalex.org/C21368211","wikidata":"https://www.wikidata.org/wiki/Q689863","display_name":"Synchrotron","level":2,"score":0.4620909094810486},{"id":"https://openalex.org/C159122135","wikidata":"https://www.wikidata.org/wiki/Q737571","display_name":"Dislocation","level":2,"score":0.4387724995613098},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4323182702064514},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2995002269744873},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2110789716243744},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.07515603303909302},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.06627583503723145},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.4028/www.scientific.net/msf.527-529.231","doi":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","pdf_url":null,"source":{"id":"https://openalex.org/S87940674","display_name":"Materials science forum","issn_l":"0255-5476","issn":["0255-5476","1662-9752","1662-9760"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","poland-20"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science Forum","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.4028/www.scientific.net/msf.527-529.231","doi":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","is_oa":true,"landing_page_url":"https://doi.org/10.4028/www.scientific.net/msf.527-529.231","pdf_url":null,"source":{"id":"https://openalex.org/S87940674","display_name":"Materials science forum","issn_l":"0255-5476","issn":["0255-5476","1662-9752","1662-9760"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1","poland-20"],"host_organization":"https://openalex.org/P4310317839","host_organization_name":"Trans Tech Publications","host_organization_lineage":["https://openalex.org/P4310317839"],"host_organization_lineage_names":["Trans Tech Publications"],"type":"book series"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Materials Science Forum","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":9,"referenced_works":["https://openalex.org/W1999641598","https://openalex.org/W2009345904","https://openalex.org/W2018926944","https://openalex.org/W2022884659","https://openalex.org/W2032940966","https://openalex.org/W2061726503","https://openalex.org/W2071469271","https://openalex.org/W2086646643","https://openalex.org/W2324816588"],"related_works":["https://openalex.org/W2071469271","https://openalex.org/W1999641598","https://openalex.org/W1976083476","https://openalex.org/W2008767126","https://openalex.org/W2073371909","https://openalex.org/W2082363503","https://openalex.org/W2069742368","https://openalex.org/W2244775938","https://openalex.org/W2054867286","https://openalex.org/W4237108660"],"abstract_inverted_index":{"Propagation":[0],"and":[1,10,22,39,93,116],"nucleation":[2,110],"of":[3,52,75,111],"basal":[4],"plane":[5],"dislocations":[6],"(BPDs)":[7],"in":[8,42,81,99,108],"4H-SiC(000-1)":[9],"(0001)":[11,65],"epitaxy":[12,57],"were":[13],"compared.":[14],"Synchrotron":[15],"reflection":[16],"X-ray":[17],"topography":[18],"was":[19,46,58,105],"performed":[20],"before":[21],"after":[23],"epitaxial":[24],"growth":[25],"to":[26,83],"classify":[27],"the":[28,34,37,43,49,55,64,91,100,109,114],"BPDs":[29,53,82,112],"into":[30,36],"those":[31,40,88,97],"propagated":[32,89],"from":[33,90],"substrate":[35],"epilayer":[38],"nucleated":[41,98],"epilayer.":[44,101],"It":[45],"revealed":[47],"that":[48,62],"propagation":[50],"ratio":[51,74],"for":[54,63,87,96],"(000-1)":[56,68],"significantly":[59],"smaller":[60],"than":[61],"epitaxy.":[66],"Growing":[67],"epilayers":[69],"at":[70],"a":[71,78],"high":[72],"C/Si":[73],"1.2":[76],"achieves":[77],"further":[79],"reduction":[80],"only":[84],"3":[85],"cm-2":[86,95],"substrate,":[92],"16":[94],"A":[102],"dramatic":[103],"increase":[104],"also":[106],"found":[107],"omitting":[113],"re-polishing":[115],"in-situ":[117],"H2":[118],"etching":[119],"procedure.":[120]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}